pdsh - 2006/7/24 10:22:00
[upload=rar]viewFile.asp?ID=1181[/upload] 资料介绍,无损检测术语(中英文对照)
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3c3t - 2006/7/24 19:29:00
好资料,收藏起来。多谢版主!请大家多支持版主工作,我们一起来发帖子吧!共同把监理检测网论坛建成我们交流学习的好地方!û¨NnüíUîbbs.3c3t.comM("B©
3c3t - 2006/7/24 19:36:00
该表节选自《中英文无损检测名词术语查询系统(NDTGP)》û¨NnüíUîbbs.3c3t.comM("B©
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English Chinese û¨NnüíUîbbs.3c3t.comM("B©
A.C magnetic saturation 交流磁饱和û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Absorbed dose 吸收剂量û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Absorbed dose rate 吸收剂量率û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acceptanc limits 验收范围û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acceptance level 验收水平û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acceptance standard 验收标准û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Accumulation test 累积检测û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic emission count(emission count) 声发射计数(发射计数)û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic emission transducer 声发射换能器(声发射传感器)û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic emission(AE) 声发射û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic holography 声全息术û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic impedance 声阻抗û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic impedance matching 声阻抗匹配û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic impedance method 声阻法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic wave 声波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustical lens 声透镜û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Acoustic—ultrasonic 声-超声(AU)û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Activation 活化û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Activity 活度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Adequate shielding 安全屏蔽û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Ampere turns 安匝数û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Amplitude 幅度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle beam method 斜射法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle of incidence 入射角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle of reflection 反射角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle of spread 指向角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle of squint 偏向角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angle probe 斜探头û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Angstrom unit 埃(A) û¨NnüíUîbbs.3c3t.comM("B©
Area amplitude response curve 面积幅度曲线û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Area of interest 评定区û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Arliflcial disconlinuity 人工不连续性û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Artifact 假缺陷û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Artificial defect 人工缺陷û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Artificial discontinuity 标准人工缺陷û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
A-scan A型扫描û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
A-scope; A-scan A型显示û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Attenuation coefficient 衰减系数û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Attenuator 衰减器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Audible leak indicator 音响泄漏指示器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Automatic testing 自动检测û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Autoradiography 自射线照片û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Avaluation 评定û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Barium concrete 钡混凝土û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Barn 靶û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Base fog 片基灰雾û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bath 槽液û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bayard- Alpert ionization gage B- A型电离计û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam 声束û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam ratio 光束比û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam angle 束张角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam axis 声束轴线û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam index 声束入射点û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam path location 声程定位û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam path; path length 声程û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Beam spread 声束扩散û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Betatron 电子感应加速器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bimetallic strip gage 双金属片计û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bipolar field 双极磁场û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Black light filter 黑光滤波器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Black light; ultraviolet radiation 黑光û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Blackbody 黑体û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Blackbody equivalent temperature 黑体等效温度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bleakney mass spectrometer 波利克尼质谱仪û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bleedout 渗出û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bottom echo 底面回波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bottom surface 底面û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Boundary echo(first) 边界一次回波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Bremsstrahlung 轫致辐射û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Broad-beam condition 宽射束û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Brush application 刷涂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
B-scan presenfation B型扫描显示û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
B-scope; B-scan B型显示û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
C- scan C型扫描û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Calibration,instrument 设备校准û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Capillary action 毛细管作用û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Carrier fluid 载液û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Carry over of penetrate 渗透剂移转û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cassette 暗合û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cathode 阴极û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Central conductor 中心导体û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Central conductor method 中心导体法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Characteristic curve 特性曲线û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Characteristic curve of film 胶片特性曲线û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Characteristic radiation 特征辐射û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Chemical fog 化学灰雾û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cine-radiography 射线(活动)电影摄影术û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cintact pads 接触垫û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Circumferential coils 圆环线圈û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Circumferential field 周向磁场û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Circumferential magnetization method 周向磁化法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Clean 清理û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Clean- up 清除û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Clearing time 定透时间û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coercive force 矫顽力û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coherence 相干性 û¨NnüíUîbbs.3c3t.comM("B©
Coherence length 相干长度(谐波列长度)û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coi1,test 测试线圈û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coil size 线圈大小û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coil spacing 线圈间距û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coil technique 线圈技术û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coil method 线圈法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coilreference 线圈参考û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coincidence discrimination 符合鉴别û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cold-cathode ionization gage 冷阴极电离计û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Collimator 准直器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Collimation 准直û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Collimator 准直器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Combined colour comtrast and fluorescent penetrant 着色荧光渗透剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Compressed air drying 压缩空气干燥û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Compressional wave 压缩波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Compton scatter 康普顿散射û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Continuous emission 连续发射û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Continuous linear array 连续线阵û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Continuous method 连续法û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Continuous spectrum 连续谱û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Continuous wave 连续波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Contract stretch 对比度宽限û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Contrast 对比度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Contrast agent 对比剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Contrast aid 反差剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Contrast sensitivity 对比灵敏度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Control echo 监视回波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Control echo 参考回波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Couplant 耦合剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coupling 耦合û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Coupling losses 耦合损失û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cracking 裂解û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Creeping wave 爬波û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Critical angle 临界角û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cross section 横截面û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cross talk 串音û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Cross-drilled hole 横孔û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Crystal 晶片û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
C-scope; C-scan C型显示û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Curie point 居里点û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Curie temperature 居里温度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Curie(Ci) 居里û¨NnüíUîbbs.3c3t.comM("B©
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Current flow method 通电法û¨NnüíUîbbs.3c3t.comM("B©
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Current induction method 电流感应法û¨NnüíUîbbs.3c3t.comM("B©
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Current magnetization method 电流磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Decibel(dB) 分贝û¨NnüíUîbbs.3c3t.comM("B©
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Defect resolution 缺陷分辨力û¨NnüíUîbbs.3c3t.comM("B©
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Definition 清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Definition, image definition 清晰度,图像清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Demagnetization 退磁û¨NnüíUîbbs.3c3t.comM("B©
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Demagnetization factor 退磁因子û¨NnüíUîbbs.3c3t.comM("B©
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Demagnetizer 退磁装置û¨NnüíUîbbs.3c3t.comM("B©
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Densitometer 黑度计û¨NnüíUîbbs.3c3t.comM("B©
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Density 黑度(底片)û¨NnüíUîbbs.3c3t.comM("B©
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Density comparison strip 黑度比较片û¨NnüíUîbbs.3c3t.comM("B©
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Detecting medium 检验介质û¨NnüíUîbbs.3c3t.comM("B©
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Developer 显像剂û¨NnüíUîbbs.3c3t.comM("B©
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Developer station 显像工位û¨NnüíUîbbs.3c3t.comM("B©
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Developer, agueons 水性显象剂û¨NnüíUîbbs.3c3t.comM("B©
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Developer, dry 干显象剂û¨NnüíUîbbs.3c3t.comM("B©
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Developer, nonaqueous (sus- pendible) 非水(可悬浮)显象剂û¨NnüíUîbbs.3c3t.comM("B©
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Developing time 显像时间û¨NnüíUîbbs.3c3t.comM("B©
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Development 显影û¨NnüíUîbbs.3c3t.comM("B©
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Diffraction mottle 衍射斑û¨NnüíUîbbs.3c3t.comM("B©
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Diffuse indications 松散指示û¨NnüíUîbbs.3c3t.comM("B©
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Diffusion 扩散û¨NnüíUîbbs.3c3t.comM("B©
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Digital image acquisition system 数字图像识别系统û¨NnüíUîbbs.3c3t.comM("B©
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Dilatational wave 膨胀波û¨NnüíUîbbs.3c3t.comM("B©
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Dip and drain station 浸渍和流滴工位û¨NnüíUîbbs.3c3t.comM("B©
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Direct contact magnetization 直接接触磁化û¨NnüíUîbbs.3c3t.comM("B©
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Direct exposure imaging 直接曝光成像û¨NnüíUîbbs.3c3t.comM("B©
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Direct contact method 直接接触法û¨NnüíUîbbs.3c3t.comM("B©
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Directivity 指向性û¨NnüíUîbbs.3c3t.comM("B©
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Discontinuity 不连续性û¨NnüíUîbbs.3c3t.comM("B©
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Distance- gain- size-German AVG 距离- 增益- 尺寸(DGS德文为AVG)û¨NnüíUîbbs.3c3t.comM("B©
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Distance marker; time marker 距离刻度û¨NnüíUîbbs.3c3t.comM("B©
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Dose equivalent 剂量当量û¨NnüíUîbbs.3c3t.comM("B©
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Dose rate meter 剂量率计û¨NnüíUîbbs.3c3t.comM("B©
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Dosemeter 剂量计û¨NnüíUîbbs.3c3t.comM("B©
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Double crystal probe 双晶片探头û¨NnüíUîbbs.3c3t.comM("B©
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Double probe technique 双探头法û¨NnüíUîbbs.3c3t.comM("B©
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Double transceiver technique 双发双收法û¨NnüíUîbbs.3c3t.comM("B©
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Double traverse technique 二次波法û¨NnüíUîbbs.3c3t.comM("B©
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Dragout 带出û¨NnüíUîbbs.3c3t.comM("B©
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Drain time 滴落时间û¨NnüíUîbbs.3c3t.comM("B©
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Drain time 流滴时间û¨NnüíUîbbs.3c3t.comM("B©
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Drift 漂移û¨NnüíUîbbs.3c3t.comM("B©
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Dry method 干法û¨NnüíUîbbs.3c3t.comM("B©
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Dry powder 干粉û¨NnüíUîbbs.3c3t.comM("B©
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Dry technique 干粉技术û¨NnüíUîbbs.3c3t.comM("B©
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Dry developer 干显像剂û¨NnüíUîbbs.3c3t.comM("B©
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Drying station 干燥工位û¨NnüíUîbbs.3c3t.comM("B©
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Drying time 干燥时间û¨NnüíUîbbs.3c3t.comM("B©
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D-scope; D-scan D型显示û¨NnüíUîbbs.3c3t.comM("B©
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Dual search unit 双探头û¨NnüíUîbbs.3c3t.comM("B©
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Dual-focus tube 双焦点管û¨NnüíUîbbs.3c3t.comM("B©
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Duplex-wire image quality indicator 双线像质指示器û¨NnüíUîbbs.3c3t.comM("B©
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Duration 持续时间û¨NnüíUîbbs.3c3t.comM("B©
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Dwell time 停留时间û¨NnüíUîbbs.3c3t.comM("B©
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Dye penetrant 着色渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Dynamic leak test 动态泄漏检测û¨NnüíUîbbs.3c3t.comM("B©
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Dynamic leakage measurement 动态泄漏测量û¨NnüíUîbbs.3c3t.comM("B©
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Dynamic range 动态范围û¨NnüíUîbbs.3c3t.comM("B©
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Dynamic radiography 动态射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Echo 回波û¨NnüíUîbbs.3c3t.comM("B©
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Echo frequency 回波频率û¨NnüíUîbbs.3c3t.comM("B©
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Echo height 回波高度û¨NnüíUîbbs.3c3t.comM("B©
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Echo indication 回波指示û¨NnüíUîbbs.3c3t.comM("B©
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Echo width 回波宽度û¨NnüíUîbbs.3c3t.comM("B©
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Eddy current 涡流û¨NnüíUîbbs.3c3t.comM("B©
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Eddy current flaw detector 涡流探伤仪û¨NnüíUîbbs.3c3t.comM("B©
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Eddy current testiog 涡流检测û¨NnüíUîbbs.3c3t.comM("B©
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Edge 端面û¨NnüíUîbbs.3c3t.comM("B©
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Edge effect 边缘效应û¨NnüíUîbbs.3c3t.comM("B©
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Edge echo 棱边回波û¨NnüíUîbbs.3c3t.comM("B©
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Edge effect 边缘效应û¨NnüíUîbbs.3c3t.comM("B©
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Effective depth penetration (EDP) 有效穿透深度û¨NnüíUîbbs.3c3t.comM("B©
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Effective focus size 有效焦点尺寸û¨NnüíUîbbs.3c3t.comM("B©
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Effective magnetic permeability 有效磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Effective permeability 有效磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Effective reflection surface of flaw 缺陷有效反射面û¨NnüíUîbbs.3c3t.comM("B©
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Effective resistance 有效电阻û¨NnüíUîbbs.3c3t.comM("B©
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Elastic medium 弹性介质û¨NnüíUîbbs.3c3t.comM("B©
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Electric displacement 电位移û¨NnüíUîbbs.3c3t.comM("B©
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Electrical center 电中心û¨NnüíUîbbs.3c3t.comM("B©
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Electrode 电极û¨NnüíUîbbs.3c3t.comM("B©
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Electro-magnetic acoustic transducer 电磁声换能器û¨NnüíUîbbs.3c3t.comM("B©
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Electromagnetic induction 电磁感应û¨NnüíUîbbs.3c3t.comM("B©
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Electromagnetic radiation 电磁辐射û¨NnüíUîbbs.3c3t.comM("B©
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Electron radiography 电子辐射照相术û¨NnüíUîbbs.3c3t.comM("B©
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Electron volt 电子伏恃û¨NnüíUîbbs.3c3t.comM("B©
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Electronic noise 电子噪声û¨NnüíUîbbs.3c3t.comM("B©
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Electrostatic spraying 静电喷涂û¨NnüíUîbbs.3c3t.comM("B©
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Emulsification 乳化û¨NnüíUîbbs.3c3t.comM("B©
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Emulsification time 乳化时间û¨NnüíUîbbs.3c3t.comM("B©
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Emulsifier 乳化剂û¨NnüíUîbbs.3c3t.comM("B©
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Encircling coils 环绕式线圈û¨NnüíUîbbs.3c3t.comM("B©
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End effect 端部效应û¨NnüíUîbbs.3c3t.comM("B©
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Energizing cycle 激励周期û¨NnüíUîbbs.3c3t.comM("B©
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Equalizing filter 均衡滤波器û¨NnüíUîbbs.3c3t.comM("B©
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Equivalent 当量û¨NnüíUîbbs.3c3t.comM("B©
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Equivalent I.Q. I. Sensitivity 象质指示器当量灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Equivalent nitrogen pressure 等效氮压û¨NnüíUîbbs.3c3t.comM("B©
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Equivalent penetrameter sensifivty 透度计当量灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Equivalent method 当量法û¨NnüíUîbbs.3c3t.comM("B©
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Erasabl optical medium 可探光学介质û¨NnüíUîbbs.3c3t.comM("B©
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Etching 浸蚀û¨NnüíUîbbs.3c3t.comM("B©
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Evaluation 评定û¨NnüíUîbbs.3c3t.comM("B©
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Evaluation threshold 评价阈值û¨NnüíUîbbs.3c3t.comM("B©
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Event count 事件计数û¨NnüíUîbbs.3c3t.comM("B©
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Event count rate 事件计数率û¨NnüíUîbbs.3c3t.comM("B©
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Examination area 检测范围û¨NnüíUîbbs.3c3t.comM("B©
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Examination region 检验区域û¨NnüíUîbbs.3c3t.comM("B©
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Exhaust pressure/discharge pressure 排气压力û¨NnüíUîbbs.3c3t.comM("B©
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Exhaust tubulation 排气管道û¨NnüíUîbbs.3c3t.comM("B©
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Expanded time-base sweep 时基线展宽û¨NnüíUîbbs.3c3t.comM("B©
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Exposure 曝光û¨NnüíUîbbs.3c3t.comM("B©
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Exposure table 曝光表格û¨NnüíUîbbs.3c3t.comM("B©
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Exposure chart 曝光曲线û¨NnüíUîbbs.3c3t.comM("B©
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Exposure fog 曝光灰雾û¨NnüíUîbbs.3c3t.comM("B©
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Exposure,radiographic exposure 曝光,射线照相曝光û¨NnüíUîbbs.3c3t.comM("B©
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Extended source 扩展源û¨NnüíUîbbs.3c3t.comM("B©
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Facility scattered neutrons 条件散射中子û¨NnüíUîbbs.3c3t.comM("B©
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False indication 假指示û¨NnüíUîbbs.3c3t.comM("B©
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Family 族û¨NnüíUîbbs.3c3t.comM("B©
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Far field 远场û¨NnüíUîbbs.3c3t.comM("B©
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Feed-through coil 穿过式线圈û¨NnüíUîbbs.3c3t.comM("B©
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Field, resultant magnetic 复合磁场û¨NnüíUîbbs.3c3t.comM("B©
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Film base 片基û¨NnüíUîbbs.3c3t.comM("B©
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Film contrast 胶片对比度û¨NnüíUîbbs.3c3t.comM("B©
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Film unsharpness 胶片不清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Film viewing screen 观察屏û¨NnüíUîbbs.3c3t.comM("B©
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Filter 滤波器/滤光板û¨NnüíUîbbs.3c3t.comM("B©
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Flat-bottomed hole 平底孔û¨NnüíUîbbs.3c3t.comM("B©
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Flat-bottomed hole equivalent 平底孔当量û¨NnüíUîbbs.3c3t.comM("B©
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Flaw 伤û¨NnüíUîbbs.3c3t.comM("B©
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Flaw characterization 伤特性û¨NnüíUîbbs.3c3t.comM("B©
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Flexural wave 弯曲波û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescence 荧光û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescent examination method 荧光检验法û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescent magnetic particle inspection 荧光磁粉检验û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescent dry deposit penetrant 干沉积荧光渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescent light 荧光û¨NnüíUîbbs.3c3t.comM("B©
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Fluorescent magnetic powder 荧光磁粉û¨NnüíUîbbs.3c3t.comM("B©
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Fluoroscopy 荧光检查法û¨NnüíUîbbs.3c3t.comM("B©
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Flux leakage field 磁通泄漏场û¨NnüíUîbbs.3c3t.comM("B©
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Flux lines 磁通线û¨NnüíUîbbs.3c3t.comM("B©
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Focal spot 焦点û¨NnüíUîbbs.3c3t.comM("B©
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Focal distance 焦距û¨NnüíUîbbs.3c3t.comM("B©
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Focus length 焦点长度û¨NnüíUîbbs.3c3t.comM("B©
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Focus width 焦点宽度û¨NnüíUîbbs.3c3t.comM("B©
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Focus(electron) 电子焦点û¨NnüíUîbbs.3c3t.comM("B©
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Focused beam 聚焦声束û¨NnüíUîbbs.3c3t.comM("B©
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Focusing probe 聚焦探头û¨NnüíUîbbs.3c3t.comM("B©
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Focus-to-film distance(f.f.d) 焦点-胶片距离(焦距)û¨NnüíUîbbs.3c3t.comM("B©
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Freguency 频率û¨NnüíUîbbs.3c3t.comM("B©
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Frequency constant 频率常数û¨NnüíUîbbs.3c3t.comM("B©
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Fringe 干涉带û¨NnüíUîbbs.3c3t.comM("B©
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Front distance of flaw 缺陷前沿距离û¨NnüíUîbbs.3c3t.comM("B©
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Full- wave direct current(FWDC) 全波直流û¨NnüíUîbbs.3c3t.comM("B©
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Fundamental frequency 基频û¨NnüíUîbbs.3c3t.comM("B©
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Furring 毛状迹痕û¨NnüíUîbbs.3c3t.comM("B©
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Gage pressure 表压û¨NnüíUîbbs.3c3t.comM("B©
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Gain 增益û¨NnüíUîbbs.3c3t.comM("B©
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Gamma radiography γ射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Gamma ray source γ射线源û¨NnüíUîbbs.3c3t.comM("B©
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Gamma ray source container γ射线源容器û¨NnüíUîbbs.3c3t.comM("B©
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Gamma rays γ射线û¨NnüíUîbbs.3c3t.comM("B©
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Gamma-ray radiographic equipment γ射线透照装置û¨NnüíUîbbs.3c3t.comM("B©
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Gap scanning 间隙扫查û¨NnüíUîbbs.3c3t.comM("B©
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Gas 气体û¨NnüíUîbbs.3c3t.comM("B©
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Gate 闸门û¨NnüíUîbbs.3c3t.comM("B©
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Gating technique 选通技术û¨NnüíUîbbs.3c3t.comM("B©
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Gauss 高斯û¨NnüíUîbbs.3c3t.comM("B©
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Geiger-Muller counter 盖革.弥勒计数器û¨NnüíUîbbs.3c3t.comM("B©
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Geometric unsharpness 几何不清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Gray(Gy) 戈瑞û¨NnüíUîbbs.3c3t.comM("B©
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Grazing incidence 掠入射û¨NnüíUîbbs.3c3t.comM("B©
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Grazing angle 掠射角û¨NnüíUîbbs.3c3t.comM("B©
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Group velocity 群速度û¨NnüíUîbbs.3c3t.comM("B©
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Half life 半衰期û¨NnüíUîbbs.3c3t.comM("B©
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Half- wave current (HW) 半波电流û¨NnüíUîbbs.3c3t.comM("B©
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Half-value layer(HVL) 半值层û¨NnüíUîbbs.3c3t.comM("B©
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Half-value method 半波高度法û¨NnüíUîbbs.3c3t.comM("B©
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Halogen 卤素û¨NnüíUîbbs.3c3t.comM("B©
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Halogen leak detector 卤素检漏仪û¨NnüíUîbbs.3c3t.comM("B©
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Hard X-rays 硬X射线û¨NnüíUîbbs.3c3t.comM("B©
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Hard-faced probe 硬膜探头û¨NnüíUîbbs.3c3t.comM("B©
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Harmonic analysis 谐波分析û¨NnüíUîbbs.3c3t.comM("B©
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Harmonic distortion 谐波畸变û¨NnüíUîbbs.3c3t.comM("B©
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Harmonics 谐频û¨NnüíUîbbs.3c3t.comM("B©
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Head wave 头波û¨NnüíUîbbs.3c3t.comM("B©
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Helium bombing 氦轰击法û¨NnüíUîbbs.3c3t.comM("B©
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Helium drift 氦漂移û¨NnüíUîbbs.3c3t.comM("B©
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Helium leak detector 氦检漏仪û¨NnüíUîbbs.3c3t.comM("B©
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Hermetically tight seal 气密密封û¨NnüíUîbbs.3c3t.comM("B©
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High vacuum 高真空û¨NnüíUîbbs.3c3t.comM("B©
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High energy X-rays 高能X射线û¨NnüíUîbbs.3c3t.comM("B©
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Holography (optical) 光全息照相û¨NnüíUîbbs.3c3t.comM("B©
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Holography, acoustic 声全息û¨NnüíUîbbs.3c3t.comM("B©
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Hydrophilic emulsifier 亲水性乳化剂û¨NnüíUîbbs.3c3t.comM("B©
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Hydrophilic remover 亲水性洗净剂û¨NnüíUîbbs.3c3t.comM("B©
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Hysteresis 磁滞û¨NnüíUîbbs.3c3t.comM("B©
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Hysteresis 磁滞û¨NnüíUîbbs.3c3t.comM("B©
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IACS IACS û¨NnüíUîbbs.3c3t.comM("B©
ID coil ID线圈û¨NnüíUîbbs.3c3t.comM("B©
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Image definition 图像清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Image contrast 图像对比度û¨NnüíUîbbs.3c3t.comM("B©
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Image enhancement 图像增强û¨NnüíUîbbs.3c3t.comM("B©
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Image magnification 图像放大û¨NnüíUîbbs.3c3t.comM("B©
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Image quality 图像质量û¨NnüíUîbbs.3c3t.comM("B©
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Image quality indicator(IQI)/image quality indication 像质指示器û¨NnüíUîbbs.3c3t.comM("B©
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Imaging line scanner 图像线扫描器û¨NnüíUîbbs.3c3t.comM("B©
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Immersion probe 液浸探头û¨NnüíUîbbs.3c3t.comM("B©
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Immersion rinse 浸没清洗û¨NnüíUîbbs.3c3t.comM("B©
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Impedance 阻抗û¨NnüíUîbbs.3c3t.comM("B©
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Impedance plane diagram 阻抗平面图û¨NnüíUîbbs.3c3t.comM("B©
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Imperfection 不完整性û¨NnüíUîbbs.3c3t.comM("B©
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Impulse eddy current testing 脉冲涡流检测û¨NnüíUîbbs.3c3t.comM("B©
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Incremental permeability 增量磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Indication 指示û¨NnüíUîbbs.3c3t.comM("B©
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Indirect exposure 间接曝光û¨NnüíUîbbs.3c3t.comM("B©
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Indirect magnetization 间接磁化û¨NnüíUîbbs.3c3t.comM("B©
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Indirect magnetization method 间接磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Indirect scan 间接扫查û¨NnüíUîbbs.3c3t.comM("B©
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Induced current method 感应电流法û¨NnüíUîbbs.3c3t.comM("B©
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Infrared sensing device 红外扫描器û¨NnüíUîbbs.3c3t.comM("B©
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Inherent fluorescence 固有荧光û¨NnüíUîbbs.3c3t.comM("B©
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Inherent filtration 固有滤波û¨NnüíUîbbs.3c3t.comM("B©
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Initial permeability 起始磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Initial pulse 始脉冲û¨NnüíUîbbs.3c3t.comM("B©
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Initial pulse width 始波宽度û¨NnüíUîbbs.3c3t.comM("B©
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Inserted coil 插入式线圈û¨NnüíUîbbs.3c3t.comM("B©
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Inside coil 内部线圈û¨NnüíUîbbs.3c3t.comM("B©
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Inside- out testing 外泄检测û¨NnüíUîbbs.3c3t.comM("B©
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Inspection 检查û¨NnüíUîbbs.3c3t.comM("B©
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Inspection medium 检查介质û¨NnüíUîbbs.3c3t.comM("B©
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Intensifying screen 增感屏û¨NnüíUîbbs.3c3t.comM("B©
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Interal,arrival time (Δtij)/arrival time interval(Δtij) 到达时间差(Δtij) û¨NnüíUîbbs.3c3t.comM("B©
Interface boundary 界面û¨NnüíUîbbs.3c3t.comM("B©
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Interface echo 界面回波û¨NnüíUîbbs.3c3t.comM("B©
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Interface trigger 界面触发û¨NnüíUîbbs.3c3t.comM("B©
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Interference 干涉û¨NnüíUîbbs.3c3t.comM("B©
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K value K值û¨NnüíUîbbs.3c3t.comM("B©
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Kiloelectron volt keV千电子伏特û¨NnüíUîbbs.3c3t.comM("B©
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Line scanner 线扫描器û¨NnüíUîbbs.3c3t.comM("B©
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Linearity (time or distance) 线性(时间或距离)û¨NnüíUîbbs.3c3t.comM("B©
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Linearity, anplitude 幅度线性û¨NnüíUîbbs.3c3t.comM("B©
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Lines of force 磁力线û¨NnüíUîbbs.3c3t.comM("B©
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Local magnetization 局部磁化û¨NnüíUîbbs.3c3t.comM("B©
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Local magnetization method 局部磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Localizing cone 定域喇叭筒û¨NnüíUîbbs.3c3t.comM("B©
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Longitudinal field 纵向磁场û¨NnüíUîbbs.3c3t.comM("B©
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Longitudinal magnetization method 纵向磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Loss of back reflection 背面反射损失û¨NnüíUîbbs.3c3t.comM("B©
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Loss of back reflection 底面反射损失û¨NnüíUîbbs.3c3t.comM("B©
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Love wave 乐甫波û¨NnüíUîbbs.3c3t.comM("B©
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Low energy gamma radiation 低能γ辐射û¨NnüíUîbbs.3c3t.comM("B©
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Low-enerugy photon radiation 低能光子辐射û¨NnüíUîbbs.3c3t.comM("B©
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Luminance 亮度û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic domain 磁畴û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic flux density 磁通密度û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic permeability 磁导率û¨NnüíUîbbs.3c3t.comM("B©
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3c3t - 2006/7/24 19:36:00
Magnetic pole 磁极û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic saturataion 磁饱和û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic saturation 磁饱和û¨NnüíUîbbs.3c3t.comM("B©
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Magnetic writing 磁写û¨NnüíUîbbs.3c3t.comM("B©
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Magnetizing 磁化û¨NnüíUîbbs.3c3t.comM("B©
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Markers 时标û¨NnüíUîbbs.3c3t.comM("B©
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MA-scope; MA-scan MA型显示û¨NnüíUîbbs.3c3t.comM("B©
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Masking 遮蔽û¨NnüíUîbbs.3c3t.comM("B©
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Mass attcnuation coefficient 质量吸收系数û¨NnüíUîbbs.3c3t.comM("B©
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Mass number 质量数û¨NnüíUîbbs.3c3t.comM("B©
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Mass spectrometer (M.S.) 质谱仪û¨NnüíUîbbs.3c3t.comM("B©
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Medium vacuum 中真空û¨NnüíUîbbs.3c3t.comM("B©
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Mega or million volt MV兆伏特û¨NnüíUîbbs.3c3t.comM("B©
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Microfocus radiography 微焦点射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Micrometre 微米û¨NnüíUîbbs.3c3t.comM("B©
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Milliampere 毫安(mA)û¨NnüíUîbbs.3c3t.comM("B©
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Minimum resolvable temperature difference (MRTD)最小可分辨温度差(MRDT)û¨NnüíUîbbs.3c3t.comM("B©
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Mode 波型û¨NnüíUîbbs.3c3t.comM("B©
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Multiaspect magnetization method 多向磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Multidirectional magnetization 多向磁化û¨NnüíUîbbs.3c3t.comM("B©
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Multifrequency eddy current testiog 多频涡流检测û¨NnüíUîbbs.3c3t.comM("B©
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Multiple back reflections 多次背面反射û¨NnüíUîbbs.3c3t.comM("B©
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Multiple reflections 多次反射û¨NnüíUîbbs.3c3t.comM("B©
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Multiple back reflections 多次底面反射û¨NnüíUîbbs.3c3t.comM("B©
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Multiple echo method 多次反射法û¨NnüíUîbbs.3c3t.comM("B©
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Multiple probe technique 多探头法û¨NnüíUîbbs.3c3t.comM("B©
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Multiple triangular array 多三角形阵列û¨NnüíUîbbs.3c3t.comM("B©
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Narrow beam condition 窄射束û¨NnüíUîbbs.3c3t.comM("B©
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NC NC û¨NnüíUîbbs.3c3t.comM("B©
Near field 近场û¨NnüíUîbbs.3c3t.comM("B©
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Near field length 近场长度û¨NnüíUîbbs.3c3t.comM("B©
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Near surface defect 近表面缺陷û¨NnüíUîbbs.3c3t.comM("B©
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Net density 净黑度û¨NnüíUîbbs.3c3t.comM("B©
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Net density 净(光学)密度û¨NnüíUîbbs.3c3t.comM("B©
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Neutron 中子û¨NnüíUîbbs.3c3t.comM("B©
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Neutron radiograhy 中子射线透照û¨NnüíUîbbs.3c3t.comM("B©
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Neutron radiography 中子射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Newton (N) 牛顿û¨NnüíUîbbs.3c3t.comM("B©
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Nier mass spectrometer 尼尔质谱仪û¨NnüíUîbbs.3c3t.comM("B©
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Noise 噪声û¨NnüíUîbbs.3c3t.comM("B©
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Noise 噪声û¨NnüíUîbbs.3c3t.comM("B©
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Noise equivalent temperature difference (NETD) 噪声当量温度差(NETD)û¨NnüíUîbbs.3c3t.comM("B©
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Nominal angle 标称角度û¨NnüíUîbbs.3c3t.comM("B©
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Nominal frequency 标称频率 û¨NnüíUîbbs.3c3t.comM("B©
Non-aqueous liquid developer 非水性液体显像剂û¨NnüíUîbbs.3c3t.comM("B©
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Noncondensable gas 非冷凝气体û¨NnüíUîbbs.3c3t.comM("B©
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Nondcstructivc Examination(NDE) 无损试验û¨NnüíUîbbs.3c3t.comM("B©
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Nondestructive Evaluation(NDE) 无损评价û¨NnüíUîbbs.3c3t.comM("B©
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Nondestructive Inspection(NDI) 无损检验û¨NnüíUîbbs.3c3t.comM("B©
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Nondestructive Testing(NDT) 无损检测û¨NnüíUîbbs.3c3t.comM("B©
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Nonerasble optical data 可固定光学数据û¨NnüíUîbbs.3c3t.comM("B©
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Nonferromugnetic material 非铁磁性材料û¨NnüíUîbbs.3c3t.comM("B©
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Nonrelevant indication 非相关指示û¨NnüíUîbbs.3c3t.comM("B©
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Non-screen-type film 非增感型胶片û¨NnüíUîbbs.3c3t.comM("B©
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Normal incidence 垂直入射(亦见直射声束)û¨NnüíUîbbs.3c3t.comM("B©
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Normal permeability 标准磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Normal beam method; straight beam method 垂直法û¨NnüíUîbbs.3c3t.comM("B©
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Normal probe 直探头û¨NnüíUîbbs.3c3t.comM("B©
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Normalized reactance 归一化电抗û¨NnüíUîbbs.3c3t.comM("B©
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Normalized resistance 归一化电阻û¨NnüíUîbbs.3c3t.comM("B©
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Nuclear activity 核活性û¨NnüíUîbbs.3c3t.comM("B©
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Nuclide 核素û¨NnüíUîbbs.3c3t.comM("B©
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Object plane resolution 物体平面分辨率û¨NnüíUîbbs.3c3t.comM("B©
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Object scattered neutrons 物体散射中子û¨NnüíUîbbs.3c3t.comM("B©
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Object beam 物体光束û¨NnüíUîbbs.3c3t.comM("B©
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Object beam angle 物体光束角û¨NnüíUîbbs.3c3t.comM("B©
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Object-film distance 被检体-胶片距离û¨NnüíUîbbs.3c3t.comM("B©
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Object一film distance 物体- 胶片距离û¨NnüíUîbbs.3c3t.comM("B©
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Over development 显影过度û¨NnüíUîbbs.3c3t.comM("B©
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Over emulsfication 过乳化û¨NnüíUîbbs.3c3t.comM("B©
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Overall magnetization 整体磁化û¨NnüíUîbbs.3c3t.comM("B©
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Overload recovery time 过载恢复时间û¨NnüíUîbbs.3c3t.comM("B©
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Overwashing 过洗û¨NnüíUîbbs.3c3t.comM("B©
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Oxidation fog 氧化灰雾û¨NnüíUîbbs.3c3t.comM("B©
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P P û¨NnüíUîbbs.3c3t.comM("B©
Pair production 偶生成û¨NnüíUîbbs.3c3t.comM("B©
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Pair production 电子对产生û¨NnüíUîbbs.3c3t.comM("B©
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Pair production 电子偶的产生û¨NnüíUîbbs.3c3t.comM("B©
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Palladium barrier leak detector 钯屏检漏仪û¨NnüíUîbbs.3c3t.comM("B©
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Panoramic exposure 全景曝光û¨NnüíUîbbs.3c3t.comM("B©
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Parallel scan 平行扫查û¨NnüíUîbbs.3c3t.comM("B©
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Paramagnetic material 顺磁性材料û¨NnüíUîbbs.3c3t.comM("B©
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Parasitic echo 干扰回波û¨NnüíUîbbs.3c3t.comM("B©
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Partial pressure 分压û¨NnüíUîbbs.3c3t.comM("B©
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Particle content 磁悬液浓度û¨NnüíUîbbs.3c3t.comM("B©
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Particle velocity 质点(振动)速度û¨NnüíUîbbs.3c3t.comM("B©
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Pascal (Pa) 帕斯卡(帕)û¨NnüíUîbbs.3c3t.comM("B©
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Pascal cubic metres per second 帕立方米每秒(Pa•m3/s )û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Path length 光程长û¨NnüíUîbbs.3c3t.comM("B©
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Path length difference 光程长度差û¨NnüíUîbbs.3c3t.comM("B©
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Pattern 探伤图形û¨NnüíUîbbs.3c3t.comM("B©
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Peak current 峰值电流û¨NnüíUîbbs.3c3t.comM("B©
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Penetrameter 透度计û¨NnüíUîbbs.3c3t.comM("B©
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Penetrameter sensitivity 透度计灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant 渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant comparator 渗透对比试块û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant flaw detection 渗透探伤û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant removal 渗透剂去除û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant station 渗透工位û¨NnüíUîbbs.3c3t.comM("B©
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Penetrant, water- washable 水洗型渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Penetration 穿透深度û¨NnüíUîbbs.3c3t.comM("B©
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Penetration time 渗透时间û¨NnüíUîbbs.3c3t.comM("B©
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Permanent magnet 永久磁铁û¨NnüíUîbbs.3c3t.comM("B©
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Permeability coefficient 透气系数û¨NnüíUîbbs.3c3t.comM("B©
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Permeability,a-c 交流磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Permeability,d-c 直流磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Phantom echo 幻象回波û¨NnüíUîbbs.3c3t.comM("B©
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Phase analysis 相位分析û¨NnüíUîbbs.3c3t.comM("B©
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Phase angle 相位角û¨NnüíUîbbs.3c3t.comM("B©
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Phase controlled circuit breaker 断电相位控制器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Phase detection 相位检测û¨NnüíUîbbs.3c3t.comM("B©
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Phase hologram 相位全息û¨NnüíUîbbs.3c3t.comM("B©
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Phase sensitive detector 相敏检波器û¨NnüíUîbbs.3c3t.comM("B©
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Phase shift 相位移û¨NnüíUîbbs.3c3t.comM("B©
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Phase velocity 相速度û¨NnüíUîbbs.3c3t.comM("B©
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Phase-sensitive system 相敏系统û¨NnüíUîbbs.3c3t.comM("B©
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Phillips ionization gage 菲利浦电离计û¨NnüíUîbbs.3c3t.comM("B©
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Phosphor 荧光物质û¨NnüíUîbbs.3c3t.comM("B©
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Photo fluorography 荧光照相术û¨NnüíUîbbs.3c3t.comM("B©
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Photoelectric absorption 光电吸收û¨NnüíUîbbs.3c3t.comM("B©
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Photographic emulsion 照相乳剂û¨NnüíUîbbs.3c3t.comM("B©
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Photographic fog 照相灰雾û¨NnüíUîbbs.3c3t.comM("B©
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Photostimulable luminescence 光敏发光û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric effect 压电效应û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric material 压电材料û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric stiffness constant 压电劲度常数û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric stress constant 压电应力常数û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric transducer 压电换能器û¨NnüíUîbbs.3c3t.comM("B©
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Piezoelectric voltage constant 压电电压常数û¨NnüíUîbbs.3c3t.comM("B©
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Pirani gage 皮拉尼计û¨NnüíUîbbs.3c3t.comM("B©
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Pirani gage 皮拉尼计û¨NnüíUîbbs.3c3t.comM("B©
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Pitch and catch technique 一发一收法û¨NnüíUîbbs.3c3t.comM("B©
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Pixel 象素û¨NnüíUîbbs.3c3t.comM("B©
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Pixel size 象素尺寸û¨NnüíUîbbs.3c3t.comM("B©
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Pixel, disply size 象素显示尺寸û¨NnüíUîbbs.3c3t.comM("B©
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Planar array 平面阵(列) û¨NnüíUîbbs.3c3t.comM("B©
Plane wave 平面波û¨NnüíUîbbs.3c3t.comM("B©
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Plate wave 板波û¨NnüíUîbbs.3c3t.comM("B©
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Plate wave technique 板波法û¨NnüíUîbbs.3c3t.comM("B©
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Point source 点源û¨NnüíUîbbs.3c3t.comM("B©
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Post emulsification 后乳化û¨NnüíUîbbs.3c3t.comM("B©
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Post emulsifiable penetrant 后乳化渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Post-cleaning 后清除û¨NnüíUîbbs.3c3t.comM("B©
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Post-cleaning 后清洗û¨NnüíUîbbs.3c3t.comM("B©
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Powder 粉未û¨NnüíUîbbs.3c3t.comM("B©
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Powder blower 喷粉器û¨NnüíUîbbs.3c3t.comM("B©
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Powder blower 磁粉喷枪û¨NnüíUîbbs.3c3t.comM("B©
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Pre-cleaning 预清理û¨NnüíUîbbs.3c3t.comM("B©
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Pressure difference 压力差û¨NnüíUîbbs.3c3t.comM("B©
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Pressure dye test 压力着色检测û¨NnüíUîbbs.3c3t.comM("B©
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Pressure probe 压力探头û¨NnüíUîbbs.3c3t.comM("B©
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Pressure testing 压力检测û¨NnüíUîbbs.3c3t.comM("B©
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Pressure- evacuation test 压力抽空检测û¨NnüíUîbbs.3c3t.comM("B©
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Pressure mark 压痕û¨NnüíUîbbs.3c3t.comM("B©
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Pressure,design 设计压力û¨NnüíUîbbs.3c3t.comM("B©
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Pre-test 初探û¨NnüíUîbbs.3c3t.comM("B©
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Primary coil 一次线圈û¨NnüíUîbbs.3c3t.comM("B©
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Primary radiation 初级辐射û¨NnüíUîbbs.3c3t.comM("B©
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Probe gas 探头气体û¨NnüíUîbbs.3c3t.comM("B©
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Probe test 探头检测û¨NnüíUîbbs.3c3t.comM("B©
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Probe backing 探头背衬û¨NnüíUîbbs.3c3t.comM("B©
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Probe coil 点式线圈û¨NnüíUîbbs.3c3t.comM("B©
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Probe coil 探头式线圈û¨NnüíUîbbs.3c3t.comM("B©
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Probe coil clearance 探头线圈间隙û¨NnüíUîbbs.3c3t.comM("B©
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Probe index 探头入射点û¨NnüíUîbbs.3c3t.comM("B©
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Probe to weld distance 探头-焊缝距离û¨NnüíUîbbs.3c3t.comM("B©
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Probe/ search unit 探头û¨NnüíUîbbs.3c3t.comM("B©
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Process control radiograph 工艺过程控制的射线照相û¨NnüíUîbbs.3c3t.comM("B©
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Processing capacity 处理能力û¨NnüíUîbbs.3c3t.comM("B©
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Processing speed 处理速度û¨NnüíUîbbs.3c3t.comM("B©
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Prods 触头û¨NnüíUîbbs.3c3t.comM("B©
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Projective radiography 投影射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Proportioning probe 比例探头û¨NnüíUîbbs.3c3t.comM("B©
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Protective material 防护材料û¨NnüíUîbbs.3c3t.comM("B©
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Proton radiography 质子射线透照û¨NnüíUîbbs.3c3t.comM("B©
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Pulse 脉冲波û¨NnüíUîbbs.3c3t.comM("B©
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Pulse 脉冲û¨NnüíUîbbs.3c3t.comM("B©
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Pulse echo method 脉冲回波法û¨NnüíUîbbs.3c3t.comM("B©
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Pulse repetition rate 脉冲重复率û¨NnüíUîbbs.3c3t.comM("B©
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Pulse amplitude 脉冲幅度û¨NnüíUîbbs.3c3t.comM("B©
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Pulse echo method 脉冲反射法û¨NnüíUîbbs.3c3t.comM("B©
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Pulse energy 脉冲能量û¨NnüíUîbbs.3c3t.comM("B©
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Pulse envelope 脉冲包络û¨NnüíUîbbs.3c3t.comM("B©
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Pulse length 脉冲长度û¨NnüíUîbbs.3c3t.comM("B©
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Pulse repetition frequency 脉冲重复频率û¨NnüíUîbbs.3c3t.comM("B©
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Pulse tuning 脉冲调谐û¨NnüíUîbbs.3c3t.comM("B©
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Pump- out tubulation 抽气管道û¨NnüíUîbbs.3c3t.comM("B©
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Pump-down time 抽气时间û¨NnüíUîbbs.3c3t.comM("B©
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Q factor Q值û¨NnüíUîbbs.3c3t.comM("B©
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Quadruple traverse technique 四次波法û¨NnüíUîbbs.3c3t.comM("B©
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Quality (of a beam of radiation) 射线束的质û¨NnüíUîbbs.3c3t.comM("B©
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Quality factor 品质因数û¨NnüíUîbbs.3c3t.comM("B©
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Quenching 阻塞û¨NnüíUîbbs.3c3t.comM("B©
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Quenching of fluorescence 荧光的猝灭û¨NnüíUîbbs.3c3t.comM("B©
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Quick break 快速断间û¨NnüíUîbbs.3c3t.comM("B©
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Rad(rad) 拉德û¨NnüíUîbbs.3c3t.comM("B©
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Radiance, L 面辐射率,L û¨NnüíUîbbs.3c3t.comM("B©
Radiant existence, M 幅射照度M û¨NnüíUîbbs.3c3t.comM("B©
Radiant flux; radiant power,ψe 辐射通量、辐射功率、ψe û¨NnüíUîbbs.3c3t.comM("B©
Radiation 辐射û¨NnüíUîbbs.3c3t.comM("B©
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Radiation does 辐射剂量û¨NnüíUîbbs.3c3t.comM("B©
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Radio frequency (r- f) display 射频显示û¨NnüíUîbbs.3c3t.comM("B©
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Radio- frequency mass spectrometer 射频质谱仪û¨NnüíUîbbs.3c3t.comM("B©
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Radio frequency(r-f) display 射频显示û¨NnüíUîbbs.3c3t.comM("B©
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Radiograph 射线底片û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic contrast 射线照片对比度û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic equivalence factor 射线照相等效系数 û¨NnüíUîbbs.3c3t.comM("B©
Radiographic exposure 射线照相曝光量û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic inspection 射线检测û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic inspection 射线照相检验û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic quality 射线照相质量û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic sensitivity 射线照相灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic contrast 射线底片对比度û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic equivalence factor 射线透照等效因子û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic inspection 射线透照检查û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic quality 射线透照质量û¨NnüíUîbbs.3c3t.comM("B©
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Radiographic sensitivity 射线透照灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Radiography 射线照相术û¨NnüíUîbbs.3c3t.comM("B©
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Radiological examination 射线检验û¨NnüíUîbbs.3c3t.comM("B©
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Radiology 射线学û¨NnüíUîbbs.3c3t.comM("B©
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Radiometer 辐射计û¨NnüíUîbbs.3c3t.comM("B©
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Radiometry 辐射测量术û¨NnüíUîbbs.3c3t.comM("B©
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Radioscopy 射线检查法û¨NnüíUîbbs.3c3t.comM("B©
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Range 量程û¨NnüíUîbbs.3c3t.comM("B©
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Rayleigh wave 瑞利波û¨NnüíUîbbs.3c3t.comM("B©
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Rayleigh scattering 瑞利散射û¨NnüíUîbbs.3c3t.comM("B©
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Real image 实时图像û¨NnüíUîbbs.3c3t.comM("B©
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Real-time radioscopy 实时射线检查法û¨NnüíUîbbs.3c3t.comM("B©
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Rearm delay time 重新准备延时时间û¨NnüíUîbbs.3c3t.comM("B©
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Rearm delay time 重新进入工作状态延迟时间û¨NnüíUîbbs.3c3t.comM("B©
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Reciprocity failure 倒易律失效û¨NnüíUîbbs.3c3t.comM("B©
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Reciprocity law 倒易律û¨NnüíUîbbs.3c3t.comM("B©
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Recording medium 记录介质û¨NnüíUîbbs.3c3t.comM("B©
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Recovery time 恢复时间û¨NnüíUîbbs.3c3t.comM("B©
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Rectified alternating current 脉动直流电û¨NnüíUîbbs.3c3t.comM("B©
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Reference block 参考试块û¨NnüíUîbbs.3c3t.comM("B©
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Reference beam 参考光束û¨NnüíUîbbs.3c3t.comM("B©
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Reference block 对比试块û¨NnüíUîbbs.3c3t.comM("B©
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Reference block method 对比试块法û¨NnüíUîbbs.3c3t.comM("B©
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Reference coil 参考线圈û¨NnüíUîbbs.3c3t.comM("B©
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Reference line method 基准线法û¨NnüíUîbbs.3c3t.comM("B©
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Reference standard 参考标准û¨NnüíUîbbs.3c3t.comM("B©
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Reflection 反射û¨NnüíUîbbs.3c3t.comM("B©
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Reflection coefficient 反射系数û¨NnüíUîbbs.3c3t.comM("B©
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Reflection density 反射密度û¨NnüíUîbbs.3c3t.comM("B©
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Reflector 反射体û¨NnüíUîbbs.3c3t.comM("B©
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Refraction 折射û¨NnüíUîbbs.3c3t.comM("B©
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Refractive index 折射率û¨NnüíUîbbs.3c3t.comM("B©
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Refrence beam angle 参考光束角û¨NnüíUîbbs.3c3t.comM("B©
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Reicnlbation 网纹û¨NnüíUîbbs.3c3t.comM("B©
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Reject; suppression 抑制û¨NnüíUîbbs.3c3t.comM("B©
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Rejection level 拒收水平û¨NnüíUîbbs.3c3t.comM("B©
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Relative permeability 相对磁导率û¨NnüíUîbbs.3c3t.comM("B©
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Relevant indication 相关指示û¨NnüíUîbbs.3c3t.comM("B©
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Reluctance 磁阻û¨NnüíUîbbs.3c3t.comM("B©
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Rem(rem) 雷姆û¨NnüíUîbbs.3c3t.comM("B©
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Remote controlled testing 机械化检测û¨NnüíUîbbs.3c3t.comM("B©
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Replenisers 补充剂û¨NnüíUîbbs.3c3t.comM("B©
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Representative quality indicator 代表性质量指示器û¨NnüíUîbbs.3c3t.comM("B©
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Residual magnetic field/field, residual magnetic 剩磁场û¨NnüíUîbbs.3c3t.comM("B©
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Residual technique 剩磁技术û¨NnüíUîbbs.3c3t.comM("B©
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Residual magnetic method 剩磁法û¨NnüíUîbbs.3c3t.comM("B©
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Residual magnetism 剩磁û¨NnüíUîbbs.3c3t.comM("B©
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Resistance (to flow) 气阻û¨NnüíUîbbs.3c3t.comM("B©
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Resolution 分辨力û¨NnüíUîbbs.3c3t.comM("B©
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Resonance method 共振法û¨NnüíUîbbs.3c3t.comM("B©
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Response factor 响应系数û¨NnüíUîbbs.3c3t.comM("B©
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Response time 响应时间û¨NnüíUîbbs.3c3t.comM("B©
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Resultant field 复合磁场û¨NnüíUîbbs.3c3t.comM("B©
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Resultant magnetic field 合成磁场û¨NnüíUîbbs.3c3t.comM("B©
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Resultant magnetization method 组合磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Retentivity 顽磁性û¨NnüíUîbbs.3c3t.comM("B©
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Reversal 反转现象û¨NnüíUîbbs.3c3t.comM("B©
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Ring-down count 振铃计数û¨NnüíUîbbs.3c3t.comM("B©
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Ring-down count rate 振铃计数率û¨NnüíUîbbs.3c3t.comM("B©
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Rinse 清洗û¨NnüíUîbbs.3c3t.comM("B©
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Rise time 上升时间û¨NnüíUîbbs.3c3t.comM("B©
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Rise-time discrimination 上升时间鉴别û¨NnüíUîbbs.3c3t.comM("B©
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Rod-anode tube 棒阳极管û¨NnüíUîbbs.3c3t.comM("B©
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Roentgen(R) 伦琴û¨NnüíUîbbs.3c3t.comM("B©
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Roof angle 屋顶角û¨NnüíUîbbs.3c3t.comM("B©
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Rotational magnetic field 旋转磁场û¨NnüíUîbbs.3c3t.comM("B©
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Rotational magnetic field method 旋转磁场法û¨NnüíUîbbs.3c3t.comM("B©
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Rotational scan 转动扫查û¨NnüíUîbbs.3c3t.comM("B©
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Roughing 低真空û¨NnüíUîbbs.3c3t.comM("B©
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Roughing line 低真空管道û¨NnüíUîbbs.3c3t.comM("B©
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Roughing pump 低真空泵û¨NnüíUîbbs.3c3t.comM("B©
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S S û¨NnüíUîbbs.3c3t.comM("B©
Safelight 安全灯û¨NnüíUîbbs.3c3t.comM("B©
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Sampling probe 取样探头û¨NnüíUîbbs.3c3t.comM("B©
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Saturation 饱和û¨NnüíUîbbs.3c3t.comM("B©
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Saturation,magnetic 磁饱和û¨NnüíUîbbs.3c3t.comM("B©
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Saturation level 饱和电平û¨NnüíUîbbs.3c3t.comM("B©
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Scan on grid lines 格子线扫查û¨NnüíUîbbs.3c3t.comM("B©
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Scan pitch 扫查间距û¨NnüíUîbbs.3c3t.comM("B©
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Scanning 扫查û¨NnüíUîbbs.3c3t.comM("B©
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Scanning index 扫查标记û¨NnüíUîbbs.3c3t.comM("B©
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Scanning directly on the weld 焊缝上扫查û¨NnüíUîbbs.3c3t.comM("B©
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Scanning path 扫查轨迹û¨NnüíUîbbs.3c3t.comM("B©
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Scanning sensitivity 扫查灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Scanning speed 扫查速度û¨NnüíUîbbs.3c3t.comM("B©
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Scanning zone 扫查区域û¨NnüíUîbbs.3c3t.comM("B©
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Scattared energy 散射能量û¨NnüíUîbbs.3c3t.comM("B©
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Scatter unsharpness 散射不清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Scattered neutrons 散射中子û¨NnüíUîbbs.3c3t.comM("B©
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Scattered radiation 散射辐射û¨NnüíUîbbs.3c3t.comM("B©
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Scattering 散射û¨NnüíUîbbs.3c3t.comM("B©
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Schlieren system 施利伦系统û¨NnüíUîbbs.3c3t.comM("B©
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Scintillation counter 闪烁计数器û¨NnüíUîbbs.3c3t.comM("B©
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Scintillator and scintillating crystals 闪烁器和闪烁晶体û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Screen 屏û¨NnüíUîbbs.3c3t.comM("B©
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Screen unsharpness 荧光增感屏不清晰度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Screen-type film 荧光增感型胶片û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
SE probe SE探头û¨NnüíUîbbs.3c3t.comM("B©
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Search-gas 探测气体û¨NnüíUîbbs.3c3t.comM("B©
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Second critical angle 第二临界角û¨NnüíUîbbs.3c3t.comM("B©
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Secondary radiation 二次射线û¨NnüíUîbbs.3c3t.comM("B©
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Secondary coil 二次线圈û¨NnüíUîbbs.3c3t.comM("B©
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Secondary radiation 次级辐射û¨NnüíUîbbs.3c3t.comM("B©
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Selectivity 选择性û¨NnüíUîbbs.3c3t.comM("B©
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Semi-conductor detector 半导体探测器û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Sensitirity va1ue 灵敏度值û¨NnüíUîbbs.3c3t.comM("B©
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Sensitivity 灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Sensitivity of leak test 泄漏检测灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Sensitivity control 灵敏度控制û¨NnüíUîbbs.3c3t.comM("B©
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Shear wave 切变波û¨NnüíUîbbs.3c3t.comM("B©
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Shear wave probe 横波探头û¨NnüíUîbbs.3c3t.comM("B©
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Shear wave technique 横波法û¨NnüíUîbbs.3c3t.comM("B©
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Shim 薄垫片û¨NnüíUîbbs.3c3t.comM("B©
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Shot 冲击通电û¨NnüíUîbbs.3c3t.comM("B©
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Side lobe 副瓣û¨NnüíUîbbs.3c3t.comM("B©
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Side wall 侧面û¨NnüíUîbbs.3c3t.comM("B©
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Sievert(Sv) 希(沃特) û¨NnüíUîbbs.3c3t.comM("B©
Signal 信号û¨NnüíUîbbs.3c3t.comM("B©
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Signal gradient 信号梯度û¨NnüíUîbbs.3c3t.comM("B©
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Signal over load point 信号过载点û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Signal overload level 信号过载电平û¨NnüíUîbbs.3c3t.comM("B©
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Signal to noise ratio 信噪比û¨NnüíUîbbs.3c3t.comM("B©
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Single crystal probe 单晶片探头û¨NnüíUîbbs.3c3t.comM("B©
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Single probe technique 单探头法û¨NnüíUîbbs.3c3t.comM("B©
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Single traverse technique 一次波法û¨NnüíUîbbs.3c3t.comM("B©
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Sizing technique 定量法û¨NnüíUîbbs.3c3t.comM("B©
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Skin depth 集肤深度û¨NnüíUîbbs.3c3t.comM("B©
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Skin effect 集肤效应û¨NnüíUîbbs.3c3t.comM("B©
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Skip distance 跨距û¨NnüíUîbbs.3c3t.comM("B©
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Skip point 跨距点û¨NnüíUîbbs.3c3t.comM("B©
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Sky shine(air scatter) 空中散射效应û¨NnüíUîbbs.3c3t.comM("B©
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Sniffing probe 嗅吸探头û¨NnüíUîbbs.3c3t.comM("B©
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Soft X-rays 软X射线û¨NnüíUîbbs.3c3t.comM("B©
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Soft-faced probe 软膜探头û¨NnüíUîbbs.3c3t.comM("B©
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Solarization 负感作用û¨NnüíUîbbs.3c3t.comM("B©
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Solenoid 螺线管û¨NnüíUîbbs.3c3t.comM("B©
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Soluble developer 可溶显像剂û¨NnüíUîbbs.3c3t.comM("B©
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Solvent remover 溶剂去除剂û¨NnüíUîbbs.3c3t.comM("B©
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Solvent cleaners 溶剂清除剂û¨NnüíUîbbs.3c3t.comM("B©
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Solvent developer 溶剂显像剂û¨NnüíUîbbs.3c3t.comM("B©
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Solvent remover 溶剂洗净剂û¨NnüíUîbbs.3c3t.comM("B©
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Solvent-removal penetrant 溶剂去除型渗透剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Sorption 吸着û¨NnüíUîbbs.3c3t.comM("B©
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Sound diffraction 声绕射û¨NnüíUîbbs.3c3t.comM("B©
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Sound insulating layer 隔声层û¨NnüíUîbbs.3c3t.comM("B©
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Sound intensity 声强û¨NnüíUîbbs.3c3t.comM("B©
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Sound intensity level 声强级û¨NnüíUîbbs.3c3t.comM("B©
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Sound pressure 声压û¨NnüíUîbbs.3c3t.comM("B©
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Sound scattering 声散射û¨NnüíUîbbs.3c3t.comM("B©
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Sound transparent layer 透声层û¨NnüíUîbbs.3c3t.comM("B©
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Sound velocity 声速û¨NnüíUîbbs.3c3t.comM("B©
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Source 源û¨NnüíUîbbs.3c3t.comM("B©
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Source data label 放射源数据标签û¨NnüíUîbbs.3c3t.comM("B©
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Source location 源定位û¨NnüíUîbbs.3c3t.comM("B©
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Source size 源尺寸û¨NnüíUîbbs.3c3t.comM("B©
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Source-film distance 射线源-胶片距离û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Spacial frequency 空间频率û¨NnüíUîbbs.3c3t.comM("B©
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Spark coil leak detector 电火花线圈检漏仪û¨NnüíUîbbs.3c3t.comM("B©
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Specific activity 放射性比度û¨NnüíUîbbs.3c3t.comM("B©
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Specified sensitivity 规定灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Standard 标准û¨NnüíUîbbs.3c3t.comM("B©
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Standard 标准试样û¨NnüíUîbbs.3c3t.comM("B©
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Standard leak rate 标准泄漏率û¨NnüíUîbbs.3c3t.comM("B©
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Standard leak 标准泄漏孔û¨NnüíUîbbs.3c3t.comM("B©
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Standard tast block 标准试块û¨NnüíUîbbs.3c3t.comM("B©
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Standardization instrument 设备标准化û¨NnüíUîbbs.3c3t.comM("B©
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Standing wave; stationary wave 驻波û¨NnüíUîbbs.3c3t.comM("B©
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Step wedge 阶梯楔块û¨NnüíUîbbs.3c3t.comM("B©
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Step- wadge calibration film 阶梯楔块校准底片û¨NnüíUîbbs.3c3t.comM("B©
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Step- wadge comparison film 阶梯楔块比较底片û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Step wedge 阶梯楔块û¨NnüíUîbbs.3c3t.comM("B©
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Step-wedge calibration film 阶梯-楔块校准片û¨NnüíUîbbs.3c3t.comM("B©
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Step-wedge comparison film 阶梯-楔块比较片û¨NnüíUîbbs.3c3t.comM("B©
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Stereo-radiography 立体射线透照术 û¨NnüíUîbbs.3c3t.comM("B©
Subject contrast 被检体对比度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Subsurface discontinuity 近表面不连续性û¨NnüíUîbbs.3c3t.comM("B©
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Suppression 抑制û¨NnüíUîbbs.3c3t.comM("B©
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Surface echo 表面回波û¨NnüíUîbbs.3c3t.comM("B©
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Surface field 表面磁场û¨NnüíUîbbs.3c3t.comM("B©
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Surface noise 表面噪声û¨NnüíUîbbs.3c3t.comM("B©
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Surface wave 表面波û¨NnüíUîbbs.3c3t.comM("B©
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Surface wave probe 表面波探头û¨NnüíUîbbs.3c3t.comM("B©
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Surface wave technique 表面波法û¨NnüíUîbbs.3c3t.comM("B©
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Surge magnetization 脉动磁化û¨NnüíUîbbs.3c3t.comM("B©
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Surplus sensitivity 灵敏度余量û¨NnüíUîbbs.3c3t.comM("B©
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Suspension 磁悬液û¨NnüíUîbbs.3c3t.comM("B©
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Sweep 扫描û¨NnüíUîbbs.3c3t.comM("B©
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Sweep range 扫描范围û¨NnüíUîbbs.3c3t.comM("B©
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Sweep speed 扫描速度û¨NnüíUîbbs.3c3t.comM("B©
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Swept gain 扫描增益û¨NnüíUîbbs.3c3t.comM("B©
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Swivel scan 环绕扫查û¨NnüíUîbbs.3c3t.comM("B©
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System exanlillatien threshold 系统检验阈值û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
System inclacel artifacts 系统感生物û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
System noise 系统噪声û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Tackground, target 目标本底û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Tandem scan 串列扫查û¨NnüíUîbbs.3c3t.comM("B©
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Target 耙û¨NnüíUîbbs.3c3t.comM("B©
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Target 靶û¨NnüíUîbbs.3c3t.comM("B©
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Television fluoroscopy 电视X射线荧光检查û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Temperature envelope 温度范围û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Tenth-value-layer(TVL) 十分之一值层û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Test coil 检测线圈û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Test quality level 检测质量水平û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Test ring 试环û¨NnüíUîbbs.3c3t.comM("B©
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Test block 试块û¨NnüíUîbbs.3c3t.comM("B©
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Test frequency 试验频率û¨NnüíUîbbs.3c3t.comM("B©
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Test piece 试片û¨NnüíUîbbs.3c3t.comM("B©
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Test range 探测范围û¨NnüíUîbbs.3c3t.comM("B©
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Test surface 探测面û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Testing,ulrasonic 超声检测û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thermal neutrons 热中子û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thermocouple gage 热电偶计û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thermogram 热谱图û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thermography, infrared 红外热成象û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thermoluminescent dosemeter(TLD) 热释光剂量计û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thickness sensitivity 厚度灵敏度û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Third critiical angle 第三临界角û¨NnüíUîbbs.3c3t.comM("B©
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Thixotropic penetrant 摇溶渗透剂û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Thormal resolution 热分辨率û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Threading bar 穿棒û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Three way sort 三档分选û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Threshold setting 门限设置û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Threshold fog 阈值灰雾û¨NnüíUîbbs.3c3t.comM("B©
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Threshold level 阀值û¨NnüíUîbbs.3c3t.comM("B©
û¨NnüíUîbbs.3c3t.comM("B©
Threshotd tcnet 门限电平û¨NnüíUîbbs.3c3t.comM("B©
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Throttling 节流û¨NnüíUîbbs.3c3t.comM("B©
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Through transmission technique 穿透技术û¨NnüíUîbbs.3c3t.comM("B©
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Through penetration technique 贯穿渗透法û¨NnüíUîbbs.3c3t.comM("B©
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Through transmission technique; transmission technique 穿透法û¨NnüíUîbbs.3c3t.comM("B©
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Through-coil technique 穿过式线圈技术û¨NnüíUîbbs.3c3t.comM("B©
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Throughput 通气量û¨NnüíUîbbs.3c3t.comM("B©
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Tight 密封û¨NnüíUîbbs.3c3t.comM("B©
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Total reflection 全反射û¨NnüíUîbbs.3c3t.comM("B©
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Totel image unsharpness 总的图像不清晰度û¨NnüíUîbbs.3c3t.comM("B©
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Tracer probe leak location 示踪探头泄漏定位û¨NnüíUîbbs.3c3t.comM("B©
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Tracer gas 示踪气体û¨NnüíUîbbs.3c3t.comM("B©
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Transducer 换能器/传感器û¨NnüíUîbbs.3c3t.comM("B©
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Transition flow 过渡流û¨NnüíUîbbs.3c3t.comM("B©
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Translucent base media 半透明载体介质û¨NnüíUîbbs.3c3t.comM("B©
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Transmission 透射û¨NnüíUîbbs.3c3t.comM("B©
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Transmission densitomefer 发射密度计û¨NnüíUîbbs.3c3t.comM("B©
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Transmission coefficient 透射系数û¨NnüíUîbbs.3c3t.comM("B©
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Transmission point 透射点û¨NnüíUîbbs.3c3t.comM("B©
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Transmission technique 透射技术û¨NnüíUîbbs.3c3t.comM("B©
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Transmittance,τ 透射率τ û¨NnüíUîbbs.3c3t.comM("B©
Transmitted film density 检测底片黑度û¨NnüíUîbbs.3c3t.comM("B©
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Transmitted pulse 发射脉冲û¨NnüíUîbbs.3c3t.comM("B©
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Transverse resolution 横向分辨率û¨NnüíUîbbs.3c3t.comM("B©
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Transverse wave 横波 û¨NnüíUîbbs.3c3t.comM("B©
Traveling echo 游动回波û¨NnüíUîbbs.3c3t.comM("B©
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Travering scan; depth scan 前后扫查û¨NnüíUîbbs.3c3t.comM("B©
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Triangular array 正三角形阵列û¨NnüíUîbbs.3c3t.comM("B©
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Trigger/alarm condition 触发/报警状态û¨NnüíUîbbs.3c3t.comM("B©
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Trigger/alarm level 触发/报警标准û¨NnüíUîbbs.3c3t.comM("B©
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Triple traverse technique 三次波法û¨NnüíUîbbs.3c3t.comM("B©
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True continuous technique 准确连续法技术û¨NnüíUîbbs.3c3t.comM("B©
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Trueattenuation 真实衰减û¨NnüíUîbbs.3c3t.comM("B©
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Tube current 管电流û¨NnüíUîbbs.3c3t.comM("B©
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Tube head 管头û¨NnüíUîbbs.3c3t.comM("B©
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Tube shield 管罩û¨NnüíUîbbs.3c3t.comM("B©
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Tube shutter 管子光闸û¨NnüíUîbbs.3c3t.comM("B©
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Tube window 管窗û¨NnüíUîbbs.3c3t.comM("B©
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Tube-shift radiography 管子移位射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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Two-way sort 两档分选û¨NnüíUîbbs.3c3t.comM("B©
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Ultra- high vacuum 超高真空û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic leak detector 超声波检漏仪û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic noise level 超声噪声电平û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic cleaning 超声波清洗û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic field 超声场û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic flaw detection 超声探伤û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic flaw detector 超声探伤仪û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic microscope 超声显微镜û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic spectroscopy 超声频谱û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic testing system 超声检测系统û¨NnüíUîbbs.3c3t.comM("B©
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Ultrasonic thickness gauge 超声测厚仪û¨NnüíUîbbs.3c3t.comM("B©
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Ultraviolet radiation 紫外辐射û¨NnüíUîbbs.3c3t.comM("B©
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Under development 显影不足û¨NnüíUîbbs.3c3t.comM("B©
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Unsharpness 不清晰û¨NnüíUîbbs.3c3t.comM("B©
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Useful density range 有效光学密度范围û¨NnüíUîbbs.3c3t.comM("B©
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UV-A A类紫外辐射û¨NnüíUîbbs.3c3t.comM("B©
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UV-A filter A类紫外辐射滤片û¨NnüíUîbbs.3c3t.comM("B©
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Vacuum 真空û¨NnüíUîbbs.3c3t.comM("B©
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Vacuum cassette 真空暗盒û¨NnüíUîbbs.3c3t.comM("B©
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Vacuum testing 真空检测û¨NnüíUîbbs.3c3t.comM("B©
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Vacuum cassette 真空暗合û¨NnüíUîbbs.3c3t.comM("B©
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Van de Graaff generator 范德格喇夫起电机û¨NnüíUîbbs.3c3t.comM("B©
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Vapor pressure 蒸汽压û¨NnüíUîbbs.3c3t.comM("B©
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Vapour degreasing 蒸汽除油û¨NnüíUîbbs.3c3t.comM("B©
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Variable angle probe 可变角探头û¨NnüíUîbbs.3c3t.comM("B©
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Vee path V型行程û¨NnüíUîbbs.3c3t.comM("B©
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Vehicle 载体û¨NnüíUîbbs.3c3t.comM("B©
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Vertical linearity 垂直线性û¨NnüíUîbbs.3c3t.comM("B©
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Vertical location 垂直定位û¨NnüíUîbbs.3c3t.comM("B©
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Visible light 可见光û¨NnüíUîbbs.3c3t.comM("B©
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Vitua limage 虚假图像û¨NnüíUîbbs.3c3t.comM("B©
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Voltage threshold 电压阈值û¨NnüíUîbbs.3c3t.comM("B©
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Voltage threshold 阈值电压û¨NnüíUîbbs.3c3t.comM("B©
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Wash station 水洗工位û¨NnüíUîbbs.3c3t.comM("B©
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Water break test 水膜破坏试验û¨NnüíUîbbs.3c3t.comM("B©
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Water column coupling method 水柱耦合法û¨NnüíUîbbs.3c3t.comM("B©
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Water column probe 水柱耦合探头û¨NnüíUîbbs.3c3t.comM("B©
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Water path; water distance 水程û¨NnüíUîbbs.3c3t.comM("B©
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Water tolerance 水容限û¨NnüíUîbbs.3c3t.comM("B©
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Water-washable penetrant 可水洗型渗透剂û¨NnüíUîbbs.3c3t.comM("B©
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Wave 波û¨NnüíUîbbs.3c3t.comM("B©
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Wave guide acoustic emission 声发射波导杆û¨NnüíUîbbs.3c3t.comM("B©
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Wave train 波列û¨NnüíUîbbs.3c3t.comM("B©
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Wave from 波形û¨NnüíUîbbs.3c3t.comM("B©
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Wave front 波前û¨NnüíUîbbs.3c3t.comM("B©
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Wave length 波长û¨NnüíUîbbs.3c3t.comM("B©
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Wave node 波节û¨NnüíUîbbs.3c3t.comM("B©
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Wave train 波列û¨NnüíUîbbs.3c3t.comM("B©
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Wedge 斜楔û¨NnüíUîbbs.3c3t.comM("B©
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Wet slurry technique 湿软磁膏技术û¨NnüíUîbbs.3c3t.comM("B©
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Wet technique 湿法技术û¨NnüíUîbbs.3c3t.comM("B©
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Wet method 湿粉法û¨NnüíUîbbs.3c3t.comM("B©
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Wetting action 润湿作用û¨NnüíUîbbs.3c3t.comM("B©
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Wetting action 润湿作用û¨NnüíUîbbs.3c3t.comM("B©
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Wetting agents 润湿剂û¨NnüíUîbbs.3c3t.comM("B©
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Wheel type probe; wheel search unit 轮式探头û¨NnüíUîbbs.3c3t.comM("B©
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White light 白光û¨NnüíUîbbs.3c3t.comM("B©
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White X-rays 连续X射线û¨NnüíUîbbs.3c3t.comM("B©
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Wobble 摆动û¨NnüíUîbbs.3c3t.comM("B©
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Wobble effect 抖动效应û¨NnüíUîbbs.3c3t.comM("B©
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Working sensitivity 探伤灵敏度û¨NnüíUîbbs.3c3t.comM("B©
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Wrap around 残响波干扰û¨NnüíUîbbs.3c3t.comM("B©
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Xeroradiography 静电射线透照术û¨NnüíUîbbs.3c3t.comM("B©
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X-radiation X射线û¨NnüíUîbbs.3c3t.comM("B©
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X-ray controller X射线控制器û¨NnüíUîbbs.3c3t.comM("B©
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X-ray detection apparatus X射线探伤装置û¨NnüíUîbbs.3c3t.comM("B©
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X-ray film 射线胶片û¨NnüíUîbbs.3c3t.comM("B©
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X-ray paper X射线感光纸û¨NnüíUîbbs.3c3t.comM("B©
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X-ray tube X射线管û¨NnüíUîbbs.3c3t.comM("B©
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X-ray tube diaphragm X射线管光阑û¨NnüíUîbbs.3c3t.comM("B©
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Yoke 磁轭û¨NnüíUîbbs.3c3t.comM("B©
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Yoke magnetization method 磁轭磁化法û¨NnüíUîbbs.3c3t.comM("B©
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Zigzag scan 锯齿扫查û¨NnüíUîbbs.3c3t.comM("B©
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Zone calibration location 时差区域校准定位û¨NnüíUîbbs.3c3t.comM("B©
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Zone location 区域定位û¨NnüíUîbbs.3c3t.comM("B©
cjpfeng - 2006/8/11 5:30:00
谢谢û¨NnüíUîbbs.3c3t.comM("B©
[em20]
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zxd - 2006/9/30 11:56:00
嗯,这个也不错,谢谢楼主。û¨NnüíUîbbs.3c3t.comM("B©