[文章] 常用中英文对照无损检测词汇 [复制链接]

英          文 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中         文 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A.C magnetic saturation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
交流磁饱和 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Absorbed dose HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
吸收剂量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Absorbed dose rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
吸收剂量率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acceptanc  limits HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
验收范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acceptance  level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
验收水平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acceptance  standard HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
验收标准 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Accumulation  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
累积检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic emission  count（emission count） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声发射计数（发射计数） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic emission transducer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声发射换能器（声发射传感器） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic emission(AE) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声发射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic holography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声全息术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic impedance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声阻抗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic impedance matching HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声阻抗匹配 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic impedance method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声阻法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustical lens HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声透镜 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Acoustic—ultrasonic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声-超声（AU） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Activation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
活化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Activity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
活度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Adequate shielding HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
安全屏蔽 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ampere turns HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
安匝数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Amplitude HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
幅度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle beam method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
斜射法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle of incidence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
入射角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle of reflection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反射角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle of spread HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
指向角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle of squint HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
偏向角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angle probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
斜探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Angstrom unit HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
埃(A) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Area amplitude response curve HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
面积幅度曲线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Area of interest HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
评定区 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Arliflcial  disconlinuity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
人工不连续性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Artifact HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
假缺陷 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Artificial defect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
人工缺陷 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Artificial discontinuity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准人工缺陷 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A型扫描 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A-scope; A-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A型显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Attenuation coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
衰减系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Attenuator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
衰减器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Audible  leak  indicator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
音响泄漏指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Automatic testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
自动检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Autoradiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
自射线照片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Avaluation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
评定 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Barium concrete HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
钡混凝土 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Barn HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
靶 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Base fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
片基灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bath HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
槽液 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bayard- Alpert  ionization  gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
B- A型电离计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam ratio HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光束比 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
束张角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam axis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声束轴线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam index HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声束入射点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam path location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声程定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam path; path length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声程 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Beam spread HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声束扩散 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Betatron HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子感应加速器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bimetallic strip gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双金属片计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bipolar field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双极磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Black light filter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑光滤波器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Black light; ultraviolet radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Blackbody HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Blackbody  equivalent  temperature HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑体等效温度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bleakney mass  spectrometer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波利克尼质谱仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bleedout HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗出 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bottom echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
底面回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bottom surface HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
底面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Boundary echo(first) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
边界一次回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Bremsstrahlung HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
轫致辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Broad-beam condition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
宽射束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Brush application HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
刷涂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
B-scan  presenfation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
B型扫描显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
B-scope;  B-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
B型显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
C- scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
C型扫描 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Calibration,instrument HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
设备校准 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Capillary action HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
毛细管作用 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Carrier fluid HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
载液 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Carry over of penetrate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透剂移转 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cassette HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
暗合 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cathode HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阴极 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Central  conductor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中心导体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Central conductor method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中心导体法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Characteristic  curve HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
特性曲线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Characteristic curve of film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片特性曲线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Characteristic radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
特征辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Chemical fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
化学灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cine-radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线(活动)电影摄影术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cintact pads HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
接触垫 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Circumferential  coils HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
圆环线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Circumferential field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
周向磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Circumferential magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
周向磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Clean HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
清理 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Clean- up HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
清除 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Clearing time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定透时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coercive force HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
矫顽力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coherence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相干性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coherence  length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相干长度（谐波列长度） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coi1，test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
测试线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coil  size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线圈大小 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coil spacing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线圈间距 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coil technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线圈技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coil method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线圈法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coilreference HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线圈参考 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coincidence discrimination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
符合鉴别 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cold-cathode  ionization  gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
冷阴极电离计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Collimator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
准直器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Collimation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
准直 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Collimator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
准直器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Combined colour comtrast and fluorescent penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
着色荧光渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Compressed air drying HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压缩空气干燥 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Compressional  wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压缩波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Compton scatter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
康普顿散射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Continuous emission HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续发射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Continuous linear array HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续线阵 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Continuous method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Continuous spectrum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续谱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Continuous wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Contract  stretch HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比度宽限 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Contrast  agent HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Contrast aid HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反差剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Contrast sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Control echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
监视回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Control echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Couplant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
耦合剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coupling HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
耦合 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Coupling losses HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
耦合损失 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cracking HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
裂解 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Creeping wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
爬波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Critical angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
临界角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cross section HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横截面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cross talk HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
串音 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cross-drilled hole HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横孔 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Crystal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
晶片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
C-scope;  C-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
C型显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Curie point HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
居里点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Curie temperature HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
居里温度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Curie(Ci) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
居里 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Current flow method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
通电法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Current induction  method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电流感应法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Current magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电流磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Cut－off  level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
截止电平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dead zone HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
盲区 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Decay curve HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
衰变曲线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Decibel(dB) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
分贝 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Defect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Defect  resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷分辨力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Defect detection sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷检出灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Defect resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷分辨力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Definition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Definition，  image  definition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
清晰度，图像清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Demagnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
退磁 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Demagnetization factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
退磁因子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Demagnetizer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
退磁装置 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Densitometer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑度计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑度（底片） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Density  comparison  strip HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
黑度比较片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Detecting medium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检验介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Detergent remover HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
洗净液 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer station HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显像工位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer，  agueons HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水性显象剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer，  dry HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干显象剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer，  liquid  film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
液膜显象剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developer，  nonaqueous  （sus- pendible） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非水（可悬浮）显象剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Developing time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显像时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Development HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显影 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Diffraction mottle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
衍射斑 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Diffuse  indications HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
松散指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Diffusion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扩散 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Digital  image  acquisition  system HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
数字图像识别系统 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dilatational wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
膨胀波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dip and drain station HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
浸渍和流滴工位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Direct  contact  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
直接接触磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Direct  exposure  imaging HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
直接曝光成像 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Direct contact method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
直接接触法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Directivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
指向性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Discontinuity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
不连续性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Distance- gain- size-German  AVG HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
距离- 增益- 尺寸（DGS德文为AVG） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Distance marker; time marker HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
距离刻度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dose equivalent HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剂量当量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dose rate meter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剂量率计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dosemeter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剂量计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Double crystal probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双晶片探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Double probe technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双探头法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Double transceiver technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双发双收法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Double traverse technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
二次波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dragout HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
带出 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drain  time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
滴落时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drain time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
流滴时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drift HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
漂移 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry powder HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干粉 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干粉技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry developing cabinet HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干显像柜 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dry method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干粉法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drying oven HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干燥箱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drying station HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干燥工位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Drying time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干燥时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
D-scope;  D-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
D型显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dual search  unit HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dual-focus tube HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双焦点管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Duplex-wire image quality indicator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
双线像质指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Duration HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
持续时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dwell  time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
停留时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dye penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
着色渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dynamic  leak  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
动态泄漏检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dynamic  leakage  measurement HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
动态泄漏测量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dynamic  range HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
动态范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Dynamic radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
动态射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
回波频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo height HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
回波高度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
回波指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo transmittance of sound pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
往复透过率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Echo width HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
回波宽度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Eddy current HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
涡流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Eddy current flaw detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
涡流探伤仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Eddy current testiog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
涡流检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Edge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
端面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Edge effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
边缘效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Edge echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
棱边回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Edge effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
边缘效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective  depth  penetration  （EDP） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效穿透深度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective focus size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效焦点尺寸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective magnetic permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective reflection surface of flaw HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷有效反射面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Effective resistance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效电阻 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Elastic medium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
弹性介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electric displacement HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电位移 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electrical center HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电中心 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electrode HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电极 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electromagnet HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电磁铁 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electro-magnetic acoustic transducer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电磁声换能器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electromagnetic induction HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电磁感应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electromagnetic radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电磁辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electromagnetic testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电磁检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electro-mechanical coupling factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
机电耦合系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electron radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子辐射照相术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electron volt HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子伏恃 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electronic noise HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子噪声 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Electrostatic spraying HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
静电喷涂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Emulsification HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
乳化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Emulsification time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
乳化时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Emulsifier HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
乳化剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Encircling  coils HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
环绕式线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
End effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
端部效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Energizing  cycle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
激励周期 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equalizing filter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
均衡滤波器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equivalent HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
当量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equivalent  I．Q. I.   Sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
象质指示器当量灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equivalent  nitrogen  pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
等效氮压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equivalent  penetrameter  sensifivty HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透度计当量灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Equivalent method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
当量法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Erasabl  optical  medium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可探光学介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Etching HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
浸蚀 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Evaluation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
评定 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Evaluation  threshold HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
评价阈值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Event count HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
事件计数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Event count rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
事件计数率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Examination  area HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检测范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Examination  region HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检验区域 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exhaust  pressure/discharge  pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
排气压力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exhaust  tubulation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
排气管道 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Expanded time-base sweep HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
时基线展宽 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exposure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
曝光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exposure table HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
曝光表格 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exposure chart HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
曝光曲线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exposure fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
曝光灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Exposure，radiographic  exposure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
曝光，射线照相曝光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Extended  source HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扩展源 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Facility  scattered  neutrons HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
条件散射中子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
False indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
假指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Family HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
族 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Far field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
远场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Feed-through coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿过式线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Field，  resultant  magnetic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
复合磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fill factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
填充系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film speed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film badge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片襟章剂量计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film base HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
片基 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film gamma HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片γ值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film processing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片冲洗加工 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film speed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片感光度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Film viewing screen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
观察屏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Filter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
滤波器/滤光板 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Final test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
复探 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flat-bottomed hole HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平底孔 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flat-bottomed hole equivalent HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平底孔当量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flaw HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
伤 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flaw characterization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
伤特性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flaw echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flexural wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
弯曲波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Floating  threshold HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
浮动阀值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent  examination  method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光检验法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent  magnetic  particle  inspection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光磁粉检验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent dry deposit penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干沉积荧光渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent light HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent magnetic powder HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光磁粉 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluorescent screen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光屏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fluoroscopy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光检查法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flux leakage  field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁通泄漏场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Flux lines HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁通线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focal spot HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focal distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦距 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focus length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦点长度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focus size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦点尺寸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focus width HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦点宽度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focus(electron) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子焦点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focused beam HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
聚焦声束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focusing probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
聚焦探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Focus-to-film distance(f.f.d) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焦点-胶片距离（焦距） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
底片灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fog density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
灰雾密度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Footcandle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
英尺烛光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Freguency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Frequency constant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
频率常数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fringe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干涉带 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Front distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
前沿距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Front distance of flaw HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷前沿距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Full- wave  direct  current（FWDC） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
全波直流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Fundamental frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
基频 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Furring HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
毛状迹痕 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gage  pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gain HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
增益 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gamma radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
γ射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gamma ray source HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
γ射线源 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gamma ray source container HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
γ射线源容器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gamma rays HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
γ射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gamma-ray radiographic equipment HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
γ射线透照装置 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gap scanning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
间隙扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gas HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
气体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
闸门 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gating technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
选通技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gauss HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
高斯 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Geiger-Muller counter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
盖革.弥勒计数器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Geometric unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
几何不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Gray(Gy) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
戈瑞 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Grazing  incidence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
掠入射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Grazing angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
掠射角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Group velocity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
群速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Half life HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半衰期 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Half- wave  current  （HW） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半波电流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Half-value layer(HVL) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半值层 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Half-value method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半波高度法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Halogen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
卤素 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Halogen  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
卤素检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hard X-rays HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
硬X射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hard-faced probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
硬膜探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Harmonic analysis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
谐波分析 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Harmonic distortion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
谐波畸变 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Harmonics HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
谐频 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Head wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
头波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Helium  bombing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
氦轰击法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Helium  drift HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
氦漂移 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Helium  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
氦检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hermetically  tight  seal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
气密密封 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
High  vacuum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
高真空 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
High energy X-rays HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
高能X射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Holography (optical) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光全息照相 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Holography，  acoustic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声全息 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hydrophilic emulsifier HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
亲水性乳化剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hydrophilic remover HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
亲水性洗净剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hydrostatic text HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
流体静力检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hysteresis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁滞 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Hysteresis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁滞 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
IACS HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
IACS HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
ID coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
ID线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image definition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image enhancement HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像增强 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image magnification HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像放大 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image quality HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像质量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image quality indicator sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
像质指示器灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Image quality indicator(IQI)/image  quality  indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
像质指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Imaging  line  scanner HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
图像线扫描器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Immersion probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
液浸探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Immersion rinse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
浸没清洗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Immersion testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
液浸法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Immersion time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
浸没时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Impedance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阻抗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Impedance plane diagram HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阻抗平面图 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Imperfection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
不完整性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Impulse eddy current testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲涡流检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Incremental permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
增量磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indicated defect area HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷指示面积 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indicated defect length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
缺陷指示长度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indirect  exposure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
间接曝光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indirect  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
间接磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indirect magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
间接磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Indirect scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
间接扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Induced  field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
感应磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Induced current method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
感应电流法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Infrared  imaging system HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
红外成象系统 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Infrared  sensing  device HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
红外扫描器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inherent  fluorescence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
固有荧光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inherent filtration HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
固有滤波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Initial permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
起始磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Initial pulse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
始脉冲 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Initial pulse width HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
始波宽度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inserted  coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
插入式线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inside  coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
内部线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inside- out  testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
外泄检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inspection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inspection  medium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检查介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Inspection frequency/ test frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检测频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Intensifying factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
增感系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Intensifying screen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
增感屏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interal,arrival time  （Δtij)/arrival time interval（Δtij） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
到达时间差(Δtij) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interface boundary HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
界面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interface echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
界面回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interface trigger HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
界面触发 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interference HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干涉 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Interpretation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
解释 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ion pump HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
离子泵 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ion source HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
离子源 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ionization chamber HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电离室 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ionization potential HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电离电位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ionization vacuum gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电离真空计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ionography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电离射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Irradiance，  E HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射通量密度，  E HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Isolation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
隔离检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Isotope HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
同位素 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
K value HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
K值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Kaiser effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
凯塞(Kaiser)效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Kilo volt HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
kv  千伏特 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Kiloelectron  volt HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
keV千电子伏特 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Krypton  85 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
氪85 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
L／D ratio HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
L/D比 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lamb  wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
兰姆波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Latent image HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
潜象 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lateral scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
左右扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lateral scan with oblique angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
斜平行扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Latitude (of an emulsion) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
胶片宽容度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lead  screen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
铅屏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leak HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏孔 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leak  artifact HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leak  testtion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leakage  field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leakage  rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Leechs HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁吸盘 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lift-off effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
提离效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Light  intensity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光强度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Limiting  resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
极限分辨率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Line  scanner HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线扫描器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Line focus HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线焦点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Line pair pattern HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线对检测图 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Line pairs per millimetre HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
每毫米线对数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Linear (electron) accelerator(LINAC) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子直线加速器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Linear attenuation coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线衰减系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Linear scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Linearity  （time  or  distance） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
线性（时间或距离） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Linearity，  anplitude HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
幅度线性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lines of force HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁力线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lipophilic emulsifier HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
亲油性乳化剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lipophilic remover HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
亲油性洗净剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Liquid  penetrant  examination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
液体渗透检验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Liquid film developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
液膜显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Local  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
局部磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Local magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
局部磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Local scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
局部扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Localizing cone HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定域喇叭筒 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location  accuracy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位精度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location  computed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位，计算 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location marker HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位标记 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location upon delta-T HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
时差定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location，  clusfer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位，群集 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Location，continuous  AE  signal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定位，连续AE信号 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵向磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵向磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵向分辨率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal wave probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵波探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Longitudinal wave technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
纵波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Loss  of  back  reflection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
背面反射损失 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Loss of back reflection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
底面反射损失 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Love wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
乐甫波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Low energy gamma radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
低能γ辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Low－enerugy  photon  radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
低能光子辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Luminance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
亮度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Luminosity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
流明 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Lusec HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
流西克 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Maga or  million electron  volts HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
MeV兆电子伏特 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic  history HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁化史 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic  hysteresis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁性滞后 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic  particle  field  indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁粉磁场指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic  particle  inspection  flaw  indications HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁粉检验的伤显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic circuit HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁路 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic domain HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁畴 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic field distribution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁场分布 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic field indicator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁场指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic field meter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁场计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic field strength HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁场强度(H) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic field/field，magnetic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic flux HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁通 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic flux density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁通密度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic force HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁化力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic leakage field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
漏磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic leakage flux HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
漏磁通 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic moment HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁矩 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic particle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁粉 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic particle indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁痕 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic particle testing/magnetic  particle  examination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁粉检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic pole HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁极 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic saturataion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁饱和 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic saturation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁饱和 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic slorage meclium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁储介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetic writing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁写 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetizing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetizing  current HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁化电流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetizing coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁化线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetostrictive effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁致伸缩效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Magnetostrictive transducer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁致伸缩换能器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Main beam HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
主声束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Manual testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
手动检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Markers HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
时标 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
MA-scope;  MA-scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
MA型显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Masking HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
遮蔽 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mass  attcnuation  coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质量吸收系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mass  number HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质量数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mass  spectrometer  （M.S.） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质谱仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mass  spectrometer  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质谱检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mass  spectrum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质谱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Master/slave discrimination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
主从鉴别 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
MDTD HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
最小可测温度差 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mean  free  path HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平均自由程 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Medium  vacuum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中真空 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mega  or  million  volt HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
MV兆伏特 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Micro focus  X - ray  tube HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
微焦点X 光管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Microfocus radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
微焦点射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Micrometre HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
微米 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Micron  of  mercury HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
微米汞柱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Microtron HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子回旋加速器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Milliampere HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
毫安（mA） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Millimetre  of  mercury HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
毫米汞柱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Minifocus  x- ray  tube HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
小焦点调射线管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Minimum  detectable  leakage  rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
最小可探泄漏率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Minimum  resolvable  temperature  difference  （MRTD） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
最小可分辨温度差（MRDT） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mode HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波型 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mode  conversion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波型转换 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Mode transformation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波型转换 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Moderator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
慢化器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Modulation  transfer  function  （MTF） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
调制转换功能（MTF） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Modulation analysis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
调制分析 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Molecular  flow HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
分子流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Molecular  leak HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
分子泄漏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Monitor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
监控器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Monochromatic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
单色波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Movement unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
移动不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Moving beam radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可动射束射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiaspect magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多向磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multidirectional  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多向磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multifrequency eddy current testiog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多频涡流检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple  back  reflections HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多次背面反射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple  reflections HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多次反射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple back reflections HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多次底面反射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple echo method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多次反射法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple probe technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多探头法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Multiple triangular array HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
多三角形阵列 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Narrow beam condition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
窄射束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
NC HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
NC HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Near field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
近场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Near field length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
近场长度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Near surface defect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
近表面缺陷 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Net  density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
净黑度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Net density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
净(光学)密度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Neutron HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Neutron  radiograhy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中子射线透照 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Neutron radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
中子射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Newton  （N） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
牛顿 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nier  mass  spectrometer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
尼尔质谱仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Noise HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
噪声 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Noise HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
噪声 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Noise  equivalent  temperature  difference  （NETD） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
噪声当量温度差（NETD） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nominal angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标称角度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nominal frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标称频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Non-aqueous liquid developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非水性液体显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Noncondensable  gas HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非冷凝气体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nondcstructivc  Examination（NDE） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
无损试验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nondestructive  Evaluation（NDE） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
无损评价 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nondestructive  Inspection（NDI） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
无损检验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nondestructive  Testing（NDT） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
无损检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nonerasble  optical  data HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可固定光学数据 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nonferromugnetic  material HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非铁磁性材料 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nonrelevant indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非相关指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Non-screen-type film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
非增感型胶片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normal  incidence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
垂直入射（亦见直射声束） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normal  permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normal beam method; straight beam method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
垂直法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normal probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
直探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normalized reactance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
归一化电抗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Normalized resistance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
归一化电阻 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nuclear  activity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
核活性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Nuclide HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
核素 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object  plane  resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
物体平面分辨率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object  scattered  neutrons HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
物体散射中子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object beam HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
物体光束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object beam angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
物体光束角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object-film distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
被检体-胶片距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Object一film  distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
物体- 胶片距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Over development HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显影过度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Over emulsfication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
过乳化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Overall  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
整体磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Overload recovery time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
过载恢复时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Overwashing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
过洗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Oxidation  fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
氧化灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
P HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
P HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pair  production HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
偶生成 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pair  production HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子对产生 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pair production HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电子偶的产生 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Palladium  barrier  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
钯屏检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Panoramic exposure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
全景曝光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Parallel scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平行扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Paramagnetic material HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
顺磁性材料 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Parasitic echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
干扰回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Partial  pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
分压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Particle content HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁悬液浓度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Particle velocity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质点(振动)速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pascal  （Pa） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
帕斯卡（帕） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pascal  cubic  metres  per  second HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
帕立方米每秒（Pa·m3/s ） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Path  length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光程长 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Path  length  difference HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光程长度差 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pattern HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探伤图形 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Peak current HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
峰值电流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrameter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透度计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrameter  sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透度计灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant  comparator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透对比试块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant flaw detection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透探伤 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant removal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透剂去除 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant station HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透工位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetrant，  water- washable HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水洗型渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetration HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿透深度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Penetration time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
渗透时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Permanent magnet HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
永久磁铁 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Permeability  coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透气系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Permeability，a-c HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
交流磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Permeability，d－c HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
直流磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phantom echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
幻象回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase analysis HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相位分析 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相位角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase controlled circuit breaker HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
断电相位控制器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase detection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相位检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase hologram HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相位全息 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase sensitive detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相敏检波器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase shift HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相位移 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase velocity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phase-sensitive system HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相敏系统 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phillips  ionization  gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
菲利浦电离计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Phosphor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光物质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Photo  fluorography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光照相术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Photoelectric absorption HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光电吸收 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Photographic emulsion HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
照相乳剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Photographic fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
照相灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Photostimulable  luminescence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
光敏发光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric material HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电材料 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric stiffness constant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电劲度常数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric stress constant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电应力常数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric transducer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电换能器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Piezoelectric voltage constant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压电电压常数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pirani  gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
皮拉尼计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pirani gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
皮拉尼计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pitch and catch technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
一发一收法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pixel HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
象素 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pixel  size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
象素尺寸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pixel，  disply  size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
象素显示尺寸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Planar array HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平面阵(列) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Plane wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
平面波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Plate wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
板波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Plate wave technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
板波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Point  source HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
点源 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Post  emulsification HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
后乳化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Post emulsifiable penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
后乳化渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Post-cleaning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
后清除 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Post-cleaning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
后清洗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Powder HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
粉未 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Powder  blower HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
喷粉器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Powder blower HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁粉喷* HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pre-cleaning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
预清理 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure  difference HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压力差 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure  dye  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压力着色检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure  probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压力探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure  testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压力检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure- evacuation  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压力抽空检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure mark HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
压痕 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pressure,design HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
设计压力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pre-test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
初探 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Primary coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
一次线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Primary radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
初级辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe  gas HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头气体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe backing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头背衬 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
点式线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头式线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe coil clearance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头线圈间隙 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe index HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头入射点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe to weld distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头-焊缝距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Probe/ search unit HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Process  control  radiograph HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
工艺过程控制的射线照相 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Processing capacity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
处理能力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Processing speed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
处理速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Prods HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
触头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Projective radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
投影射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Proportioning  probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
比例探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Protective material HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
防护材料 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Proton radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
质子射线透照 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse  echo  method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲回波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse  repetition  rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲重复率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse amplitude HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲幅度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse echo method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲反射法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse energy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲能量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse envelope HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲包络 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲长度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse repetition frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲重复频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pulse tuning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉冲调谐 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pump- out  tubulation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
抽气管道 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Pump-down  time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
抽气时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Q factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Q值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quadruple traverse technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
四次波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quality (of a beam of radiation) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线束的质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quality factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
品质因数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quenching HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阻塞 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quenching of fluorescence HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光的猝灭 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Quick  break HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
快速断间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rad(rad) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
拉德 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiance，  L HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
面辐射率，L HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiant  existence，  M HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
幅射照度M HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiant  flux；  radiant power，ψe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射通量、辐射功率、ψe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiation does HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射剂量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radio  frequency  （r- f）  display HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射频显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radio- frequency mass  spectrometer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射频质谱仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radio frequency(r-f) display HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射频显示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiograph HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线底片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照片对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  equivalence  factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相等效系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  exposure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相曝光量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  inspection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  inspection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相检验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  quality HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相质量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic  sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线底片对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic equivalence factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线透照等效因子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic inspection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线透照检查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic quality HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线透照质量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiographic sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线透照灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线照相术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiological  examination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线检验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiology HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线学 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiometer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radiometry HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
辐射测量术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Radioscopy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线检查法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Range HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
量程 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rayleigh  wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
瑞利波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rayleigh scattering HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
瑞利散射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Real image HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
实时图像 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Real-time  radioscopy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
实时射线检查法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rearm delay time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
重新准备延时时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rearm delay time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
重新进入工作状态延迟时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reciprocity failure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
倒易律失效 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reciprocity law HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
倒易律 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Recording medium HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
记录介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Recovery time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
恢复时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rectified alternating current HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉动直流电 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference  block HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考试块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference beam HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考光束 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference block HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比试块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference block method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
对比试块法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference line method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
基准线法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reference standard HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考标准 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reflection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reflection coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反射系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reflection density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反射密度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reflector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反射体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Refraction HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
折射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Refractive index HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
折射率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Refrence beam angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
参考光束角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reicnlbation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
网纹 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reject; suppression HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
抑制 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rejection level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
拒收水平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Relative permeability HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相对磁导率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Relevant indication HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
相关指示 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reluctance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁阻 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rem(rem) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
雷姆 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Remote controlled testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
机械化检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Replenisers HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
补充剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Representative  quality  indicator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
代表性质量指示器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Residual  magnetic  field/field，  residual  magnetic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剩磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Residual  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剩磁技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Residual magnetic method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剩磁法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Residual magnetism HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
剩磁 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resistance  （to  flow） HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
气阻 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
分辨力 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resonance method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
共振法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Response factor HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
响应系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Response time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
响应时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resultant  field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
复合磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resultant magnetic field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
合成磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Resultant magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
组合磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Retentivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
顽磁性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Reversal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
反转现象 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ring-down count HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
振铃计数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ring-down count rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
振铃计数率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rinse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
清洗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rise time HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
上升时间 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rise-time discrimination HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
上升时间鉴别 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rod-anode tube HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
棒阳极管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Roentgen(R) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
伦琴 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Roof angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
屋顶角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rotational magnetic field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
旋转磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rotational magnetic field method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
旋转磁场法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Rotational scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
转动扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Roughing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
低真空 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Roughing  line HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
低真空管道 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Roughing  pump HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
低真空泵 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
S HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
S HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Safelight HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
安全灯 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sampling probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
取样探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Saturation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
饱和 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Saturation，magnetic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁饱和 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Saturation  level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
饱和电平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scan on grid lines HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
格子线扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scan pitch HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查间距 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning  index HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查标记 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning directly on the weld HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
焊缝上扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning path HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查轨迹 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning speed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scanning zone HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫查区域 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scattared energy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
散射能量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scatter unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
散射不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scattered  neutrons HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
散射中子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scattered radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
散射辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scattering HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
散射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Schlieren system HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
施利伦系统 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scintillation counter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
闪烁计数器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Scintillator and scintillating crystals HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
闪烁器和闪烁晶体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Screen HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
屏 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Screen unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光增感屏不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Screen-type film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
荧光增感型胶片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
SE  probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
SE探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Search-gas HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探测气体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Second critical angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
第二临界角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Secondary  radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
二次射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Secondary coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
二次线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Secondary radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
次级辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Selectivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
选择性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Semi-conductor detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半导体探测器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sensitirity  va1ue HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
灵敏度值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sensitivity  of  leak test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
泄漏检测灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sensitivity control HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
灵敏度控制 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Shear  wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
切变波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Shear wave probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横波探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Shear wave technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Shim HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
薄垫片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Shot HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
冲击通电 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Side lobe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
副瓣 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Side wall HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
侧面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sievert(Sv) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
希(沃特) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Signal HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
信号 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Signal gradient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
信号梯度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Signal over load point HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
信号过载点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Signal overload level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
信号过载电平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Signal to noise ratio HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
信噪比 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Single crystal probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
单晶片探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Single probe technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
单探头法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Single traverse technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
一次波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sizing technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
定量法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Skin depth HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
集肤深度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Skin effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
集肤效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Skip distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
跨距 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Skip point HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
跨距点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sky shine(air scatter) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
空中散射效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sniffing  probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
嗅吸探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Soft X-rays HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
软X射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Soft-faced probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
软膜探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solarization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
负感作用 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solenoid HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
螺线管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Soluble developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可溶显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solvent  remover HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
溶剂去除剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solvent cleaners HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
溶剂清除剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solvent developer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
溶剂显像剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solvent remover HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
溶剂洗净剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Solvent-removal penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
溶剂去除型渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sorption HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
吸着 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound diffraction HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声绕射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound insulating layer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
隔声层 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound intensity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声强 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound intensity level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声强级 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound scattering HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声散射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound transparent layer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透声层 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sound velocity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声速 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Source HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
源 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Source data label HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
放射源数据标签 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Source location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
源定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Source size HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
源尺寸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Source-film distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线源-胶片距离 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Spacial  frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
空间频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Spark  coil  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电火花线圈检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Specific activity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
放射性比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Specified sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
规定灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standard HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standard HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准试样 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standard   leak  rate HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准泄漏率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standard leak HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准泄漏孔 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standard tast block HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
标准试块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standardization  instrument HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
设备标准化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Standing wave; stationary wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
驻波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step  wedge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯楔块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step- wadge  calibration  film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯楔块校准底片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step- wadge  comparison  film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯楔块比较底片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step wedge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯楔块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step-wedge calibration film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯-楔块校准片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Step-wedge comparison film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阶梯-楔块比较片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Stereo-radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
立体射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Subject contrast HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
被检体对比度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Subsurface  discontinuity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
近表面不连续性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Suppression HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
抑制 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面磁场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface noise HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面噪声 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface wave probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面波探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surface wave technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
表面波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surge  magnetization HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
脉动磁化 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Surplus sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
灵敏度余量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Suspension HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁悬液 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sweep HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫描 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sweep range HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫描范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Sweep speed HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫描速度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Swept  gain HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
扫描增益 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Swivel scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
环绕扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
System  exanlillatien  threshold HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
系统检验阈值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
System  inclacel  artifacts HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
系统感生物 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
System  noise HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
系统噪声 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tackground，  target HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
目标本底 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tandem scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
串列扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Target HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
耙 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Target HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
靶 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Television fluoroscopy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电视X射线荧光检查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Temperature  envelope HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
温度范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tenth-value-layer(TVL) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
十分之一值层 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test  coil HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检测线圈 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test quality  level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检测质量水平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test ring HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
试环 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test block HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
试块 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test frequency HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
试验频率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test piece HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
试片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test range HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探测范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Test surface HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探测面 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Testing，ulrasonic HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thermal  neutrons HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
热中子 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thermocouple gage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
热电偶计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thermogram HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
热谱图 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thermography，  infrared HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
红外热成象 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thermoluminescent dosemeter(TLD) HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
热释光剂量计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thickness sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
厚度灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Third critiical angle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
第三临界角 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thixotropic penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
摇溶渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Thormal  resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
热分辨率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Threading bar HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿棒 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Three  way  sort HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
三档分选 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Threshold  setting HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
门限设置 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Threshold fog HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阈值灰雾 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Threshold level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阀值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Threshotd  tcnet HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
门限电平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Throttling HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
节流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Through  transmission  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿透技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Through penetration technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
贯穿渗透法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Through transmission technique; transmission technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿透法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Through-coil  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
穿过式线圈技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Throughput HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
通气量 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tight HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
密封 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Total reflection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
全反射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Totel  image  unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
总的图像不清晰度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tracer  probe  leak  location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
示踪探头泄漏定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tracer gas HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
示踪气体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transducer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
换能器/传感器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transition flow HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
过渡流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Translucent  base  media HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
半透明载体介质 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmission HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmission  densitomefer HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
发射密度计 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmission coefficient HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透射系数 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmission point HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透射点 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmission technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透射技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmittance，τ HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
透射率τ HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmitted  film  density HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
检测底片黑度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transmitted pulse HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
发射脉冲 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transverse resolution HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横向分辨率 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Transverse wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
横波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Traveling echo HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
游动回波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Travering scan; depth scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
前后扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Triangular array HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
正三角形阵列 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Trigger/alarm condition HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
触发/报警状态 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Trigger/alarm level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
触发/报警标准 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Triple traverse technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
三次波法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
True  continuous  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
准确连续法技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Trueattenuation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
真实衰减 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube current HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管电流 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube head HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube shield HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管罩 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube shutter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管子光闸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube window HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管窗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Tube-shift radiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
管子移位射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Two-way  sort HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
两档分选 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultra- high  vacuum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超高真空 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic  leak  detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声波检漏仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic  noise  level HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声噪声电平 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic cleaning HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声波清洗 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic field HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声场 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic flaw detection HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声探伤 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic flaw detector HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声探伤仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic microscope HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声显微镜 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic spectroscopy HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声频谱 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic testing system HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声检测系统 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultrasonic thickness gauge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
超声测厚仪 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Ultraviolet radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
紫外辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Under development HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
显影不足 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Unsharpness HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
不清晰 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Useful density range HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
有效光学密度范围 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
UV-A HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A类紫外辐射 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
UV-A filter HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
A类紫外辐射滤片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vacuum HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
真空 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vacuum  cassette HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
真空暗盒 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vacuum  testing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
真空检测 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vacuum cassette HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
真空暗合 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Van de Graaff generator HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
范德格喇夫起电机 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vapor  pressure HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
蒸汽压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vapour degreasing HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
蒸汽除油 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
variable angle probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可变角探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vee  path HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
V型行程 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vehicle HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
载体 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vertical linearity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
垂直线性 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vertical location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
垂直定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Visible light HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可见光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Vitua limage HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
虚假图像 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Voltage  threshold HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
电压阈值 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Voltage threshold HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
阈值电压 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wash station HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水洗工位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water  break  test HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水膜破坏试验 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water column coupling method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水柱耦合法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water column probe HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水柱耦合探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water path; water distance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水程 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water tolerance HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
水容限 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Water-washable penetrant HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
可水洗型渗透剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave  guide  acoustic  emission HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
声发射波导杆 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave  train HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波列 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave from HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波形 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave front HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波前 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave length HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波长 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave node HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波节 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wave train HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
波列 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wedge HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
斜楔 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wet  slurry  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
湿软磁膏技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wet  technique HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
湿法技术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wet method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
湿粉法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wetting  action HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
润湿作用 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wetting action HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
润湿作用 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wetting agents HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
润湿剂 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wheel type probe; wheel search unit HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
轮式探头 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
White  light HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
白光 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
White X-rays HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
连续X射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wobble HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
摆动 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wobble effect HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
抖动效应 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Working sensitivity HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
探伤灵敏度 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Wrap  around HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
残响波干扰 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Xeroradiography HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
静电射线透照术 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-radiation HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray controller HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线控制器 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray detection apparatus HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线探伤装置 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray film HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
射线胶片 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray paper HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线感光纸 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray tube HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线管 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X-ray tube diaphragm HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
X射线管光阑 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Yoke HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁轭 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Yoke magnetization method HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
磁轭磁化法 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Zigzag scan HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
锯齿扫查 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Zone calibration location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
时差区域校准定位 HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
Zone location HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h
区域定位HŁ—y9møSìbbs.3c3t.comM:J[¦°N¾h