仪器名称Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 信号检测Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 元素测定Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 检测限Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 深度分辨率Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 适用范围Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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扫描电子显微镜（SEM）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 二次及背向散射电子&X射线Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| B-U (EDS mode)Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.1 - 1 at%Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.5 - 3 µm (EDS)Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 高辨析率成像Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
元素微观分析及颗粒特征化描述Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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X射线能谱仪（EDS）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 二次背向散射电子&X射线Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| B-UÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.1 – 1 at%Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.5 – 3 μmÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 小面积上的成像与元素组成；缺陷处元素的识别/绘图；颗粒分析（>300nm）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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显微红外显微镜（FTIR）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 红外线吸收Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 分子群Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.1 - 1 wt%Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.1 - 2.5 µmÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 污染物分析中识别有机化合物的分子结构Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
识别有机颗粒、粉末、薄膜及液体（材料识别）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
量化硅中氧和氢以及氮化硅晶圆中的氢 （Si-H vs. N-H）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
污染物分析（析取、除过气的产品，残余物）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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拉曼光谱（Raman）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 拉曼散射Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 化学及分子键联资料Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| >=1 wt%Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 共焦模式Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
1到5 µmÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 为污染物分析、材料分类以及张力力测量而识别有机和无机化合物的分子结构Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
拉曼，碳层特征 （石墨、金刚石 ）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
非共价键联压焊(复合体、金属键联)Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
定位(随机v. 有组织的结构)Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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俄歇电子能谱仪（AES）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 来自表面附近的Auger电子Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| Li-UÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.1-1%亚单层Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 20 – 200 Ǻ侧面分布模式Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 缺陷分析；颗粒分析；表面分析；小面积深度剖面；薄膜成分分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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X射线光电子能谱仪（XPS）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 来自表面原子附近的光电子Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| Li-U化学键联信息Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 0.01 - 1 at% sub-monolayerÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 20 - 200 Å（剖析模式）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
10 - 100 Å (表面分析）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 有机材料、无机材料、污点、残留物的表面分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
测量表面成分及化学状态信息Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
薄膜成份的深度剖面Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
硅 氧氮化物厚度和测量剂量Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
薄膜氧化物厚度测量（SiO2, Al2O3 等.）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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飞行时间二次离子质谱仪（TOF-SIMS）Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 分子和元素种类Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 整个周期表，加分子种类Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 107 - 1010at/cm2 sub-monolayerÅê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 1 - 3 monolayers (Static mode)Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 有机材料和无机材料的表面微量分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
来自表面的大量光谱Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
表面离子成像Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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塑料断口红色颗粒物分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 塑料表面白色粉末成分分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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连接端子pin针表面异物分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
| 金手指端部表面异物分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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镀金管脚表面异物分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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PCB表面异物成分分析Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F Åê.aöQþ»¼ibbs.3c3t.comR³VÁù¢F
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