[文章] 常用中英文对照无损检测词汇 [复制链接]

英          文 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中         文 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A.C magnetic saturation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
交流磁饱和 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Absorbed dose ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
吸收剂量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Absorbed dose rate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
吸收剂量率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acceptanc  limits ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
验收范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acceptance  level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
验收水平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acceptance  standard ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
验收标准 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Accumulation  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
累积检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Acoustic emission  count（emission count） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声发射计数（发射计数） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic emission transducer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声发射换能器（声发射传感器） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Acoustic emission(AE) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声发射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Acoustic holography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声全息术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic impedance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声阻抗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic impedance matching ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声阻抗匹配 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic impedance method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声阻法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustical lens ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声透镜 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Acoustic—ultrasonic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声-超声（AU） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Activation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
活化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Activity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
活度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Adequate shielding ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
安全屏蔽 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Ampere turns ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
安匝数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Amplitude ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
幅度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Angle beam method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
斜射法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Angle of incidence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
入射角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Angle of reflection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反射角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Angle of spread ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
指向角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Angle of squint ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
偏向角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Angle probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
斜探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Angstrom unit ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
埃(A) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Area amplitude response curve ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
面积幅度曲线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Area of interest ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
评定区 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Arliflcial  disconlinuity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
人工不连续性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Artifact ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
假缺陷 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Artificial defect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
人工缺陷 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Artificial discontinuity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准人工缺陷 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A-scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A型扫描 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A-scope; A-scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A型显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Attenuation coefficient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
衰减系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Attenuator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
衰减器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Audible  leak  indicator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
音响泄漏指示器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Automatic testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
自动检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Autoradiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
自射线照片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Avaluation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
评定 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Barium concrete ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
钡混凝土 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Barn ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
靶 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Base fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
片基灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bath ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
槽液 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Bayard- Alpert  ionization  gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
B- A型电离计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam ratio ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光束比 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
束张角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam axis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声束轴线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam index ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声束入射点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam path location ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声程定位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Beam path; path length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声程 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Beam spread ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声束扩散 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Betatron ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电子感应加速器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bimetallic strip gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双金属片计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bipolar field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双极磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Black light filter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑光滤波器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Black light; ultraviolet radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Blackbody ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Blackbody  equivalent  temperature ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑体等效温度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bleakney mass  spectrometer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波利克尼质谱仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bleedout ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗出 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Bottom echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
底面回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Bottom surface ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
底面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Boundary echo(first) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
边界一次回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Bremsstrahlung ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
轫致辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Broad-beam condition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
宽射束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Brush application ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
刷涂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
B-scan  presenfation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
B型扫描显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
B-scope;  B-scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
B型显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
C- scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
C型扫描 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Calibration,instrument ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
设备校准 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Capillary action ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
毛细管作用 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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Carrier fluid ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
载液 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Carry over of penetrate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透剂移转 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cassette ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
暗合 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cathode ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阴极 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Central  conductor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中心导体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Central conductor method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中心导体法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Characteristic  curve ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
特性曲线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Characteristic curve of film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
胶片特性曲线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Characteristic radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
特征辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Chemical fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
化学灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cine-radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线(活动)电影摄影术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cintact pads ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
接触垫 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Circumferential  coils ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
圆环线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Circumferential field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
周向磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Circumferential magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
周向磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Clean ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
清理 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Clean- up ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
清除 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Clearing time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
定透时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coercive force ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
矫顽力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coherence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相干性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coherence  length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相干长度（谐波列长度） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coi1，test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
测试线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coil  size ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线圈大小 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coil spacing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线圈间距 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coil technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线圈技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coil method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线圈法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coilreference ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线圈参考 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coincidence discrimination ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
符合鉴别 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cold-cathode  ionization  gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
冷阴极电离计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Collimator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
准直器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Collimation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
准直 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Collimator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
准直器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Combined colour comtrast and fluorescent penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
着色荧光渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Compressed air drying ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压缩空气干燥 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Compressional  wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压缩波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Compton scatter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
康普顿散射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Continuous emission ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续发射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Continuous linear array ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续线阵 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Continuous method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Continuous spectrum ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续谱 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Continuous wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Contract  stretch ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比度宽限 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Contrast ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Contrast  agent ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Contrast aid ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反差剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Contrast sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Control echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
监视回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Control echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Couplant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
耦合剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coupling ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
耦合 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Coupling losses ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
耦合损失 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cracking ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
裂解 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Creeping wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
爬波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Critical angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
临界角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cross section ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横截面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cross talk ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
串音 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cross-drilled hole ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横孔 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Crystal ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
晶片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
C-scope;  C-scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
C型显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Curie point ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
居里点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Curie temperature ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
居里温度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Curie(Ci) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
居里 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Current flow method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
通电法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Current induction  method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电流感应法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Current magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电流磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Cut－off  level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
截止电平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dead zone ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
盲区 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Decay curve ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
衰变曲线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Decibel(dB) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
分贝 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Defect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Defect  resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷分辨力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Defect detection sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷检出灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Defect resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷分辨力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Definition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Definition，  image  definition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
清晰度，图像清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Demagnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
退磁 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Demagnetization factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
退磁因子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Demagnetizer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
退磁装置 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Densitometer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑度计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑度（底片） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Density  comparison  strip ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
黑度比较片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Detecting medium ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检验介质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Detergent remover ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
洗净液 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer station ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显像工位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer，  agueons ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水性显象剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer，  dry ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干显象剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer，  liquid  film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
液膜显象剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developer，  nonaqueous  （sus- pendible） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非水（可悬浮）显象剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Developing time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显像时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Development ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显影 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Diffraction mottle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
衍射斑 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Diffuse  indications ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
松散指示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Diffusion ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扩散 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Digital  image  acquisition  system ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
数字图像识别系统 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dilatational wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
膨胀波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dip and drain station ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
浸渍和流滴工位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Direct  contact  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
直接接触磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Direct  exposure  imaging ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
直接曝光成像 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Direct contact method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
直接接触法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Directivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
指向性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Discontinuity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
不连续性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Distance- gain- size-German  AVG ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
距离- 增益- 尺寸（DGS德文为AVG） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Distance marker; time marker ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
距离刻度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dose equivalent ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剂量当量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dose rate meter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剂量率计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dosemeter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剂量计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Double crystal probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双晶片探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Double probe technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双探头法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Double transceiver technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双发双收法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Double traverse technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
二次波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dragout ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
带出 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drain  time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
滴落时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drain time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
流滴时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drift ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
漂移 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry powder ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干粉 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干粉技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry developing cabinet ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干显像柜 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dry method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干粉法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drying oven ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干燥箱 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drying station ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干燥工位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Drying time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干燥时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
D-scope;  D-scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
D型显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dual search  unit ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dual-focus tube ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双焦点管 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Duplex-wire image quality indicator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
双线像质指示器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Duration ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
持续时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dwell  time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
停留时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dye penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
着色渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dynamic  leak  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
动态泄漏检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dynamic  leakage  measurement ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
动态泄漏测量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dynamic  range ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
动态范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Dynamic radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
动态射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
回波频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo height ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
回波高度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo indication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
回波指示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo transmittance of sound pressure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
往复透过率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Echo width ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
回波宽度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Eddy current ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
涡流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Eddy current flaw detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
涡流探伤仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Eddy current testiog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
涡流检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Edge ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
端面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Edge effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
边缘效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Edge echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
棱边回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Edge effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
边缘效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective  depth  penetration  （EDP） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效穿透深度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective focus size ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效焦点尺寸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective magnetic permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective reflection surface of flaw ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷有效反射面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Effective resistance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效电阻 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Elastic medium ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
弹性介质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Electric displacement ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电位移 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Electrical center ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电中心 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Electrode ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电极 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Electromagnet ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电磁铁 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Electro-magnetic acoustic transducer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电磁声换能器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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焦点宽度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Focus(electron) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电子焦点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Focused beam ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
聚焦声束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Focusing probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
聚焦探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Focus-to-film distance(f.f.d) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
焦点-胶片距离（焦距） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
底片灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Fog density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
灰雾密度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Footcandle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
英尺烛光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Freguency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Frequency constant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
频率常数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Fringe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干涉带 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Front distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
前沿距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Front distance of flaw ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷前沿距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Full- wave  direct  current（FWDC） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
全波直流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Fundamental frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
基频 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Furring ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
毛状迹痕 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gage  pressure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表压 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gain ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
增益 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gamma radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
γ射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gamma ray source ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
γ射线源 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gamma ray source container ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
γ射线源容器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gamma rays ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
γ射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gamma-ray radiographic equipment ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
γ射线透照装置 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gap scanning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
间隙扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gas ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
气体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
闸门 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gating technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
选通技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gauss ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
高斯 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Geiger-Muller counter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
盖革.弥勒计数器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Geometric unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
几何不清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Gray(Gy) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
戈瑞 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Grazing  incidence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
掠入射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Grazing angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
掠射角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Group velocity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
群速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Half life ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半衰期 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Half- wave  current  （HW） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半波电流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Half-value layer(HVL) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半值层 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Half-value method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半波高度法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Halogen ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
卤素 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Halogen  leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
卤素检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hard X-rays ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
硬X射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hard-faced probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
硬膜探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Harmonic analysis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
谐波分析 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Harmonic distortion ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
谐波畸变 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Harmonics ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
谐频 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Head wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
头波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Helium  bombing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
氦轰击法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Helium  drift ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
氦漂移 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Helium  leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
氦检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hermetically  tight  seal ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
气密密封 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
High  vacuum ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
高真空 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
High energy X-rays ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
高能X射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Holography (optical) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光全息照相 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Holography，  acoustic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声全息 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hydrophilic emulsifier ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
亲水性乳化剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hydrophilic remover ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
亲水性洗净剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hydrostatic text ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
流体静力检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hysteresis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁滞 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Hysteresis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁滞 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
IACS ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
IACS ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
ID coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
ID线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image definition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image contrast ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像对比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image enhancement ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像增强 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image magnification ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像放大 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image quality ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像质量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image quality indicator sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
像质指示器灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Image quality indicator(IQI)/image  quality  indication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
像质指示器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Imaging  line  scanner ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
图像线扫描器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Immersion probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
液浸探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Immersion rinse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
浸没清洗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Immersion testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
液浸法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Immersion time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
浸没时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Impedance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阻抗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Impedance plane diagram ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阻抗平面图 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Imperfection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
不完整性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Impulse eddy current testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲涡流检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Incremental permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
增量磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indicated defect area ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷指示面积 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indicated defect length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
缺陷指示长度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
指示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indirect  exposure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
间接曝光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indirect  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
间接磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indirect magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
间接磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Indirect scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
间接扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Induced  field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
感应磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Induced current method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
感应电流法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Infrared  imaging system ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
红外成象系统 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Infrared  sensing  device ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
红外扫描器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inherent  fluorescence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
固有荧光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inherent filtration ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
固有滤波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Initial permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
起始磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Initial pulse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
始脉冲 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Initial pulse width ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
始波宽度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inserted  coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
插入式线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inside  coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
内部线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inside- out  testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
外泄检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inspection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inspection  medium ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检查介质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Inspection frequency/ test frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检测频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Intensifying factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
增感系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Intensifying screen ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
增感屏 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interal,arrival time  （Δtij)/arrival time interval（Δtij） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
到达时间差(Δtij) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interface boundary ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
界面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interface echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
界面回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interface trigger ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
界面触发 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interference ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干涉 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Interpretation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
解释 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ion pump ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
离子泵 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ion source ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
离子源 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ionization chamber ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电离室 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ionization potential ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电离电位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ionization vacuum gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电离真空计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ionography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电离射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Irradiance，  E ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射通量密度，  E ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Isolation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
隔离检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Isotope ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
同位素 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
K value ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
K值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Kaiser effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
凯塞(Kaiser)效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Kilo volt ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
kv  千伏特 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Kiloelectron  volt ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
keV千电子伏特 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Krypton  85 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
氪85 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
L／D ratio ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
L/D比 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lamb  wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
兰姆波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Latent image ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
潜象 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lateral scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
左右扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lateral scan with oblique angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
斜平行扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Latitude (of an emulsion) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
胶片宽容度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lead  screen ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
铅屏 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leak ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏孔 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leak  artifact ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leak  testtion ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leakage  field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leakage  rate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Leechs ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁吸盘 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lift-off effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
提离效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Light  intensity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光强度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Limiting  resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
极限分辨率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Line  scanner ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线扫描器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Line focus ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线焦点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Line pair pattern ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线对检测图 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Line pairs per millimetre ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
每毫米线对数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Linear (electron) accelerator(LINAC) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电子直线加速器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Linear attenuation coefficient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线衰减系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Linear scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Linearity  （time  or  distance） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
线性（时间或距离） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Linearity，  anplitude ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
幅度线性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lines of force ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁力线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lipophilic emulsifier ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
亲油性乳化剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Lipophilic remover ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
亲油性洗净剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Liquid  penetrant  examination ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
液体渗透检验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Liquid film developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
液膜显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Local  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
局部磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Local magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
局部磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Local scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
局部扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Localizing cone ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
定域喇叭筒 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Location ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
定位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Minimum  resolvable  temperature  difference  （MRTD） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
最小可分辨温度差（MRDT） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Mode ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波型 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Mode  conversion ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波型转换 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Mode transformation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波型转换 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Moderator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
慢化器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Modulation  transfer  function  （MTF） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
调制转换功能（MTF） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Modulation analysis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
调制分析 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Molecular  flow ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
分子流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Molecular  leak ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
分子泄漏 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Monitor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
监控器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Monochromatic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
单色波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Movement unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
移动不清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Moving beam radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可动射束射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiaspect magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多向磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multidirectional  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多向磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multifrequency eddy current testiog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多频涡流检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple  back  reflections ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多次背面反射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple  reflections ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多次反射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple back reflections ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多次底面反射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple echo method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多次反射法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple probe technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多探头法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Multiple triangular array ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
多三角形阵列 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Narrow beam condition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
窄射束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
NC ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
NC ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Near field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
近场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Near field length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
近场长度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Near surface defect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
近表面缺陷 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Net  density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
净黑度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Net density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
净(光学)密度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Neutron ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Neutron  radiograhy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中子射线透照 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Neutron radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
中子射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Newton  （N） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
牛顿 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nier  mass  spectrometer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
尼尔质谱仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Noise ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
噪声 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Noise ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
噪声 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Noise  equivalent  temperature  difference  （NETD） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
噪声当量温度差（NETD） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nominal angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标称角度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nominal frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标称频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Non-aqueous liquid developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非水性液体显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Noncondensable  gas ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非冷凝气体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nondcstructivc  Examination（NDE） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
无损试验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nondestructive  Evaluation（NDE） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
无损评价 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nondestructive  Inspection（NDI） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
无损检验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nondestructive  Testing（NDT） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
无损检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nonerasble  optical  data ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可固定光学数据 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nonferromugnetic  material ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非铁磁性材料 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nonrelevant indication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非相关指示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Non-screen-type film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
非增感型胶片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normal  incidence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
垂直入射（亦见直射声束） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normal  permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normal beam method; straight beam method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
垂直法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normal probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
直探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normalized reactance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
归一化电抗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Normalized resistance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
归一化电阻 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nuclear  activity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
核活性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Nuclide ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
核素 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object  plane  resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
物体平面分辨率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object  scattered  neutrons ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
物体散射中子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object beam ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
物体光束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object beam angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
物体光束角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object-film distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
被检体-胶片距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Object一film  distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
物体- 胶片距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Over development ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显影过度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Over emulsfication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
过乳化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Overall  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
整体磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Overload recovery time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
过载恢复时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Overwashing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
过洗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Oxidation  fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
氧化灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
P ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
P ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pair  production ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
偶生成 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pair  production ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电子对产生 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pair production ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电子偶的产生 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Palladium  barrier  leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
钯屏检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Panoramic exposure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
全景曝光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Parallel scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
平行扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Paramagnetic material ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
顺磁性材料 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Parasitic echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
干扰回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Partial  pressure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
分压 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Particle content ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁悬液浓度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Particle velocity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
质点(振动)速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pascal  （Pa） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
帕斯卡（帕） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pascal  cubic  metres  per  second ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
帕立方米每秒（Pa·m3/s ） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Path  length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光程长 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Path  length  difference ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光程长度差 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pattern ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探伤图形 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Peak current ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
峰值电流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrameter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透度计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrameter  sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透度计灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant  comparator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透对比试块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant flaw detection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透探伤 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant removal ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透剂去除 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant station ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透工位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetrant，  water- washable ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水洗型渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetration ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
穿透深度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Penetration time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
渗透时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Permanent magnet ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
永久磁铁 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Permeability  coefficient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透气系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Permeability，a-c ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
交流磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Permeability，d－c ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
直流磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phantom echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
幻象回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase analysis ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相位分析 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相位角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase controlled circuit breaker ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
断电相位控制器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase detection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相位检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase hologram ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相位全息 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase sensitive detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相敏检波器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase shift ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相位移 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase velocity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phase-sensitive system ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相敏系统 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phillips  ionization  gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
菲利浦电离计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Phosphor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
荧光物质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Photo  fluorography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
荧光照相术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Photoelectric absorption ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光电吸收 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Photographic emulsion ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
照相乳剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Photographic fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
照相灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Photostimulable  luminescence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
光敏发光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric material ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电材料 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric stiffness constant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电劲度常数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric stress constant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电应力常数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric transducer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电换能器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Piezoelectric voltage constant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压电电压常数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pirani  gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
皮拉尼计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pirani gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
皮拉尼计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pitch and catch technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
一发一收法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pixel ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
象素 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pixel  size ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
象素尺寸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pixel，  disply  size ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
象素显示尺寸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Planar array ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
平面阵(列) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Plane wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
平面波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Plate wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
板波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Plate wave technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
板波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Point  source ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
点源 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Post  emulsification ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
后乳化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Post emulsifiable penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
后乳化渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Post-cleaning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
后清除 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Post-cleaning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
后清洗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Powder ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
粉未 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Powder  blower ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
喷粉器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Powder blower ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁粉喷* ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pre-cleaning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
预清理 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure  difference ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压力差 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure  dye  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压力着色检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure  probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压力探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure  testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压力检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure- evacuation  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压力抽空检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure mark ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
压痕 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pressure,design ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
设计压力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pre-test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
初探 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Primary coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
一次线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Primary radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
初级辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe  gas ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头气体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe backing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头背衬 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
点式线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头式线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe coil clearance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头线圈间隙 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe index ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头入射点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe to weld distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头-焊缝距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Probe/ search unit ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Process  control  radiograph ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
工艺过程控制的射线照相 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Processing capacity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
处理能力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Processing speed ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
处理速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Prods ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
触头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Projective radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
投影射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Proportioning  probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
比例探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Protective material ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
防护材料 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Proton radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
质子射线透照 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse  echo  method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲回波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse  repetition  rate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲重复率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse amplitude ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲幅度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse echo method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲反射法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse energy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲能量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse envelope ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲包络 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲长度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse repetition frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲重复频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pulse tuning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉冲调谐 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pump- out  tubulation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
抽气管道 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Pump-down  time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
抽气时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Q factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Q值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quadruple traverse technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
四次波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quality (of a beam of radiation) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线束的质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quality factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
品质因数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quenching ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阻塞 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quenching of fluorescence ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
荧光的猝灭 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Quick  break ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
快速断间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rad(rad) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
拉德 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiance，  L ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
面辐射率，L ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiant  existence，  M ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
幅射照度M ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiant  flux；  radiant power，ψe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射通量、辐射功率、ψe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiation does ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射剂量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radio  frequency  （r- f）  display ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射频显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radio- frequency mass  spectrometer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射频质谱仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radio frequency(r-f) display ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射频显示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiograph ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线底片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  contrast ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照片对比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  equivalence  factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相等效系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  exposure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相曝光量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  inspection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  inspection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相检验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  quality ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相质量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic  sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic contrast ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线底片对比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic equivalence factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线透照等效因子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic inspection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线透照检查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic quality ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线透照质量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiographic sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线透照灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线照相术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiological  examination ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线检验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiology ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线学 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiometer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radiometry ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
辐射测量术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Radioscopy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线检查法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Range ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
量程 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rayleigh  wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
瑞利波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rayleigh scattering ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
瑞利散射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Real image ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
实时图像 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Real-time  radioscopy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
实时射线检查法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rearm delay time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
重新准备延时时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rearm delay time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
重新进入工作状态延迟时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reciprocity failure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
倒易律失效 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reciprocity law ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
倒易律 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Recording medium ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
记录介质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Recovery time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
恢复时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rectified alternating current ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉动直流电 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference  block ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考试块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference beam ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考光束 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference block ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比试块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference block method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
对比试块法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference line method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
基准线法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reference standard ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考标准 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reflection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reflection coefficient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反射系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reflection density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反射密度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reflector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反射体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Refraction ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
折射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Refractive index ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
折射率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Refrence beam angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
参考光束角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reicnlbation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
网纹 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reject; suppression ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
抑制 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rejection level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
拒收水平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Relative permeability ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相对磁导率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Relevant indication ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
相关指示 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reluctance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁阻 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rem(rem) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
雷姆 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Remote controlled testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
机械化检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Replenisers ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
补充剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Representative  quality  indicator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
代表性质量指示器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Residual  magnetic  field/field，  residual  magnetic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剩磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Residual  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剩磁技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Residual magnetic method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剩磁法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Residual magnetism ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
剩磁 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resistance  （to  flow） ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
气阻 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
分辨力 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resonance method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
共振法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Response factor ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
响应系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Response time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
响应时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resultant  field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
复合磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resultant magnetic field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
合成磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Resultant magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
组合磁化法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Retentivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
顽磁性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Reversal ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
反转现象 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ring-down count ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
振铃计数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ring-down count rate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
振铃计数率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rinse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
清洗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rise time ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
上升时间 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rise-time discrimination ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
上升时间鉴别 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rod-anode tube ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
棒阳极管 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Roentgen(R) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
伦琴 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Roof angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
屋顶角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rotational magnetic field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
旋转磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rotational magnetic field method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
旋转磁场法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Rotational scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
转动扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Roughing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
低真空 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Roughing  line ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
低真空管道 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Roughing  pump ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
低真空泵 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
S ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
S ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Safelight ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
安全灯 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sampling probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
取样探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Saturation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
饱和 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Saturation，magnetic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁饱和 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Saturation  level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
饱和电平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scan on grid lines ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
格子线扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scan pitch ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查间距 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning  index ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查标记 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning directly on the weld ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
焊缝上扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning path ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查轨迹 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning speed ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scanning zone ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫查区域 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scattared energy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
散射能量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scatter unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
散射不清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scattered  neutrons ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
散射中子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scattered radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
散射辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scattering ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
散射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Schlieren system ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
施利伦系统 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scintillation counter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
闪烁计数器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Scintillator and scintillating crystals ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
闪烁器和闪烁晶体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Screen ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
屏 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Screen unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
荧光增感屏不清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Screen-type film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
荧光增感型胶片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
SE  probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
SE探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Search-gas ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探测气体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Second critical angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
第二临界角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Secondary  radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
二次射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Secondary coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
二次线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Secondary radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
次级辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Selectivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
选择性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Semi-conductor detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半导体探测器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sensitirity  va1ue ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
灵敏度值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sensitivity  of  leak test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
泄漏检测灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sensitivity control ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
灵敏度控制 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Shear  wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
切变波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Shear wave probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横波探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Shear wave technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Shim ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
薄垫片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Shot ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
冲击通电 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Side lobe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
副瓣 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Side wall ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
侧面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sievert(Sv) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
希(沃特) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Signal ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
信号 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Signal gradient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
信号梯度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Signal over load point ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
信号过载点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Signal overload level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
信号过载电平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Signal to noise ratio ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
信噪比 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Single crystal probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
单晶片探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Single probe technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
单探头法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Single traverse technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
一次波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sizing technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
定量法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Skin depth ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
集肤深度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Skin effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
集肤效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Skip distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
跨距 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Skip point ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
跨距点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sky shine(air scatter) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
空中散射效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sniffing  probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
嗅吸探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Soft X-rays ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
软X射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Soft-faced probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
软膜探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solarization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
负感作用 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solenoid ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
螺线管 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Soluble developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可溶显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solvent  remover ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
溶剂去除剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solvent cleaners ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
溶剂清除剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solvent developer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
溶剂显像剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solvent remover ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
溶剂洗净剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Solvent-removal penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
溶剂去除型渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sorption ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
吸着 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound diffraction ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声绕射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound insulating layer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
隔声层 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound intensity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声强 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound intensity level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声强级 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound pressure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声压 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound scattering ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声散射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound transparent layer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透声层 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sound velocity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声速 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Source ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
源 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Source data label ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
放射源数据标签 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Source location ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
源定位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Source size ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
源尺寸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Source-film distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线源-胶片距离 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Spacial  frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
空间频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Spark  coil  leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电火花线圈检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Specific activity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
放射性比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Specified sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
规定灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standard ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standard ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准试样 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standard   leak  rate ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准泄漏率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standard leak ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准泄漏孔 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standard tast block ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
标准试块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standardization  instrument ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
设备标准化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Standing wave; stationary wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
驻波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step  wedge ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯楔块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step- wadge  calibration  film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯楔块校准底片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step- wadge  comparison  film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯楔块比较底片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step wedge ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯楔块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step-wedge calibration film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯-楔块校准片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Step-wedge comparison film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阶梯-楔块比较片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Stereo-radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
立体射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Subject contrast ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
被检体对比度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Subsurface  discontinuity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
近表面不连续性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Suppression ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
抑制 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面磁场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface noise ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面噪声 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface wave probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面波探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surface wave technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
表面波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surge  magnetization ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
脉动磁化 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Surplus sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
灵敏度余量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Suspension ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁悬液 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sweep ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫描 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sweep range ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫描范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Sweep speed ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫描速度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Swept  gain ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
扫描增益 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Swivel scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
环绕扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
System  exanlillatien  threshold ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
系统检验阈值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
System  inclacel  artifacts ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
系统感生物 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
System  noise ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
系统噪声 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tackground，  target ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
目标本底 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tandem scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
串列扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Target ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
耙 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Target ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
靶 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Television fluoroscopy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电视X射线荧光检查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Temperature  envelope ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
温度范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tenth-value-layer(TVL) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
十分之一值层 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test  coil ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检测线圈 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test quality  level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检测质量水平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test ring ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
试环 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test block ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
试块 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test frequency ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
试验频率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test piece ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
试片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test range ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探测范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Test surface ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探测面 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Testing，ulrasonic ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thermal  neutrons ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
热中子 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thermocouple gage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
热电偶计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thermogram ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
热谱图 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thermography，  infrared ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
红外热成象 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thermoluminescent dosemeter(TLD) ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
热释光剂量计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thickness sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
厚度灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Third critiical angle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
第三临界角 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thixotropic penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
摇溶渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Thormal  resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
热分辨率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Threading bar ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
穿棒 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Three  way  sort ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
三档分选 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Threshold  setting ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
门限设置 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Threshold fog ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阈值灰雾 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Threshold level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阀值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Threshotd  tcnet ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
门限电平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Throttling ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
节流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Through  transmission  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
穿透技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Through penetration technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
贯穿渗透法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Through transmission technique; transmission technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
穿透法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Through-coil  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
穿过式线圈技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Throughput ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
通气量 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tight ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
密封 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Total reflection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
全反射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Totel  image  unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
总的图像不清晰度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tracer  probe  leak  location ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
示踪探头泄漏定位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tracer gas ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
示踪气体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transducer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
换能器/传感器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transition flow ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
过渡流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Translucent  base  media ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
半透明载体介质 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmission ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmission  densitomefer ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
发射密度计 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmission coefficient ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透射系数 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmission point ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透射点 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmission technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透射技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmittance，τ ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
透射率τ ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmitted  film  density ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
检测底片黑度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transmitted pulse ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
发射脉冲 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transverse resolution ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横向分辨率 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Transverse wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
横波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Traveling echo ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
游动回波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Travering scan; depth scan ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
前后扫查 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Triangular array ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
正三角形阵列 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Trigger/alarm condition ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
触发/报警状态 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Trigger/alarm level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
触发/报警标准 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Triple traverse technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
三次波法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
True  continuous  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
准确连续法技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Trueattenuation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
真实衰减 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube current ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管电流 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube head ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube shield ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管罩 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube shutter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管子光闸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube window ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管窗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Tube-shift radiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
管子移位射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Two-way  sort ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
两档分选 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultra- high  vacuum ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超高真空 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic  leak  detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声波检漏仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic  noise  level ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声噪声电平 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic cleaning ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声波清洗 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic field ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声场 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic flaw detection ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声探伤 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic flaw detector ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声探伤仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic microscope ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声显微镜 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic spectroscopy ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声频谱 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic testing system ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声检测系统 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultrasonic thickness gauge ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
超声测厚仪 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Ultraviolet radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
紫外辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Under development ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
显影不足 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Unsharpness ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
不清晰 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Useful density range ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
有效光学密度范围 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
UV-A ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A类紫外辐射 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
UV-A filter ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
A类紫外辐射滤片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vacuum ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
真空 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vacuum  cassette ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
真空暗盒 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vacuum  testing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
真空检测 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vacuum cassette ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
真空暗合 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Van de Graaff generator ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
范德格喇夫起电机 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vapor  pressure ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
蒸汽压 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vapour degreasing ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
蒸汽除油 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
variable angle probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可变角探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vee  path ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
V型行程 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vehicle ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
载体 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vertical linearity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
垂直线性 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vertical location ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
垂直定位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Visible light ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可见光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Vitua limage ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
虚假图像 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Voltage  threshold ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
电压阈值 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Voltage threshold ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
阈值电压 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wash station ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水洗工位 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water  break  test ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水膜破坏试验 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water column coupling method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水柱耦合法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water column probe ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水柱耦合探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water path; water distance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水程 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water tolerance ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
水容限 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Water-washable penetrant ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
可水洗型渗透剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave  guide  acoustic  emission ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
声发射波导杆 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave  train ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波列 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave from ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波形 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave front ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波前 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave length ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波长 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave node ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波节 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wave train ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
波列 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wedge ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
斜楔 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wet  slurry  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
湿软磁膏技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wet  technique ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
湿法技术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wet method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
湿粉法 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wetting  action ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
润湿作用 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wetting action ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
润湿作用 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wetting agents ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
润湿剂 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wheel type probe; wheel search unit ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
轮式探头 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
White  light ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
白光 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
White X-rays ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
连续X射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wobble ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
摆动 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wobble effect ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
抖动效应 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Working sensitivity ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
探伤灵敏度 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Wrap  around ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
残响波干扰 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Xeroradiography ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
静电射线透照术 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-radiation ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray controller ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线控制器 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray detection apparatus ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线探伤装置 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray film ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
射线胶片 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray paper ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线感光纸 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray tube ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线管 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X-ray tube diaphragm ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
X射线管光阑 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Yoke ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
磁轭 ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
Yoke magnetization method ¯Ì†–JV³œbbs.3c3t.com[A[û2é»·‡±
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