英 文 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中 文 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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A.C magnetic saturation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
交流磁饱和 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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吸收剂量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Absorbed dose rate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
吸收剂量率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acceptanc limits qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
验收范围 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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验收标准 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Accumulation test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
累积检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic emission count（emission count） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声发射计数（发射计数） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic emission transducer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声发射换能器（声发射传感器） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic emission(AE) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声发射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic holography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声全息术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic impedance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声阻抗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic impedance matching qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声阻抗匹配 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic impedance method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声阻法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustic wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Acoustical lens qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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声-超声（AU） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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活化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Activity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
活度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Adequate shielding qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
安全屏蔽 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ampere turns qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
安匝数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Amplitude qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angle beam method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
斜射法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angle of incidence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
入射角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angle of reflection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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指向角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angle of squint qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angle probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
斜探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Angstrom unit qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
埃(A) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Area amplitude response curve qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
面积幅度曲线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Area of interest qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
评定区 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Arliflcial disconlinuity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
人工不连续性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Artifact qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
假缺陷 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Artificial defect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
人工缺陷 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Artificial discontinuity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
标准人工缺陷 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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A-scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
A型扫描 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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A-scope; A-scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
A型显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Attenuation coefficient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
衰减系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Attenuator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
衰减器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Audible leak indicator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
音响泄漏指示器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Automatic testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
自动检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Autoradiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
自射线照片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Avaluation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
评定 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Barium concrete qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
钡混凝土 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Barn qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
靶 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Base fog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
片基灰雾 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bath qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
槽液 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bayard- Alpert ionization gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
B- A型电离计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Beam qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Beam ratio qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光束比 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Beam angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
束张角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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声束轴线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Beam index qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声束入射点 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Beam path location qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声程定位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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声程 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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声束扩散 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Betatron qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电子感应加速器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bimetallic strip gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
双金属片计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bipolar field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
双极磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Black light filter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑光滤波器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Black light; ultraviolet radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Blackbody qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Blackbody equivalent temperature qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑体等效温度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bleakney mass spectrometer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
波利克尼质谱仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bleedout qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗出 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bottom echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
底面回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bottom surface qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
底面 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Boundary echo(first) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
边界一次回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Bremsstrahlung qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
轫致辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Broad-beam condition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
宽射束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Brush application qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
刷涂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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B-scan presenfation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
B型扫描显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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B-scope; B-scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
B型显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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C- scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
C型扫描 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Calibration,instrument qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
设备校准 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Capillary action qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
毛细管作用 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Carrier fluid qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
载液 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Carry over of penetrate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透剂移转 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cassette qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
暗合 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cathode qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
阴极 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Central conductor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中心导体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Central conductor method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中心导体法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Characteristic curve qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
特性曲线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Characteristic curve of film qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
胶片特性曲线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Characteristic radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
特征辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Chemical fog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
化学灰雾 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cine-radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线(活动)电影摄影术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cintact pads qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
接触垫 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Circumferential coils qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
圆环线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Circumferential field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
周向磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Circumferential magnetization method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
周向磁化法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Clean qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
清理 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Clean- up qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
清除 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Clearing time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
定透时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coercive force qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
矫顽力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coherence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相干性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coherence length qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相干长度（谐波列长度） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coi1，test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
测试线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coil size qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线圈大小 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coil spacing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线圈间距 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coil technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线圈技术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coil method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线圈法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coilreference qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线圈参考 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coincidence discrimination qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
符合鉴别 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cold-cathode ionization gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
冷阴极电离计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Collimator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
准直器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Collimation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
准直 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Collimator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
准直器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Combined colour comtrast and fluorescent penetrant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
着色荧光渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Compressed air drying qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压缩空气干燥 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Compressional wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压缩波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Compton scatter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
康普顿散射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Continuous emission qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续发射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Continuous linear array qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续线阵 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Continuous method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Continuous spectrum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续谱 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Continuous wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Contract stretch qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比度宽限 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Contrast qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Contrast agent qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Contrast aid qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反差剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Contrast sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Control echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
监视回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Control echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Couplant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
耦合剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coupling qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
耦合 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Coupling losses qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
耦合损失 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cracking qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
裂解 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Creeping wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
爬波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Critical angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
临界角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cross section qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
横截面 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cross talk qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
串音 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cross-drilled hole qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
横孔 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Crystal qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
晶片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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C-scope; C-scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
C型显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Curie point qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
居里点 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Curie temperature qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
居里温度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Curie(Ci) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
居里 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Current flow method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
通电法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Current induction method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电流感应法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Current magnetization method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电流磁化法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Cut－off level qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
截止电平 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Dead zone qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
盲区 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Decay curve qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
衰变曲线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Decibel(dB) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
分贝 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Defect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
缺陷 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Defect resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
缺陷分辨力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Defect detection sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
缺陷检出灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Defect resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
缺陷分辨力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Definition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Definition， image definition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
清晰度，图像清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Demagnetization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
退磁 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Demagnetization factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
退磁因子 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Demagnetizer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
退磁装置 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Densitometer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑度计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Density qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑度（底片） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Density comparison strip qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
黑度比较片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Detecting medium qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
检验介质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Detergent remover qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
洗净液 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
显像剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer station qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
显像工位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer， agueons qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水性显象剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer， dry qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
干显象剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer， liquid film qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
液膜显象剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developer， nonaqueous （sus- pendible） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非水（可悬浮）显象剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Developing time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
显像时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Development qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
显影 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Diffraction mottle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
衍射斑 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Diffuse indications qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
松散指示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Diffusion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扩散 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Digital image acquisition system qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
数字图像识别系统 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Dilatational wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
膨胀波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Dip and drain station qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
浸渍和流滴工位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Direct contact magnetization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
直接接触磁化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Direct exposure imaging qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
直接曝光成像 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Direct contact method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
直接接触法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Directivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
指向性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Discontinuity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
不连续性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Distance- gain- size-German AVG qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
距离- 增益- 尺寸（DGS德文为AVG） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Distance marker; time marker qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
距离刻度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Dose equivalent qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剂量当量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Dose rate meter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剂量率计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Dosemeter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剂量计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Double crystal probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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电中心 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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电极 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Evaluation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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评价阈值 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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排气压力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Exhaust tubulation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
排气管道 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Expanded time-base sweep qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
时基线展宽 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Exposure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
曝光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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曝光表格 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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曝光曲线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Exposure，radiographic exposure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Extended source qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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False indication qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
假指示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Film badge qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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片基 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Fluorescent light qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Fluorescent magnetic powder qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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电子焦点 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Focus-to-film distance(f.f.d) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Fog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
底片灰雾 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Footcandle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
英尺烛光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Freguency qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
频率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Frequency constant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Fringe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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增益 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Gamma rays qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Gas qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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选通技术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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几何不清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Gray(Gy) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
戈瑞 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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群速度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Half life qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Halogen qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Hard X-rays qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
硬X射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Hard-faced probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
硬膜探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Harmonic analysis qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
谐波分析 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Harmonic distortion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Harmonics qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
谐频 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Helium bombing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Helium drift qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Helium leak detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
氦检漏仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Hermetically tight seal qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
气密密封 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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High vacuum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
高真空 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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High energy X-rays qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
高能X射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Holography (optical) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光全息照相 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Holography， acoustic qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声全息 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Hydrophilic emulsifier qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Hydrostatic text qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
流体静力检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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IACS qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
IACS qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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ID coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
ID线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Image definition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
图像清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Image contrast qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Image enhancement qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Image quality indicator sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
像质指示器灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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阻抗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Impedance plane diagram qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
阻抗平面图 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Imperfection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
不完整性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Impulse eddy current testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲涡流检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Infrared sensing device qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inherent fluorescence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
固有荧光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inherent filtration qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
固有滤波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Initial permeability qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Initial pulse qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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始波宽度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inserted coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
插入式线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inside coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
内部线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inside- out testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
外泄检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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检查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Inspection medium qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
检查介质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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增感系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Interface boundary qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
界面 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Interface echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
界面回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Interface trigger qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
界面触发 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Interference qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
干涉 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Interpretation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
解释 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ion pump qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
离子泵 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ion source qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
离子源 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ionization chamber qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电离室 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ionization potential qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ionization vacuum gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ionography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Isolation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
隔离检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Isotope qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
同位素 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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K value qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
K值 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Kaiser effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
凯塞(Kaiser)效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Kilo volt qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
kv 千伏特 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Kiloelectron volt qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
keV千电子伏特 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Krypton 85 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
氪85 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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L／D ratio qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
L/D比 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lamb wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
兰姆波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Latent image qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
潜象 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lateral scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
左右扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lateral scan with oblique angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
斜平行扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Latitude (of an emulsion) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
胶片宽容度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lead screen qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
铅屏 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leak qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏孔 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leak artifact qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leak detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
检漏仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leak testtion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leakage field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leakage rate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Leechs qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁吸盘 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lift-off effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
提离效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Light intensity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光强度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Limiting resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
极限分辨率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Line scanner qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线扫描器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Line focus qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线焦点 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Line pair pattern qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线对检测图 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Line pairs per millimetre qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
每毫米线对数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Linear (electron) accelerator(LINAC) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电子直线加速器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Linear attenuation coefficient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线衰减系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Linear scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
线扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Linearity， anplitude qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁力线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lipophilic emulsifier qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Local magnetization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Love wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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流明 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Lusec qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
流西克 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Maga or million electron volts qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
MeV兆电子伏特 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic history qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁化史 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁粉磁场指示器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁路 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁畴 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic field distribution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁场分布 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁场指示器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic field meter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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磁通 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic flux density qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁通密度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic force qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁化力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic leakage field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
漏磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic leakage flux qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
漏磁通 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic moment qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁矩 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic particle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁粉 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic particle indication qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁痕 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic particle testing/magnetic particle examination qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁粉检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic permeability qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic pole qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁极 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic saturataion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic slorage meclium qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁储介质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetic writing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁写 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetizing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetizing current qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetizing coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetostrictive effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁致伸缩效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Magnetostrictive transducer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁致伸缩换能器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Main beam qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
主声束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Manual testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
手动检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Markers qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
时标 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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MA-scope; MA-scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
MA型显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Masking qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
遮蔽 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mass attcnuation coefficient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质量吸收系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mass number qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质量数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mass spectrometer （M.S.） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质谱仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mass spectrometer leak detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质谱检漏仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mass spectrum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质谱 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Master/slave discrimination qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
主从鉴别 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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MDTD qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
最小可测温度差 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mean free path qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
平均自由程 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Medium vacuum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中真空 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Mega or million volt qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
MV兆伏特 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Micro focus X - ray tube qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
微焦点X 光管 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Microfocus radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
微焦点射线透照术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Micrometre qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
微米 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Micron of mercury qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
微米汞柱 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Microtron qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电子回旋加速器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Milliampere qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
毫安（mA） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Millimetre of mercury qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
毫米汞柱 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Minifocus x- ray tube qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
小焦点调射线管 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Minimum detectable leakage rate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
最小可探泄漏率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Minimum resolvable temperature difference （MRTD） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
最小可分辨温度差（MRDT） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Mode qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
波型 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Mode conversion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
波型转换 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Mode transformation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
波型转换 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Moderator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
慢化器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Modulation transfer function （MTF） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
调制转换功能（MTF） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Modulation analysis qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
调制分析 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Molecular flow qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
分子流 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Molecular leak qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
分子泄漏 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Monitor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
监控器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Monochromatic qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
单色波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Movement unsharpness qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
移动不清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Moving beam radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
可动射束射线透照术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multiaspect magnetization method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多向磁化法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multidirectional magnetization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多向磁化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multifrequency eddy current testiog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多频涡流检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Multiple back reflections qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多次背面反射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multiple reflections qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多次反射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multiple back reflections qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多次底面反射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Multiple echo method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多次反射法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Multiple probe technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多探头法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Multiple triangular array qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
多三角形阵列 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Narrow beam condition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
窄射束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
NC qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
NC qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Near field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
近场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Near field length qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
近场长度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Near surface defect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
近表面缺陷 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Net density qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
净黑度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Net density qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
净(光学)密度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Neutron qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中子 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Neutron radiograhy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中子射线透照 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Neutron radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
中子射线透照术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Newton （N） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
牛顿 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nier mass spectrometer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
尼尔质谱仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Noise qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
噪声 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Noise qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
噪声 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Noise equivalent temperature difference （NETD） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
噪声当量温度差（NETD） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nominal angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
标称角度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nominal frequency qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
标称频率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Non-aqueous liquid developer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非水性液体显像剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Noncondensable gas qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非冷凝气体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nondcstructivc Examination（NDE） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
无损试验 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nondestructive Evaluation（NDE） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
无损评价 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nondestructive Inspection（NDI） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
无损检验 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nondestructive Testing（NDT） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
无损检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nonerasble optical data qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
可固定光学数据 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nonferromugnetic material qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非铁磁性材料 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nonrelevant indication qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非相关指示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Non-screen-type film qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
非增感型胶片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normal incidence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
垂直入射（亦见直射声束） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normal permeability qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
标准磁导率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normal beam method; straight beam method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
垂直法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normal probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
直探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normalized reactance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
归一化电抗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Normalized resistance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
归一化电阻 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nuclear activity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
核活性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Nuclide qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
核素 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Object plane resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
物体平面分辨率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Object scattered neutrons qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
物体散射中子 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Object beam qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
物体光束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Object beam angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
物体光束角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Object-film distance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
被检体-胶片距离 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Object一film distance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
物体- 胶片距离 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Over development qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
显影过度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Over emulsfication qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
过乳化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Overall magnetization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
整体磁化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Overload recovery time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
过载恢复时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Overwashing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
过洗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Oxidation fog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
氧化灰雾 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
P qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
P qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pair production qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
偶生成 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pair production qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电子对产生 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pair production qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
电子偶的产生 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Palladium barrier leak detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
钯屏检漏仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Panoramic exposure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
全景曝光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Parallel scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
平行扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Paramagnetic material qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
顺磁性材料 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Parasitic echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
干扰回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Partial pressure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
分压 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Particle content qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁悬液浓度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Particle velocity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质点(振动)速度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pascal （Pa） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
帕斯卡（帕） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pascal cubic metres per second qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
帕立方米每秒（Pa·m3/s ） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Path length qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光程长 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Path length difference qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光程长度差 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Pattern qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探伤图形 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Peak current qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
峰值电流 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrameter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
透度计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrameter sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
透度计灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrant comparator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透对比试块 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrant flaw detection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透探伤 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Penetrant removal qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透剂去除 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Penetrant station qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
渗透工位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Penetrant， water- washable qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水洗型渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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穿透深度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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渗透时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Permanent magnet qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
永久磁铁 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Permeability coefficient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
透气系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Permeability，a-c qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
交流磁导率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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直流磁导率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phantom echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
幻象回波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phase analysis qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相位分析 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phase controlled circuit breaker qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
断电相位控制器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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相位检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phase hologram qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相位全息 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phase sensitive detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相敏检波器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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相速度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phase-sensitive system qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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菲利浦电离计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Phosphor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
荧光物质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Photo fluorography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
荧光照相术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Photoelectric absorption qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光电吸收 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Photographic emulsion qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
照相乳剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Photographic fog qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
照相灰雾 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Photostimulable luminescence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
光敏发光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Piezoelectric effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压电效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Piezoelectric material qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压电材料 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Piezoelectric stiffness constant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压电劲度常数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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压电应力常数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Piezoelectric transducer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压电换能器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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压电电压常数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pirani gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
皮拉尼计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pirani gage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
皮拉尼计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pitch and catch technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
一发一收法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pixel qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
象素 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pixel size qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pixel， disply size qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Planar array qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
平面阵(列) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Plane wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
平面波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Plate wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
板波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Plate wave technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
板波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Point source qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
点源 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Post emulsification qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
后乳化 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Post emulsifiable penetrant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
后乳化渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Post-cleaning qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
后清除 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Post-cleaning qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
后清洗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Powder qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
粉未 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Powder blower qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
喷粉器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Powder blower qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁粉喷* qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pre-cleaning qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
预清理 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure difference qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压力差 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure dye test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压力着色检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压力探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压力检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure- evacuation test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压力抽空检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure mark qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
压痕 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pressure,design qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pre-test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Primary radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe gas qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探头气体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探头检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe backing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探头背衬 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
点式线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探头式线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Probe coil clearance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Process control radiograph qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Prods qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
触头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Projective radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
投影射线透照术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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比例探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Protective material qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
防护材料 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Proton radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
质子射线透照 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse echo method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲回波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse repetition rate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲重复率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse amplitude qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲幅度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse echo method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲反射法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse energy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲能量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse envelope qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲包络 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse length qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲长度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse repetition frequency qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲重复频率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pulse tuning qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉冲调谐 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pump- out tubulation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
抽气管道 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Pump-down time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
抽气时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Q factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Q值 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quadruple traverse technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
四次波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quality (of a beam of radiation) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线束的质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quality factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
品质因数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quenching qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
阻塞 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quenching of fluorescence qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
荧光的猝灭 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Quick break qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
快速断间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rad(rad) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
拉德 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiance， L qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
面辐射率，L qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiant existence， M qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
幅射照度M qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiant flux； radiant power，ψe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
辐射通量、辐射功率、ψe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiation does qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
辐射剂量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radio frequency （r- f） display qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射频显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radio- frequency mass spectrometer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射频质谱仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radio frequency(r-f) display qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射频显示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiograph qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线底片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic contrast qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照片对比度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic equivalence factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相等效系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic exposure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相曝光量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic inspection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic inspection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相检验 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic quality qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相质量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic contrast qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线底片对比度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic equivalence factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线透照等效因子 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic inspection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线透照检查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic quality qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线透照质量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiographic sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线透照灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线照相术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiological examination qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线检验 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiology qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线学 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiometer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
辐射计 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radiometry qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
辐射测量术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Radioscopy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
射线检查法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Range qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
量程 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rayleigh wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
瑞利波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rayleigh scattering qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
瑞利散射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Real image qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
实时图像 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Real-time radioscopy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
实时射线检查法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rearm delay time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
重新准备延时时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rearm delay time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
重新进入工作状态延迟时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reciprocity failure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
倒易律失效 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reciprocity law qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
倒易律 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Recording medium qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
记录介质 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Recovery time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
恢复时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rectified alternating current qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
脉动直流电 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference block qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考试块 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference beam qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考光束 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference block qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比试块 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference block method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
对比试块法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference line method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
基准线法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reference standard qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考标准 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reflection qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reflection coefficient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反射系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reflection density qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反射密度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reflector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反射体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Refraction qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
折射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Refractive index qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
折射率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Refrence beam angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
参考光束角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reicnlbation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
网纹 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reject; suppression qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
抑制 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rejection level qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
拒收水平 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Relative permeability qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相对磁导率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Relevant indication qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
相关指示 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reluctance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁阻 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rem(rem) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
雷姆 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Remote controlled testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
机械化检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Replenisers qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
补充剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Representative quality indicator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
代表性质量指示器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Residual magnetic field/field， residual magnetic qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剩磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Residual technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剩磁技术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Residual magnetic method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剩磁法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Residual magnetism qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
剩磁 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resistance （to flow） qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
气阻 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
分辨力 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resonance method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
共振法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Response factor qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
响应系数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Response time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
响应时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resultant field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
复合磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resultant magnetic field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
合成磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Resultant magnetization method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
组合磁化法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Retentivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
顽磁性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Reversal qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
反转现象 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Ring-down count qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
振铃计数 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Ring-down count rate qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
振铃计数率 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rinse qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
清洗 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rise time qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
上升时间 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rise-time discrimination qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
上升时间鉴别 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Rod-anode tube qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
棒阳极管 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
Roentgen(R) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
伦琴 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Roof angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
屋顶角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Rotational magnetic field qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
旋转磁场 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Rotational magnetic field method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
旋转磁场法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Rotational scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
转动扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Roughing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
低真空 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Roughing line qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
低真空管道 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Roughing pump qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
低真空泵 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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S qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
S qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Safelight qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
安全灯 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sampling probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
取样探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Saturation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
饱和 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Saturation，magnetic qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁饱和 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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饱和电平 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scan on grid lines qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
格子线扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scan pitch qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning index qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查标记 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning directly on the weld qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
焊缝上扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning path qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查轨迹 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning speed qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查速度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scanning zone qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
扫查区域 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scattared energy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
散射能量 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scatter unsharpness qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
散射不清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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散射中子 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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散射辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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散射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Schlieren system qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
施利伦系统 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scintillation counter qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
闪烁计数器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Scintillator and scintillating crystals qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
闪烁器和闪烁晶体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Screen qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
屏 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Screen unsharpness qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
荧光增感屏不清晰度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Screen-type film qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
荧光增感型胶片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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SE probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
SE探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Search-gas qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探测气体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Second critical angle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
第二临界角 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Secondary radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
二次射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Secondary coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
二次线圈 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Secondary radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
次级辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Selectivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
选择性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Semi-conductor detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
半导体探测器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sensitirity va1ue qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
灵敏度值 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sensitivity of leak test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
泄漏检测灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sensitivity control qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
灵敏度控制 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Shear wave qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
切变波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Shear wave probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
横波探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Shear wave technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
横波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Shim qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
薄垫片 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Shot qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
冲击通电 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Side lobe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
副瓣 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Side wall qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
侧面 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sievert(Sv) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
希(沃特) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Signal qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
信号 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Signal gradient qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
信号梯度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Signal over load point qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Signal overload level qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
信号过载电平 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Signal to noise ratio qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
信噪比 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Single crystal probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
单晶片探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Single probe technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
单探头法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Single traverse technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
一次波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sizing technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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集肤深度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Skin effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
集肤效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Skip distance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Skip point qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
跨距点 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sky shine(air scatter) qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
空中散射效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sniffing probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
嗅吸探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Soft X-rays qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
软X射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Soft-faced probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
软膜探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solarization qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
负感作用 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solenoid qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
螺线管 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Soluble developer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
可溶显像剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solvent remover qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
溶剂去除剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solvent cleaners qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
溶剂清除剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solvent developer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
溶剂显像剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solvent remover qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
溶剂洗净剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Solvent-removal penetrant qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
溶剂去除型渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sorption qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
吸着 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound diffraction qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声绕射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound insulating layer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
隔声层 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound intensity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声强 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound intensity level qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声强级 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound pressure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声压 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound scattering qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声散射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound transparent layer qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
透声层 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Sound velocity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声速 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Source qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
源 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Source data label qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
放射源数据标签 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Source location qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
源定位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Source size qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
源尺寸 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Source-film distance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Test coil qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Transverse resolution qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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横波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Traveling echo qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Travering scan; depth scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
前后扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Triangular array qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
正三角形阵列 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Trigger/alarm condition qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
触发/报警状态 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Triple traverse technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
三次波法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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True continuous technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Tube shield qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultra- high vacuum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
超高真空 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultrasonic leak detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
超声波检漏仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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超声探伤 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultrasonic flaw detector qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
超声探伤仪 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultrasonic microscope qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultrasonic spectroscopy qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
超声频谱 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Ultraviolet radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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不清晰 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Useful density range qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
有效光学密度范围 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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UV-A qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
A类紫外辐射 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vacuum qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
真空 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vacuum cassette qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
真空暗盒 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vacuum testing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
真空检测 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vacuum cassette qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
真空暗合 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Van de Graaff generator qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
范德格喇夫起电机 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vapor pressure qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
蒸汽压 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vapour degreasing qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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variable angle probe qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
可变角探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vee path qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
V型行程 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vehicle qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
载体 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vertical linearity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
垂直线性 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Visible light qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
可见光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Vitua limage qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
虚假图像 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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电压阈值 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wash station qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水洗工位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Water break test qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水膜破坏试验 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Water column coupling method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水柱耦合法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Water path; water distance qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
水程 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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水容限 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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可水洗型渗透剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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波 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wave guide acoustic emission qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
声发射波导杆 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wedge qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
斜楔 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wet slurry technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wet technique qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wet method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wetting action qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
润湿作用 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wetting action qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wetting agents qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
润湿剂 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wheel type probe; wheel search unit qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
轮式探头 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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White light qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
白光 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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White X-rays qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
连续X射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wobble qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
摆动 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wobble effect qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
抖动效应 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Working sensitivity qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
探伤灵敏度 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Wrap around qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
残响波干扰 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Xeroradiography qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
静电射线透照术 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-radiation qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray controller qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线控制器 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray detection apparatus qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线探伤装置 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray film qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray paper qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线感光纸 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray tube qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线管 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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X-ray tube diaphragm qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
X射线管光阑 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Yoke qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁轭 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Yoke magnetization method qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
磁轭磁化法 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Zigzag scan qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
锯齿扫查 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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Zone calibration location qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
时差区域校准定位 qK*Kû{í£zbbs.3c3t.comùI¶[¶A::
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