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中 文 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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A.C magnetic saturation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
交流磁饱和 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Absorbed dose ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
吸收剂量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Absorbed dose rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
吸收剂量率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Acceptanc limits ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
验收范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acceptance level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
验收水平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acceptance standard ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
验收标准 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Accumulation test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
累积检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Acoustic emission count(emission count) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声发射计数(发射计数) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Acoustic emission transducer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声发射换能器(声发射传感器) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic emission(AE) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声发射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic holography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声全息术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic impedance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声阻抗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic impedance matching ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声阻抗匹配 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic impedance method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声阻法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustical lens ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声透镜 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Acoustic—ultrasonic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声-超声(AU) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Activation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
活化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Activity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
活度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Adequate shielding ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
安全屏蔽 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Ampere turns ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
安匝数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Amplitude ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
幅度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle beam method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
斜射法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle of incidence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
入射角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle of reflection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反射角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle of spread ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
指向角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle of squint ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
偏向角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angle probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
斜探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Angstrom unit ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
埃(A) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Area amplitude response curve ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
面积幅度曲线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Area of interest ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
评定区 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Arliflcial disconlinuity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
人工不连续性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Artifact ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
假缺陷 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Artificial defect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
人工缺陷 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Artificial discontinuity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准人工缺陷 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A型扫描 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A-scope; A-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A型显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Attenuation coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
衰减系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Attenuator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
衰减器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Audible leak indicator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
音响泄漏指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Automatic testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
自动检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Autoradiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
自射线照片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Avaluation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
评定 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Barium concrete ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
钡混凝土 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Barn ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
靶 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Base fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
片基灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bath ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
槽液 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bayard- Alpert ionization gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
B- A型电离计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Beam ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam ratio ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光束比 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
束张角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam axis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声束轴线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam index ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声束入射点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam path location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声程定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam path; path length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声程 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Beam spread ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声束扩散 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Betatron ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子感应加速器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Bimetallic strip gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双金属片计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Bipolar field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双极磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Black light filter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑光滤波器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Black light; ultraviolet radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Blackbody ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Blackbody equivalent temperature ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑体等效温度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Bleakney mass spectrometer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波利克尼质谱仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bleedout ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗出 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bottom echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
底面回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bottom surface ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
底面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Boundary echo(first) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
边界一次回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Bremsstrahlung ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
轫致辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Broad-beam condition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
宽射束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Brush application ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
刷涂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
B-scan presenfation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
B型扫描显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
B-scope; B-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
B型显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
C- scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
C型扫描 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Calibration,instrument ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
设备校准 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Capillary action ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
毛细管作用 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Carrier fluid ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
载液 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Carry over of penetrate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透剂移转 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Cassette ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
暗合 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Cathode ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阴极 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Central conductor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中心导体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Central conductor method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中心导体法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Characteristic curve ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
特性曲线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Characteristic curve of film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片特性曲线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Characteristic radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
特征辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Chemical fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
化学灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Cine-radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线(活动)电影摄影术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Cintact pads ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
接触垫 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Circumferential coils ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
圆环线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Circumferential field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
周向磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Circumferential magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
周向磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Clean ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
清理 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Clean- up ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
清除 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Clearing time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定透时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Coercive force ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
矫顽力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Coherence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相干性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Coherence length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相干长度(谐波列长度) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coi1,test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
测试线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coil size ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线圈大小 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coil spacing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线圈间距 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coil technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线圈技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Coil method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线圈法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coilreference ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线圈参考 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coincidence discrimination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
符合鉴别 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Cold-cathode ionization gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
冷阴极电离计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Collimator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
准直器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Collimation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
准直 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Collimator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
准直器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Combined colour comtrast and fluorescent penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
着色荧光渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Compressed air drying ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压缩空气干燥 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Compressional wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压缩波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Compton scatter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
康普顿散射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Continuous emission ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续发射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Continuous linear array ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续线阵 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Continuous method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Continuous spectrum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续谱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Continuous wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Contract stretch ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比度宽限 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Contrast agent ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Contrast aid ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反差剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Contrast sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Control echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
监视回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Control echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Couplant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
耦合剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coupling ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
耦合 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Coupling losses ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
耦合损失 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Cracking ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
裂解 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Creeping wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
爬波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Critical angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
临界角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Cross section ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横截面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Cross talk ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
串音 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Cross-drilled hole ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横孔 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Crystal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
晶片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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C-scope; C-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
C型显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Curie point ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
居里点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Curie temperature ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
居里温度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Curie(Ci) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
居里 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Current flow method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
通电法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Current induction method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电流感应法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Current magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电流磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Cut-off level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
截止电平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Dead zone ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
盲区 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Decay curve ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
衰变曲线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Decibel(dB) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
分贝 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Defect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Defect resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷分辨力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Defect detection sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷检出灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Defect resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷分辨力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Definition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Definition, image definition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
清晰度,图像清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Demagnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
退磁 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Demagnetization factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
退磁因子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Demagnetizer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
退磁装置 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Densitometer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑度计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑度(底片) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Density comparison strip ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
黑度比较片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Detecting medium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检验介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Detergent remover ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
洗净液 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developer station ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显像工位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developer, agueons ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水性显象剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developer, dry ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干显象剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developer, liquid film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
液膜显象剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Developer, nonaqueous (sus- pendible) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非水(可悬浮)显象剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Developing time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显像时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Development ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显影 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Diffraction mottle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
衍射斑 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Diffuse indications ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
松散指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Diffusion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扩散 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Digital image acquisition system ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
数字图像识别系统 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Dilatational wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
膨胀波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dip and drain station ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
浸渍和流滴工位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Direct contact magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
直接接触磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Direct exposure imaging ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
直接曝光成像 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Direct contact method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
直接接触法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Directivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
指向性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Discontinuity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
不连续性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Distance- gain- size-German AVG ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
距离- 增益- 尺寸(DGS德文为AVG) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Distance marker; time marker ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
距离刻度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Dose equivalent ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剂量当量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Dose rate meter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剂量率计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Dosemeter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剂量计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Double crystal probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双晶片探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Double probe technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双探头法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Double transceiver technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双发双收法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Double traverse technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
二次波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dragout ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
带出 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drain time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
滴落时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drain time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
流滴时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drift ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
漂移 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry powder ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干粉 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干粉技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry developing cabinet ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干显像柜 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dry method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干粉法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drying oven ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干燥箱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drying station ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干燥工位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Drying time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干燥时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
D-scope; D-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
D型显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dual search unit ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dual-focus tube ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双焦点管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Duplex-wire image quality indicator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
双线像质指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Duration ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
持续时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dwell time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
停留时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dye penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
着色渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dynamic leak test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
动态泄漏检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dynamic leakage measurement ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
动态泄漏测量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dynamic range ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
动态范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Dynamic radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
动态射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
回波频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo height ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
回波高度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
回波指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo transmittance of sound pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
往复透过率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Echo width ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
回波宽度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Eddy current ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
涡流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Eddy current flaw detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
涡流探伤仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Eddy current testiog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
涡流检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Edge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
端面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Edge effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
边缘效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Edge echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
棱边回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Edge effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
边缘效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective depth penetration (EDP) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效穿透深度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective focus size ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效焦点尺寸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective magnetic permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective reflection surface of flaw ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷有效反射面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Effective resistance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效电阻 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Elastic medium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
弹性介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electric displacement ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电位移 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electrical center ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电中心 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electrode ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电极 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electromagnet ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电磁铁 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electro-magnetic acoustic transducer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电磁声换能器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electromagnetic induction ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电磁感应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electromagnetic radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电磁辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electromagnetic testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电磁检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electro-mechanical coupling factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
机电耦合系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electron radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子辐射照相术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electron volt ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子伏恃 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electronic noise ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子噪声 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Electrostatic spraying ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
静电喷涂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Emulsification ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
乳化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Emulsification time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
乳化时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Emulsifier ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
乳化剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Encircling coils ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
环绕式线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
End effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
端部效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Energizing cycle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
激励周期 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Equalizing filter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
均衡滤波器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Equivalent ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
当量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Equivalent I.Q. I. Sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
象质指示器当量灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Equivalent nitrogen pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
等效氮压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Equivalent penetrameter sensifivty ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透度计当量灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Equivalent method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
当量法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Erasabl optical medium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可探光学介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Etching ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
浸蚀 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Evaluation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
评定 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Evaluation threshold ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
评价阈值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Event count ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
事件计数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Event count rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
事件计数率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Examination area ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检测范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Examination region ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检验区域 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Exhaust pressure/discharge pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
排气压力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Exhaust tubulation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
排气管道 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Expanded time-base sweep ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
时基线展宽 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Exposure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
曝光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Exposure table ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
曝光表格 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Exposure chart ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
曝光曲线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Exposure fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
曝光灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Exposure,radiographic exposure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
曝光,射线照相曝光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Extended source ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扩展源 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Facility scattered neutrons ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
条件散射中子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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False indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
假指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Family ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
族 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Far field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
远场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Feed-through coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
穿过式线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Field, resultant magnetic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
复合磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fill factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
填充系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Film speed ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film badge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片襟章剂量计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film base ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
片基 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film gamma ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片γ值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film processing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片冲洗加工 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film speed ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片感光度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Film viewing screen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
观察屏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Filter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
滤波器/滤光板 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Final test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
复探 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flat-bottomed hole ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
平底孔 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flat-bottomed hole equivalent ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
平底孔当量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flaw ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
伤 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flaw characterization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
伤特性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flaw echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flexural wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
弯曲波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Floating threshold ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
浮动阀值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent examination method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光检验法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent magnetic particle inspection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光磁粉检验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent dry deposit penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干沉积荧光渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent light ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent magnetic powder ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光磁粉 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluorescent screen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光屏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fluoroscopy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光检查法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flux leakage field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁通泄漏场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Flux lines ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁通线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focal spot ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focal distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦距 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focus length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦点长度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focus size ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦点尺寸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focus width ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦点宽度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focus(electron) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子焦点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focused beam ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
聚焦声束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focusing probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
聚焦探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Focus-to-film distance(f.f.d) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焦点-胶片距离(焦距) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
底片灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fog density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
灰雾密度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Footcandle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
英尺烛光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Freguency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Frequency constant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
频率常数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fringe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干涉带 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Front distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
前沿距离 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Front distance of flaw ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷前沿距离 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Full- wave direct current(FWDC) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
全波直流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Fundamental frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
基频 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Furring ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
毛状迹痕 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gage pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gain ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
增益 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gamma radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
γ射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gamma ray source ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
γ射线源 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gamma ray source container ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
γ射线源容器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gamma rays ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
γ射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gamma-ray radiographic equipment ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
γ射线透照装置 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gap scanning ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
间隙扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gas ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
气体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
闸门 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gating technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
选通技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gauss ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
高斯 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Geiger-Muller counter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
盖革.弥勒计数器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Geometric unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
几何不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Gray(Gy) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
戈瑞 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Grazing incidence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
掠入射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Grazing angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
掠射角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Group velocity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
群速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Half life ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半衰期 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Half- wave current (HW) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半波电流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Half-value layer(HVL) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半值层 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Half-value method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半波高度法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Halogen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
卤素 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Halogen leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
卤素检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hard X-rays ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
硬X射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hard-faced probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
硬膜探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Harmonic analysis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
谐波分析 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Harmonic distortion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
谐波畸变 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Harmonics ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
谐频 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Head wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
头波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Helium bombing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
氦轰击法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Helium drift ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
氦漂移 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Helium leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
氦检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hermetically tight seal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
气密密封 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
High vacuum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
高真空 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
High energy X-rays ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
高能X射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Holography (optical) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光全息照相 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Holography, acoustic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声全息 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hydrophilic emulsifier ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
亲水性乳化剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hydrophilic remover ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
亲水性洗净剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hydrostatic text ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
流体静力检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hysteresis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁滞 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Hysteresis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁滞 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
IACS ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
IACS ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
ID coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
ID线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image definition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image enhancement ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像增强 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image magnification ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像放大 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image quality ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像质量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image quality indicator sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
像质指示器灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Image quality indicator(IQI)/image quality indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
像质指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Imaging line scanner ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
图像线扫描器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Immersion probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
液浸探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Immersion rinse ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
浸没清洗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Immersion testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
液浸法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Immersion time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
浸没时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Impedance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阻抗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Impedance plane diagram ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阻抗平面图 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Imperfection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
不完整性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Impulse eddy current testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
脉冲涡流检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Incremental permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
增量磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indicated defect area ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷指示面积 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indicated defect length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
缺陷指示长度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indirect exposure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
间接曝光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indirect magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
间接磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indirect magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
间接磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Indirect scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
间接扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Induced field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
感应磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Induced current method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
感应电流法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Infrared imaging system ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
红外成象系统 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Infrared sensing device ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
红外扫描器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inherent fluorescence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
固有荧光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inherent filtration ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
固有滤波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Initial permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
起始磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Initial pulse ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
始脉冲 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Initial pulse width ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
始波宽度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inserted coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
插入式线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inside coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
内部线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inside- out testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
外泄检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inspection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inspection medium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检查介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Inspection frequency/ test frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检测频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Intensifying factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
增感系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Intensifying screen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
增感屏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Interal,arrival time (Δtij)/arrival time interval(Δtij) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
到达时间差(Δtij) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Interface boundary ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
界面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Interface echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
界面回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Interface trigger ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
界面触发 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Interference ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干涉 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Interpretation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
解释 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ion pump ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
离子泵 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ion source ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
离子源 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ionization chamber ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电离室 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ionization potential ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电离电位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ionization vacuum gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电离真空计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ionography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电离射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Irradiance, E ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射通量密度, E ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Isolation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
隔离检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Isotope ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
同位素 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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K value ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
K值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Kaiser effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
凯塞(Kaiser)效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Kilo volt ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
kv 千伏特 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Kiloelectron volt ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
keV千电子伏特 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Krypton 85 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
氪85 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
L/D ratio ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
L/D比 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lamb wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
兰姆波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Latent image ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
潜象 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lateral scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
左右扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lateral scan with oblique angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
斜平行扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Latitude (of an emulsion) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
胶片宽容度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lead screen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
铅屏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leak ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏孔 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leak artifact ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leak testtion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leakage field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leakage rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Leechs ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁吸盘 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lift-off effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
提离效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Light intensity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光强度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Limiting resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
极限分辨率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Line scanner ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线扫描器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Line focus ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线焦点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Line pair pattern ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线对检测图 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Line pairs per millimetre ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
每毫米线对数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Linear (electron) accelerator(LINAC) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子直线加速器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Linear attenuation coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线衰减系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Linear scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Linearity (time or distance) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
线性(时间或距离) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Linearity, anplitude ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
幅度线性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lines of force ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁力线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lipophilic emulsifier ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
亲油性乳化剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lipophilic remover ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
亲油性洗净剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Liquid penetrant examination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
液体渗透检验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Liquid film developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
液膜显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Local magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
局部磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Local magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
局部磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Local scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
局部扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Localizing cone ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定域喇叭筒 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location accuracy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位精度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location computed ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位,计算 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location marker ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位标记 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location upon delta-T ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
时差定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location, clusfer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位,群集 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Location,continuous AE signal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定位,连续AE信号 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵向磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵向磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵向分辨率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal wave probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵波探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Longitudinal wave technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
纵波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Loss of back reflection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
背面反射损失 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Loss of back reflection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
底面反射损失 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Love wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
乐甫波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Low energy gamma radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
低能γ辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Low-enerugy photon radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
低能光子辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Luminance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
亮度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Luminosity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
流明 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Lusec ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
流西克 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Maga or million electron volts ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
MeV兆电子伏特 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic history ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁化史 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic hysteresis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁性滞后 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic particle field indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁粉磁场指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic particle inspection flaw indications ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁粉检验的伤显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic circuit ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁路 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic domain ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁畴 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic field distribution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁场分布 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic field indicator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁场指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic field meter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁场计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic field strength ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁场强度(H) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic field/field,magnetic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic flux ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁通 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic flux density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁通密度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic force ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁化力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic leakage field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
漏磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic leakage flux ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
漏磁通 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic moment ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁矩 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic particle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁粉 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic particle indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁痕 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic particle testing/magnetic particle examination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁粉检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic pole ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁极 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic saturataion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁饱和 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic saturation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁饱和 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic slorage meclium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁储介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetic writing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁写 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetizing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetizing current ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁化电流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetizing coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁化线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetostrictive effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁致伸缩效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Magnetostrictive transducer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁致伸缩换能器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Main beam ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
主声束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Manual testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
手动检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Markers ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
时标 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
MA-scope; MA-scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
MA型显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Masking ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
遮蔽 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mass attcnuation coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质量吸收系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mass number ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质量数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mass spectrometer (M.S.) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质谱仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mass spectrometer leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质谱检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mass spectrum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质谱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Master/slave discrimination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
主从鉴别 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
MDTD ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
最小可测温度差 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mean free path ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
平均自由程 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Medium vacuum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中真空 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mega or million volt ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
MV兆伏特 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Micro focus X - ray tube ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
微焦点X 光管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Microfocus radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
微焦点射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Micrometre ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
微米 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Micron of mercury ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
微米汞柱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Microtron ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子回旋加速器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Milliampere ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
毫安(mA) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Millimetre of mercury ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
毫米汞柱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Minifocus x- ray tube ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
小焦点调射线管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Minimum detectable leakage rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
最小可探泄漏率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Minimum resolvable temperature difference (MRTD) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
最小可分辨温度差(MRDT) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mode ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波型 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Mode conversion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波型转换 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Mode transformation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波型转换 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Moderator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
慢化器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Modulation transfer function (MTF) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
调制转换功能(MTF) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Modulation analysis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
调制分析 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Molecular flow ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
分子流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Molecular leak ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
分子泄漏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Monitor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
监控器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Monochromatic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
单色波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Movement unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
移动不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Moving beam radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可动射束射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiaspect magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多向磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multidirectional magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多向磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multifrequency eddy current testiog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多频涡流检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple back reflections ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多次背面反射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple reflections ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多次反射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple back reflections ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多次底面反射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple echo method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多次反射法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple probe technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多探头法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Multiple triangular array ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
多三角形阵列 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Narrow beam condition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
窄射束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
NC ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
NC ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Near field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
近场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Near field length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
近场长度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Near surface defect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
近表面缺陷 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Net density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
净黑度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Net density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
净(光学)密度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Neutron ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Neutron radiograhy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中子射线透照 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Neutron radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
中子射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Newton (N) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
牛顿 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nier mass spectrometer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
尼尔质谱仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Noise ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
噪声 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Noise ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
噪声 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Noise equivalent temperature difference (NETD) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
噪声当量温度差(NETD) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Nominal angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标称角度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nominal frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标称频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Non-aqueous liquid developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非水性液体显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Noncondensable gas ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非冷凝气体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nondcstructivc Examination(NDE) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
无损试验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nondestructive Evaluation(NDE) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
无损评价 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nondestructive Inspection(NDI) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
无损检验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nondestructive Testing(NDT) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
无损检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nonerasble optical data ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可固定光学数据 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nonferromugnetic material ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非铁磁性材料 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nonrelevant indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非相关指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Non-screen-type film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
非增感型胶片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normal incidence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
垂直入射(亦见直射声束) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normal permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normal beam method; straight beam method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
垂直法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normal probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
直探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normalized reactance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
归一化电抗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Normalized resistance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
归一化电阻 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Nuclear activity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
核活性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Nuclide ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
核素 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object plane resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
物体平面分辨率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object scattered neutrons ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
物体散射中子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object beam ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
物体光束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object beam angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
物体光束角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object-film distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
被检体-胶片距离 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Object一film distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
物体- 胶片距离 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Over development ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显影过度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Over emulsfication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
过乳化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Overall magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
整体磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Overload recovery time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
过载恢复时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Overwashing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
过洗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Oxidation fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
氧化灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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P ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
P ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pair production ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
偶生成 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Pair production ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子对产生 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Pair production ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电子偶的产生 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Palladium barrier leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
钯屏检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Panoramic exposure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
全景曝光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Parallel scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
平行扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Paramagnetic material ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
顺磁性材料 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Parasitic echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
干扰回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Partial pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
分压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Particle content ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁悬液浓度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Particle velocity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
质点(振动)速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Pascal (Pa) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
帕斯卡(帕) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pascal cubic metres per second ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
帕立方米每秒(Pa·m3/s ) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Path length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光程长 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Path length difference ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光程长度差 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Pattern ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探伤图形 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Peak current ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
峰值电流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Penetrameter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透度计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Penetrameter sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透度计灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Penetrant comparator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透对比试块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Penetrant flaw detection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透探伤 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Penetrant removal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透剂去除 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Penetrant station ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Penetrant, water- washable ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水洗型渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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穿透深度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Penetration time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
渗透时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Permanent magnet ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Permeability coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透气系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Permeability,a-c ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
交流磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Permeability,d-c ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
直流磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phantom echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
幻象回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase analysis ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相位分析 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相位角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase controlled circuit breaker ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
断电相位控制器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase detection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相位检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase hologram ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相位全息 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase sensitive detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相敏检波器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase shift ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相位移 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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相速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phase-sensitive system ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相敏系统 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phillips ionization gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
菲利浦电离计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Phosphor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光物质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Photo fluorography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光照相术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Photoelectric absorption ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光电吸收 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Photographic emulsion ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Photographic fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Photostimulable luminescence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
光敏发光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric material ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电材料 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric stiffness constant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电劲度常数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric stress constant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电应力常数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric transducer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电换能器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Piezoelectric voltage constant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压电电压常数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pirani gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pirani gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pitch and catch technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
一发一收法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pixel ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
象素 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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象素尺寸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pixel, disply size ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
象素显示尺寸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Planar array ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
平面阵(列) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Plane wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Plate wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
板波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Plate wave technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
板波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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点源 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Post emulsification ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
后乳化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Post-cleaning ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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喷粉器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Powder blower ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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压力差 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pressure dye test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压力着色检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pressure probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压力探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pressure testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
压力检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pressure- evacuation test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pressure mark ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pre-test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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一次线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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初级辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe gas ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探头检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe backing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe index ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe to weld distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Probe/ search unit ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Process control radiograph ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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处理速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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触头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Projective radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Proportioning probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
比例探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Protective material ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
防护材料 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Proton radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Pulse echo method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Q值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Quadruple traverse technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
四次波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Quality (of a beam of radiation) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线束的质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Quality factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
品质因数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Quenching ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阻塞 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Quenching of fluorescence ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光的猝灭 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Quick break ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
快速断间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rad(rad) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
拉德 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiance, L ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
面辐射率,L ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiant existence, M ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
幅射照度M ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiant flux; radiant power,ψe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射通量、辐射功率、ψe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiation does ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射剂量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radio frequency (r- f) display ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射频显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radio- frequency mass spectrometer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射频质谱仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radio frequency(r-f) display ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射频显示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiograph ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线底片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照片对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic equivalence factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相等效系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic exposure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相曝光量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic inspection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic inspection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相检验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic quality ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相质量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线底片对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic equivalence factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线透照等效因子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic inspection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线透照检查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic quality ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线透照质量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiographic sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线透照灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线照相术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiological examination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线检验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiology ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线学 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiometer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radiometry ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
辐射测量术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Radioscopy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线检查法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Range ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
量程 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rayleigh wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
瑞利波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rayleigh scattering ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
瑞利散射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Real image ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
实时图像 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Real-time radioscopy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
实时射线检查法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rearm delay time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
重新准备延时时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rearm delay time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
重新进入工作状态延迟时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reciprocity failure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
倒易律失效 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reciprocity law ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
倒易律 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Recording medium ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
记录介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Recovery time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
恢复时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rectified alternating current ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
脉动直流电 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference block ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考试块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference beam ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考光束 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference block ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比试块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference block method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
对比试块法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference line method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
基准线法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reference standard ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考标准 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reflection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reflection coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反射系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reflection density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反射密度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reflector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反射体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Refraction ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
折射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Refractive index ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
折射率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Refrence beam angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
参考光束角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reicnlbation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
网纹 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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Reject; suppression ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
抑制 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rejection level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
拒收水平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Relative permeability ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相对磁导率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Relevant indication ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
相关指示 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reluctance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁阻 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rem(rem) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
雷姆 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Remote controlled testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
机械化检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Replenisers ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
补充剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Representative quality indicator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
代表性质量指示器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Residual magnetic field/field, residual magnetic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剩磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Residual technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剩磁技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Residual magnetic method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剩磁法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Residual magnetism ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
剩磁 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resistance (to flow) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
气阻 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
分辨力 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resonance method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
共振法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Response factor ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
响应系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Response time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
响应时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resultant field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
复合磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resultant magnetic field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
合成磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Resultant magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
组合磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Retentivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
顽磁性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Reversal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
反转现象 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ring-down count ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
振铃计数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ring-down count rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
振铃计数率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rinse ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
清洗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rise time ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
上升时间 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rise-time discrimination ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
上升时间鉴别 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rod-anode tube ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
棒阳极管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Roentgen(R) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
伦琴 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Roof angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
屋顶角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rotational magnetic field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
旋转磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rotational magnetic field method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
旋转磁场法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Rotational scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
转动扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Roughing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
低真空 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Roughing line ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
低真空管道 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Roughing pump ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
低真空泵 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
S ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
S ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Safelight ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
安全灯 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sampling probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
取样探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Saturation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
饱和 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Saturation,magnetic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁饱和 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Saturation level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
饱和电平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scan on grid lines ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
格子线扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scan pitch ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查间距 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning index ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查标记 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning directly on the weld ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
焊缝上扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning path ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查轨迹 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning speed ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scanning zone ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫查区域 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scattared energy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
散射能量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scatter unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
散射不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scattered neutrons ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
散射中子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scattered radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
散射辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scattering ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
散射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Schlieren system ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
施利伦系统 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scintillation counter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
闪烁计数器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Scintillator and scintillating crystals ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
闪烁器和闪烁晶体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Screen ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
屏 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Screen unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光增感屏不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Screen-type film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
荧光增感型胶片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
SE probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
SE探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Search-gas ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探测气体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Second critical angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
第二临界角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Secondary radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
二次射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Secondary coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
二次线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Secondary radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
次级辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Selectivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
选择性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Semi-conductor detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半导体探测器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sensitirity va1ue ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
灵敏度值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sensitivity of leak test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
泄漏检测灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sensitivity control ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
灵敏度控制 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Shear wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
切变波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Shear wave probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横波探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Shear wave technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Shim ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
薄垫片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Shot ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
冲击通电 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Side lobe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
副瓣 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Side wall ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
侧面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sievert(Sv) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
希(沃特) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Signal ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
信号 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Signal gradient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
信号梯度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Signal over load point ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
信号过载点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Signal overload level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
信号过载电平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Signal to noise ratio ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
信噪比 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Single crystal probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
单晶片探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Single probe technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
单探头法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Single traverse technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
一次波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sizing technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
定量法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Skin depth ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
集肤深度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Skin effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
集肤效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Skip distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
跨距 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Skip point ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
跨距点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sky shine(air scatter) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
空中散射效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sniffing probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
嗅吸探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Soft X-rays ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
软X射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Soft-faced probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
软膜探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solarization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
负感作用 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solenoid ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
螺线管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Soluble developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可溶显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solvent remover ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
溶剂去除剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solvent cleaners ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
溶剂清除剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solvent developer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
溶剂显像剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solvent remover ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
溶剂洗净剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Solvent-removal penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
溶剂去除型渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sorption ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
吸着 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound diffraction ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声绕射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound insulating layer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
隔声层 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound intensity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声强 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound intensity level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声强级 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound scattering ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声散射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound transparent layer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透声层 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sound velocity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声速 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Source ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
源 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Source data label ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
放射源数据标签 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Source location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
源定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Source size ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
源尺寸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Source-film distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线源-胶片距离 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Spacial frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
空间频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Spark coil leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电火花线圈检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Specific activity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
放射性比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Specified sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
规定灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standard ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standard ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准试样 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standard leak rate ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准泄漏率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standard leak ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准泄漏孔 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standard tast block ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
标准试块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standardization instrument ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
设备标准化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Standing wave; stationary wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
驻波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step wedge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯楔块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step- wadge calibration film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯楔块校准底片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step- wadge comparison film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯楔块比较底片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step wedge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯楔块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step-wedge calibration film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯-楔块校准片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Step-wedge comparison film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阶梯-楔块比较片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Stereo-radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
立体射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Subject contrast ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
被检体对比度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Subsurface discontinuity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
近表面不连续性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Suppression ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
抑制 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面磁场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface noise ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面噪声 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface wave probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面波探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surface wave technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
表面波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surge magnetization ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
脉动磁化 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Surplus sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
灵敏度余量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Suspension ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁悬液 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sweep ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫描 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sweep range ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫描范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Sweep speed ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫描速度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Swept gain ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
扫描增益 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Swivel scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
环绕扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
System exanlillatien threshold ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
系统检验阈值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
System inclacel artifacts ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
系统感生物 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
System noise ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
系统噪声 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tackground, target ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
目标本底 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tandem scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
串列扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Target ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
耙 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Target ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
靶 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Television fluoroscopy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电视X射线荧光检查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Temperature envelope ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
温度范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tenth-value-layer(TVL) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
十分之一值层 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test coil ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检测线圈 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test quality level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检测质量水平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test ring ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
试环 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test block ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
试块 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test frequency ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
试验频率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test piece ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
试片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test range ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探测范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Test surface ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探测面 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Testing,ulrasonic ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thermal neutrons ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
热中子 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thermocouple gage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
热电偶计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thermogram ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
热谱图 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thermography, infrared ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
红外热成象 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thermoluminescent dosemeter(TLD) ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
热释光剂量计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thickness sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
厚度灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Third critiical angle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
第三临界角 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thixotropic penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
摇溶渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Thormal resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
热分辨率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Threading bar ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
穿棒 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Three way sort ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
三档分选 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Threshold setting ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
门限设置 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Threshold fog ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阈值灰雾 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Threshold level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阀值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Threshotd tcnet ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
门限电平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Throttling ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
节流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Through transmission technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
穿透技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Through penetration technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
贯穿渗透法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Through transmission technique; transmission technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
穿透法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Through-coil technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
穿过式线圈技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Throughput ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
通气量 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tight ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
密封 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Total reflection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
全反射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Totel image unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
总的图像不清晰度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tracer probe leak location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
示踪探头泄漏定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tracer gas ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
示踪气体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transducer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
换能器/传感器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transition flow ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
过渡流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Translucent base media ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
半透明载体介质 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmission ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmission densitomefer ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
发射密度计 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmission coefficient ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透射系数 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmission point ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透射点 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmission technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透射技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmittance,τ ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
透射率τ ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmitted film density ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
检测底片黑度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transmitted pulse ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
发射脉冲 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transverse resolution ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横向分辨率 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Transverse wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
横波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Traveling echo ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
游动回波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Travering scan; depth scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
前后扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Triangular array ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
正三角形阵列 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Trigger/alarm condition ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
触发/报警状态 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Trigger/alarm level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
触发/报警标准 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Triple traverse technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
三次波法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
True continuous technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
准确连续法技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Trueattenuation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
真实衰减 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube current ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管电流 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube head ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube shield ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管罩 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube shutter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管子光闸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube window ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管窗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Tube-shift radiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
管子移位射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Two-way sort ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
两档分选 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultra- high vacuum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超高真空 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic leak detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声波检漏仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic noise level ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声噪声电平 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic cleaning ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声波清洗 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic field ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声场 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic flaw detection ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声探伤 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic flaw detector ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声探伤仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic microscope ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声显微镜 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic spectroscopy ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声频谱 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic testing system ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声检测系统 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultrasonic thickness gauge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
超声测厚仪 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Ultraviolet radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
紫外辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Under development ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
显影不足 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Unsharpness ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
不清晰 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Useful density range ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
有效光学密度范围 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
UV-A ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A类紫外辐射 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
UV-A filter ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
A类紫外辐射滤片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vacuum ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
真空 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vacuum cassette ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
真空暗盒 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vacuum testing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
真空检测 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vacuum cassette ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
真空暗合 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Van de Graaff generator ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
范德格喇夫起电机 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vapor pressure ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
蒸汽压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vapour degreasing ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
蒸汽除油 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
variable angle probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可变角探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vee path ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
V型行程 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vehicle ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
载体 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vertical linearity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
垂直线性 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vertical location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
垂直定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Visible light ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可见光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Vitua limage ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
虚假图像 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Voltage threshold ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
电压阈值 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Voltage threshold ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
阈值电压 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wash station ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水洗工位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water break test ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水膜破坏试验 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water column coupling method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水柱耦合法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water column probe ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水柱耦合探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water path; water distance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水程 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water tolerance ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
水容限 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Water-washable penetrant ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
可水洗型渗透剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave guide acoustic emission ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
声发射波导杆 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave train ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波列 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave from ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波形 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave front ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波前 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave length ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波长 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave node ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波节 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wave train ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
波列 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wedge ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
斜楔 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wet slurry technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
湿软磁膏技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wet technique ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
湿法技术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wet method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
湿粉法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wetting action ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
润湿作用 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wetting action ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
润湿作用 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wetting agents ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
润湿剂 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wheel type probe; wheel search unit ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
轮式探头 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
White light ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
白光 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
White X-rays ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
连续X射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wobble ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
摆动 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wobble effect ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
抖动效应 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Working sensitivity ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
探伤灵敏度 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Wrap around ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
残响波干扰 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Xeroradiography ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
静电射线透照术 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-radiation ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray controller ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线控制器 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray detection apparatus ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线探伤装置 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray film ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
射线胶片 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray paper ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线感光纸 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray tube ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线管 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X-ray tube diaphragm ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
X射线管光阑 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Yoke ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁轭 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Yoke magnetization method ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
磁轭磁化法 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Zigzag scan ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
锯齿扫查 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
Zone calibration location ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
时差区域校准定位 ¶>ØÎEk@!bbs.3c3t.comÖó«£)YI
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