| 仪器名称ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 信号检测ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 元素测定ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 检测限ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 深度分辨率ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 适用范围ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| 扫描电子显微镜(SEM)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 二次及背向散射电子&X射线ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | B-U (EDS mode)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.1 - 1 at%ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.5 - 3 µm (EDS)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 高辨析率成像ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 元素微观分析及颗粒特征化描述ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| X射线能谱仪(EDS)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 二次背向散射电子&X射线ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | B-UãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.1 – 1 at%ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.5 – 3 μmãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 小面积上的成像与元素组成;缺陷处元素的识别/绘图;颗粒分析(>300nm)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| 显微红外显微镜(FTIR)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 红外线吸收ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 分子群ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.1 - 1 wt%ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.1 - 2.5 µmãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 污染物分析中识别有机化合物的分子结构ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 识别有机颗粒、粉末、薄膜及液体(材料识别)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 量化硅中氧和氢以及氮化硅晶圆中的氢 (Si-H vs. N-H)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 污染物分析(析取、除过气的产品,残余物)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| 拉曼光谱(Raman)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 拉曼散射ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 化学及分子键联资料ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | >=1 wt%ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 共焦模式ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 1到5 µmãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 为污染物分析、材料分类以及张力力测量而识别有机和无机化合物的分子结构ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 拉曼,碳层特征 (石墨、金刚石 )ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 非共价键联压焊(复合体、金属键联)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 定位(随机v. 有组织的结构)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| 俄歇电子能谱仪(AES)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 来自表面附近的Auger电子ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | Li-UãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.1-1%亚单层ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 20 – 200 Ǻ侧面分布模式ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 缺陷分析;颗粒分析;表面分析;小面积深度剖面;薄膜成分分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| X射线光电子能谱仪(XPS)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 来自表面原子附近的光电子ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | Li-U化学键联信息ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 0.01 - 1 at% sub-monolayerãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 20 - 200 Å(剖析模式)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 10 - 100 Å (表面分析)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 有机材料、无机材料、污点、残留物的表面分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 测量表面成分及化学状态信息ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 薄膜成份的深度剖面ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 硅 氧氮化物厚度和测量剂量ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 薄膜氧化物厚度测量(SiO2, Al2O3 等.)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
| 飞行时间二次离子质谱仪(TOF-SIMS)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 分子和元素种类ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 整个周期表,加分子种类ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 107 - 1010at/cm2 sub-monolayerãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 1 - 3 monolayers (Static mode)ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 有机材料和无机材料的表面微量分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 来自表面的大量光谱ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ 表面离子成像ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ |
ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
塑料断口红色颗粒物分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 塑料表面白色粉末成分分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
连接端子pin针表面异物分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | 金手指端部表面异物分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
镀金管脚表面异物分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ||
ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | |
PCB表面异物成分分析ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ ãmI°<æúÐbbs.3c3t.comG©ÀÞÑ)õ | ||