英 文 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中 文 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A.C magnetic saturation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
交流磁饱和 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Absorbed dose u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
吸收剂量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Absorbed dose rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
吸收剂量率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acceptanc limits u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
验收范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acceptance level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
验收水平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acceptance standard u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
验收标准 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Accumulation test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
累积检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic emission count(emission count) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声发射计数(发射计数) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic emission transducer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声发射换能器(声发射传感器) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic emission(AE) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声发射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic holography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声全息术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic impedance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声阻抗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic impedance matching u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声阻抗匹配 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic impedance method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声阻法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustical lens u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声透镜 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Acoustic—ultrasonic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声-超声(AU) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Activation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
活化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Activity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
活度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Adequate shielding u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
安全屏蔽 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ampere turns u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
安匝数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Amplitude u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
幅度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle beam method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
斜射法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle of incidence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
入射角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle of reflection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反射角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle of spread u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
指向角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle of squint u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
偏向角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angle probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
斜探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Angstrom unit u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
埃(A) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Area amplitude response curve u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
面积幅度曲线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Area of interest u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
评定区 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Arliflcial disconlinuity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
人工不连续性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Artifact u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
假缺陷 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Artificial defect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
人工缺陷 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Artificial discontinuity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准人工缺陷 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A型扫描 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A-scope; A-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A型显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Attenuation coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
衰减系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Attenuator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
衰减器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Audible leak indicator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
音响泄漏指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Automatic testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
自动检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Autoradiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
自射线照片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Avaluation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
评定 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Barium concrete u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
钡混凝土 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Barn u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
靶 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Base fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
片基灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bath u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
槽液 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bayard- Alpert ionization gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
B- A型电离计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam ratio u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光束比 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
束张角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam axis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声束轴线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam index u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声束入射点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam path location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声程定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam path; path length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声程 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Beam spread u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声束扩散 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Betatron u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子感应加速器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bimetallic strip gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双金属片计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bipolar field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双极磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Black light filter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑光滤波器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Black light; ultraviolet radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Blackbody u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Blackbody equivalent temperature u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑体等效温度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bleakney mass spectrometer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波利克尼质谱仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bleedout u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗出 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bottom echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
底面回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bottom surface u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
底面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Boundary echo(first) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
边界一次回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Bremsstrahlung u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
轫致辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Broad-beam condition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
宽射束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Brush application u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
刷涂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
B-scan presenfation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
B型扫描显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
B-scope; B-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
B型显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
C- scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
C型扫描 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Calibration,instrument u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
设备校准 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Capillary action u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
毛细管作用 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Carrier fluid u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
载液 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Carry over of penetrate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透剂移转 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cassette u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
暗合 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cathode u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阴极 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Central conductor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中心导体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Central conductor method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中心导体法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Characteristic curve u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
特性曲线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Characteristic curve of film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片特性曲线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Characteristic radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
特征辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Chemical fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
化学灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cine-radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线(活动)电影摄影术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cintact pads u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
接触垫 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Circumferential coils u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
圆环线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Circumferential field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
周向磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Circumferential magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
周向磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Clean u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
清理 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Clean- up u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
清除 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Clearing time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定透时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coercive force u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
矫顽力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coherence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相干性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coherence length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相干长度(谐波列长度) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coi1,test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
测试线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coil size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线圈大小 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coil spacing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线圈间距 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coil technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线圈技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coil method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线圈法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coilreference u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线圈参考 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coincidence discrimination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
符合鉴别 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cold-cathode ionization gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
冷阴极电离计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Collimator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
准直器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Collimation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
准直 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Collimator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
准直器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Combined colour comtrast and fluorescent penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
着色荧光渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Compressed air drying u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压缩空气干燥 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Compressional wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压缩波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Compton scatter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
康普顿散射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Continuous emission u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续发射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Continuous linear array u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续线阵 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Continuous method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Continuous spectrum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续谱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Continuous wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Contract stretch u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比度宽限 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Contrast agent u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Contrast aid u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反差剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Contrast sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Control echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
监视回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Control echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Couplant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
耦合剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coupling u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
耦合 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Coupling losses u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
耦合损失 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cracking u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
裂解 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Creeping wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
爬波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Critical angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
临界角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cross section u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横截面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cross talk u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
串音 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cross-drilled hole u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横孔 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Crystal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
晶片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
C-scope; C-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
C型显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Curie point u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
居里点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Curie temperature u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
居里温度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Curie(Ci) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
居里 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Current flow method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
通电法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Current induction method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电流感应法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Current magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电流磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Cut-off level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
截止电平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dead zone u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
盲区 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Decay curve u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
衰变曲线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Decibel(dB) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
分贝 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Defect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Defect resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷分辨力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Defect detection sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷检出灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Defect resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷分辨力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Definition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Definition, image definition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
清晰度,图像清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Demagnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
退磁 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Demagnetization factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
退磁因子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Demagnetizer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
退磁装置 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Densitometer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑度计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑度(底片) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Density comparison strip u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
黑度比较片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Detecting medium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检验介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Detergent remover u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
洗净液 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer station u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显像工位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer, agueons u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水性显象剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer, dry u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干显象剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer, liquid film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
液膜显象剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developer, nonaqueous (sus- pendible) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非水(可悬浮)显象剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Developing time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显像时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Development u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显影 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Diffraction mottle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
衍射斑 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Diffuse indications u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
松散指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Diffusion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扩散 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Digital image acquisition system u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
数字图像识别系统 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dilatational wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
膨胀波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dip and drain station u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
浸渍和流滴工位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Direct contact magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
直接接触磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Direct exposure imaging u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
直接曝光成像 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Direct contact method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
直接接触法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Directivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
指向性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Discontinuity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
不连续性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Distance- gain- size-German AVG u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
距离- 增益- 尺寸(DGS德文为AVG) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Distance marker; time marker u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
距离刻度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dose equivalent u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剂量当量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dose rate meter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剂量率计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dosemeter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剂量计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Double crystal probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双晶片探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Double probe technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双探头法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Double transceiver technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双发双收法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Double traverse technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
二次波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dragout u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
带出 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drain time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
滴落时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drain time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
流滴时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drift u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
漂移 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry powder u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干粉 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干粉技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry developing cabinet u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干显像柜 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dry method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干粉法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drying oven u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干燥箱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drying station u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干燥工位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Drying time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干燥时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
D-scope; D-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
D型显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dual search unit u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dual-focus tube u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双焦点管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Duplex-wire image quality indicator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
双线像质指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Duration u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
持续时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dwell time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
停留时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dye penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
着色渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dynamic leak test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
动态泄漏检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dynamic leakage measurement u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
动态泄漏测量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dynamic range u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
动态范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Dynamic radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
动态射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
回波频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo height u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
回波高度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
回波指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo transmittance of sound pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
往复透过率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Echo width u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
回波宽度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Eddy current u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
涡流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Eddy current flaw detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
涡流探伤仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Eddy current testiog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
涡流检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Edge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
端面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Edge effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
边缘效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Edge echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
棱边回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Edge effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
边缘效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective depth penetration (EDP) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效穿透深度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective focus size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效焦点尺寸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective magnetic permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective reflection surface of flaw u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷有效反射面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Effective resistance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效电阻 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Elastic medium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
弹性介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electric displacement u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电位移 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electrical center u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电中心 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electrode u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电极 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electromagnet u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电磁铁 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electro-magnetic acoustic transducer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电磁声换能器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electromagnetic induction u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电磁感应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electromagnetic radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电磁辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electromagnetic testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电磁检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electro-mechanical coupling factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
机电耦合系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electron radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子辐射照相术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electron volt u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子伏恃 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electronic noise u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子噪声 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Electrostatic spraying u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
静电喷涂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Emulsification u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
乳化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Emulsification time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
乳化时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Emulsifier u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
乳化剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Encircling coils u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
环绕式线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
End effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
端部效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Energizing cycle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
激励周期 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equalizing filter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
均衡滤波器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equivalent u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
当量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equivalent I.Q. I. Sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
象质指示器当量灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equivalent nitrogen pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
等效氮压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equivalent penetrameter sensifivty u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透度计当量灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Equivalent method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
当量法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Erasabl optical medium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可探光学介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Etching u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
浸蚀 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Evaluation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
评定 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Evaluation threshold u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
评价阈值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Event count u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
事件计数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Event count rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
事件计数率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Examination area u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检测范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Examination region u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检验区域 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exhaust pressure/discharge pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
排气压力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exhaust tubulation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
排气管道 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Expanded time-base sweep u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
时基线展宽 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exposure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
曝光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exposure table u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
曝光表格 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exposure chart u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
曝光曲线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exposure fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
曝光灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Exposure,radiographic exposure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
曝光,射线照相曝光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Extended source u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扩展源 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Facility scattered neutrons u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
条件散射中子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
False indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
假指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Family u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
族 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Far field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
远场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Feed-through coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿过式线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Field, resultant magnetic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
复合磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fill factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
填充系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film speed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film badge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片襟章剂量计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film base u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
片基 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film gamma u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片γ值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film processing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片冲洗加工 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film speed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片感光度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Film viewing screen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
观察屏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Filter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
滤波器/滤光板 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Final test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
复探 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flat-bottomed hole u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平底孔 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flat-bottomed hole equivalent u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平底孔当量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flaw u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
伤 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flaw characterization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
伤特性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flaw echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flexural wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
弯曲波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Floating threshold u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
浮动阀值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent examination method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光检验法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent magnetic particle inspection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光磁粉检验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent dry deposit penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干沉积荧光渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent light u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent magnetic powder u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光磁粉 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluorescent screen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光屏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fluoroscopy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光检查法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flux leakage field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁通泄漏场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Flux lines u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁通线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focal spot u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focal distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦距 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focus length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦点长度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focus size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦点尺寸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focus width u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦点宽度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focus(electron) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子焦点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focused beam u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
聚焦声束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focusing probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
聚焦探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Focus-to-film distance(f.f.d) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焦点-胶片距离(焦距) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
底片灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fog density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
灰雾密度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Footcandle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
英尺烛光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Freguency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Frequency constant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
频率常数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fringe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干涉带 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Front distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
前沿距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Front distance of flaw u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷前沿距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Full- wave direct current(FWDC) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
全波直流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Fundamental frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
基频 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Furring u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
毛状迹痕 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gage pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gain u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
增益 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gamma radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
γ射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gamma ray source u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
γ射线源 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gamma ray source container u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
γ射线源容器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gamma rays u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
γ射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gamma-ray radiographic equipment u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
γ射线透照装置 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gap scanning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
间隙扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gas u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
气体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
闸门 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gating technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
选通技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gauss u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
高斯 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Geiger-Muller counter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
盖革.弥勒计数器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Geometric unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
几何不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Gray(Gy) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
戈瑞 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Grazing incidence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
掠入射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Grazing angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
掠射角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Group velocity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
群速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Half life u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半衰期 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Half- wave current (HW) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半波电流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Half-value layer(HVL) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半值层 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Half-value method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半波高度法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Halogen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
卤素 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Halogen leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
卤素检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hard X-rays u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
硬X射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hard-faced probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
硬膜探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Harmonic analysis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
谐波分析 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Harmonic distortion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
谐波畸变 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Harmonics u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
谐频 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Head wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
头波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Helium bombing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
氦轰击法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Helium drift u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
氦漂移 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Helium leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
氦检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hermetically tight seal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
气密密封 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
High vacuum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
高真空 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
High energy X-rays u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
高能X射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Holography (optical) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光全息照相 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Holography, acoustic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声全息 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hydrophilic emulsifier u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
亲水性乳化剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hydrophilic remover u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
亲水性洗净剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hydrostatic text u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
流体静力检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hysteresis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁滞 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Hysteresis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁滞 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
IACS u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
IACS u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
ID coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
ID线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image definition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image enhancement u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像增强 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image magnification u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像放大 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image quality u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像质量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image quality indicator sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
像质指示器灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Image quality indicator(IQI)/image quality indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
像质指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Imaging line scanner u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
图像线扫描器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Immersion probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
液浸探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Immersion rinse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
浸没清洗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Immersion testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
液浸法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Immersion time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
浸没时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Impedance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阻抗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Impedance plane diagram u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阻抗平面图 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Imperfection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
不完整性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Impulse eddy current testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲涡流检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Incremental permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
增量磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indicated defect area u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷指示面积 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indicated defect length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
缺陷指示长度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indirect exposure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
间接曝光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indirect magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
间接磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indirect magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
间接磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Indirect scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
间接扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Induced field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
感应磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Induced current method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
感应电流法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Infrared imaging system u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
红外成象系统 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Infrared sensing device u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
红外扫描器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inherent fluorescence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
固有荧光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inherent filtration u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
固有滤波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Initial permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
起始磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Initial pulse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
始脉冲 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Initial pulse width u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
始波宽度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inserted coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
插入式线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inside coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
内部线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inside- out testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
外泄检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inspection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inspection medium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检查介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Inspection frequency/ test frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检测频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Intensifying factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
增感系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Intensifying screen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
增感屏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interal,arrival time (Δtij)/arrival time interval(Δtij) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
到达时间差(Δtij) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interface boundary u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
界面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interface echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
界面回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interface trigger u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
界面触发 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interference u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干涉 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Interpretation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
解释 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ion pump u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
离子泵 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ion source u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
离子源 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ionization chamber u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电离室 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ionization potential u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电离电位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ionization vacuum gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电离真空计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ionography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电离射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Irradiance, E u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射通量密度, E u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Isolation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
隔离检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Isotope u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
同位素 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
K value u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
K值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Kaiser effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
凯塞(Kaiser)效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Kilo volt u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
kv 千伏特 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Kiloelectron volt u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
keV千电子伏特 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Krypton 85 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
氪85 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
L/D ratio u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
L/D比 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lamb wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
兰姆波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Latent image u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
潜象 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lateral scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
左右扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lateral scan with oblique angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
斜平行扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Latitude (of an emulsion) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
胶片宽容度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lead screen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
铅屏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leak u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏孔 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leak artifact u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leak testtion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leakage field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leakage rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Leechs u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁吸盘 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lift-off effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
提离效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Light intensity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光强度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Limiting resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
极限分辨率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Line scanner u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线扫描器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Line focus u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线焦点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Line pair pattern u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线对检测图 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Line pairs per millimetre u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
每毫米线对数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Linear (electron) accelerator(LINAC) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子直线加速器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Linear attenuation coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线衰减系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Linear scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Linearity (time or distance) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
线性(时间或距离) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Linearity, anplitude u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
幅度线性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lines of force u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁力线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lipophilic emulsifier u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
亲油性乳化剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lipophilic remover u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
亲油性洗净剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Liquid penetrant examination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
液体渗透检验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Liquid film developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
液膜显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Local magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
局部磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Local magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
局部磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Local scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
局部扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Localizing cone u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定域喇叭筒 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location accuracy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位精度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location computed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位,计算 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location marker u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位标记 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location upon delta-T u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
时差定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location, clusfer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位,群集 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Location,continuous AE signal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定位,连续AE信号 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵向磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵向磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵向分辨率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal wave probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵波探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Longitudinal wave technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
纵波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Loss of back reflection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
背面反射损失 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Loss of back reflection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
底面反射损失 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Love wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
乐甫波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Low energy gamma radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
低能γ辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Low-enerugy photon radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
低能光子辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Luminance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
亮度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Luminosity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
流明 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Lusec u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
流西克 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Maga or million electron volts u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
MeV兆电子伏特 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic history u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁化史 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic hysteresis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁性滞后 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic particle field indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁粉磁场指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic particle inspection flaw indications u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁粉检验的伤显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic circuit u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁路 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic domain u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁畴 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic field distribution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁场分布 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic field indicator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁场指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic field meter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁场计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic field strength u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁场强度(H) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic field/field,magnetic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic flux u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁通 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic flux density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁通密度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic force u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁化力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic leakage field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
漏磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic leakage flux u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
漏磁通 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic moment u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁矩 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic particle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁粉 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic particle indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁痕 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic particle testing/magnetic particle examination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁粉检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic pole u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁极 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic saturataion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁饱和 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic saturation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁饱和 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic slorage meclium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁储介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetic writing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁写 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetizing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetizing current u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁化电流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetizing coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁化线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetostrictive effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁致伸缩效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Magnetostrictive transducer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁致伸缩换能器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Main beam u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
主声束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Manual testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
手动检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Markers u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
时标 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
MA-scope; MA-scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
MA型显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Masking u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
遮蔽 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mass attcnuation coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质量吸收系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mass number u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质量数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mass spectrometer (M.S.) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质谱仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mass spectrometer leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质谱检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mass spectrum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质谱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Master/slave discrimination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
主从鉴别 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
MDTD u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
最小可测温度差 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mean free path u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平均自由程 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Medium vacuum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中真空 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mega or million volt u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
MV兆伏特 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Micro focus X - ray tube u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
微焦点X 光管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Microfocus radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
微焦点射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Micrometre u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
微米 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Micron of mercury u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
微米汞柱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Microtron u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子回旋加速器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Milliampere u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
毫安(mA) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Millimetre of mercury u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
毫米汞柱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Minifocus x- ray tube u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
小焦点调射线管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Minimum detectable leakage rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
最小可探泄漏率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Minimum resolvable temperature difference (MRTD) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
最小可分辨温度差(MRDT) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mode u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波型 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mode conversion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波型转换 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Mode transformation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波型转换 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Moderator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
慢化器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Modulation transfer function (MTF) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
调制转换功能(MTF) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Modulation analysis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
调制分析 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Molecular flow u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
分子流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Molecular leak u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
分子泄漏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Monitor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
监控器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Monochromatic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
单色波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Movement unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
移动不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Moving beam radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可动射束射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiaspect magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多向磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multidirectional magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多向磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multifrequency eddy current testiog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多频涡流检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple back reflections u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多次背面反射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple reflections u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多次反射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple back reflections u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多次底面反射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple echo method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多次反射法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple probe technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多探头法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Multiple triangular array u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
多三角形阵列 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Narrow beam condition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
窄射束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
NC u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
NC u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Near field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
近场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Near field length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
近场长度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Near surface defect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
近表面缺陷 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Net density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
净黑度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Net density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
净(光学)密度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Neutron u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Neutron radiograhy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中子射线透照 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Neutron radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
中子射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Newton (N) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
牛顿 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nier mass spectrometer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
尼尔质谱仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Noise u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
噪声 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Noise u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
噪声 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Noise equivalent temperature difference (NETD) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
噪声当量温度差(NETD) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nominal angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标称角度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nominal frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标称频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Non-aqueous liquid developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非水性液体显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Noncondensable gas u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非冷凝气体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nondcstructivc Examination(NDE) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
无损试验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nondestructive Evaluation(NDE) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
无损评价 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nondestructive Inspection(NDI) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
无损检验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nondestructive Testing(NDT) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
无损检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nonerasble optical data u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可固定光学数据 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nonferromugnetic material u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非铁磁性材料 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nonrelevant indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非相关指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Non-screen-type film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
非增感型胶片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normal incidence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
垂直入射(亦见直射声束) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normal permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normal beam method; straight beam method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
垂直法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normal probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
直探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normalized reactance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
归一化电抗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Normalized resistance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
归一化电阻 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nuclear activity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
核活性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Nuclide u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
核素 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object plane resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
物体平面分辨率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object scattered neutrons u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
物体散射中子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object beam u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
物体光束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object beam angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
物体光束角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object-film distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
被检体-胶片距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Object一film distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
物体- 胶片距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Over development u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显影过度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Over emulsfication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
过乳化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Overall magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
整体磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Overload recovery time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
过载恢复时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Overwashing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
过洗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Oxidation fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
氧化灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
P u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
P u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pair production u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
偶生成 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pair production u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子对产生 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pair production u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电子偶的产生 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Palladium barrier leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
钯屏检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Panoramic exposure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
全景曝光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Parallel scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平行扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Paramagnetic material u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
顺磁性材料 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Parasitic echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
干扰回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Partial pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
分压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Particle content u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁悬液浓度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Particle velocity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质点(振动)速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pascal (Pa) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
帕斯卡(帕) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pascal cubic metres per second u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
帕立方米每秒(Pa·m3/s ) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Path length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光程长 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Path length difference u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光程长度差 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pattern u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探伤图形 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Peak current u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
峰值电流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrameter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透度计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrameter sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透度计灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant comparator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透对比试块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant flaw detection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透探伤 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant removal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透剂去除 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant station u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透工位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetrant, water- washable u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水洗型渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetration u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿透深度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Penetration time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
渗透时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Permanent magnet u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
永久磁铁 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Permeability coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透气系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Permeability,a-c u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
交流磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Permeability,d-c u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
直流磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phantom echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
幻象回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase analysis u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相位分析 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相位角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase controlled circuit breaker u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
断电相位控制器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase detection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相位检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase hologram u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相位全息 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase sensitive detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相敏检波器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase shift u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相位移 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase velocity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phase-sensitive system u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相敏系统 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phillips ionization gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
菲利浦电离计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Phosphor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光物质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Photo fluorography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光照相术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Photoelectric absorption u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光电吸收 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Photographic emulsion u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
照相乳剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Photographic fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
照相灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Photostimulable luminescence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
光敏发光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric material u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电材料 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric stiffness constant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电劲度常数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric stress constant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电应力常数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric transducer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电换能器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Piezoelectric voltage constant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压电电压常数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pirani gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
皮拉尼计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pirani gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
皮拉尼计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pitch and catch technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
一发一收法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pixel u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
象素 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pixel size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
象素尺寸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pixel, disply size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
象素显示尺寸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Planar array u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平面阵(列) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Plane wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
平面波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Plate wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
板波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Plate wave technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
板波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Point source u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
点源 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Post emulsification u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
后乳化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Post emulsifiable penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
后乳化渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Post-cleaning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
后清除 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Post-cleaning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
后清洗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Powder u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
粉未 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Powder blower u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
喷粉器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Powder blower u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁粉喷* u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pre-cleaning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
预清理 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure difference u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压力差 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure dye test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压力着色检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压力探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压力检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure- evacuation test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压力抽空检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure mark u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
压痕 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pressure,design u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
设计压力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pre-test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
初探 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Primary coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
一次线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Primary radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
初级辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe gas u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头气体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe backing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头背衬 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
点式线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头式线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe coil clearance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头线圈间隙 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe index u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头入射点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe to weld distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头-焊缝距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Probe/ search unit u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Process control radiograph u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
工艺过程控制的射线照相 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Processing capacity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
处理能力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Processing speed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
处理速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Prods u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
触头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Projective radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
投影射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Proportioning probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
比例探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Protective material u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
防护材料 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Proton radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
质子射线透照 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse echo method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲回波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse repetition rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲重复率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse amplitude u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲幅度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse echo method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲反射法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse energy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲能量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse envelope u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲包络 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲长度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse repetition frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲重复频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pulse tuning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉冲调谐 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pump- out tubulation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
抽气管道 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Pump-down time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
抽气时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Q factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Q值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quadruple traverse technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
四次波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quality (of a beam of radiation) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线束的质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quality factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
品质因数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quenching u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阻塞 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quenching of fluorescence u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光的猝灭 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Quick break u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
快速断间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rad(rad) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
拉德 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiance, L u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
面辐射率,L u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiant existence, M u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
幅射照度M u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiant flux; radiant power,ψe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射通量、辐射功率、ψe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiation does u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射剂量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radio frequency (r- f) display u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射频显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radio- frequency mass spectrometer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射频质谱仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radio frequency(r-f) display u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射频显示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiograph u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线底片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照片对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic equivalence factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相等效系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic exposure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相曝光量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic inspection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic inspection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相检验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic quality u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相质量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线底片对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic equivalence factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线透照等效因子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic inspection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线透照检查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic quality u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线透照质量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiographic sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线透照灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线照相术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiological examination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线检验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiology u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线学 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiometer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radiometry u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
辐射测量术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Radioscopy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线检查法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Range u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
量程 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rayleigh wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
瑞利波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rayleigh scattering u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
瑞利散射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Real image u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
实时图像 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Real-time radioscopy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
实时射线检查法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rearm delay time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
重新准备延时时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rearm delay time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
重新进入工作状态延迟时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reciprocity failure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
倒易律失效 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reciprocity law u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
倒易律 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Recording medium u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
记录介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Recovery time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
恢复时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rectified alternating current u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉动直流电 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference block u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考试块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference beam u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考光束 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference block u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比试块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference block method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
对比试块法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference line method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
基准线法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reference standard u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考标准 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reflection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reflection coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反射系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reflection density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反射密度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reflector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反射体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Refraction u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
折射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Refractive index u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
折射率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Refrence beam angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
参考光束角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reicnlbation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
网纹 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reject; suppression u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
抑制 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rejection level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
拒收水平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Relative permeability u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相对磁导率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Relevant indication u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
相关指示 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reluctance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁阻 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rem(rem) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
雷姆 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Remote controlled testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
机械化检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Replenisers u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
补充剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Representative quality indicator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
代表性质量指示器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Residual magnetic field/field, residual magnetic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剩磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Residual technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剩磁技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Residual magnetic method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剩磁法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Residual magnetism u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
剩磁 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resistance (to flow) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
气阻 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
分辨力 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resonance method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
共振法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Response factor u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
响应系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Response time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
响应时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resultant field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
复合磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resultant magnetic field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
合成磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Resultant magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
组合磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Retentivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
顽磁性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Reversal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
反转现象 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ring-down count u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
振铃计数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ring-down count rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
振铃计数率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rinse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
清洗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rise time u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
上升时间 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rise-time discrimination u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
上升时间鉴别 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rod-anode tube u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
棒阳极管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Roentgen(R) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
伦琴 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Roof angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
屋顶角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rotational magnetic field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
旋转磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rotational magnetic field method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
旋转磁场法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Rotational scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
转动扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Roughing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
低真空 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Roughing line u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
低真空管道 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Roughing pump u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
低真空泵 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
S u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
S u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Safelight u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
安全灯 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sampling probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
取样探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Saturation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
饱和 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Saturation,magnetic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁饱和 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Saturation level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
饱和电平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scan on grid lines u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
格子线扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scan pitch u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查间距 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning index u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查标记 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning directly on the weld u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
焊缝上扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning path u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查轨迹 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning speed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scanning zone u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫查区域 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scattared energy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
散射能量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scatter unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
散射不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scattered neutrons u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
散射中子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scattered radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
散射辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scattering u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
散射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Schlieren system u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
施利伦系统 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scintillation counter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
闪烁计数器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Scintillator and scintillating crystals u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
闪烁器和闪烁晶体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Screen u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
屏 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Screen unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光增感屏不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Screen-type film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
荧光增感型胶片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
SE probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
SE探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Search-gas u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探测气体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Second critical angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
第二临界角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Secondary radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
二次射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Secondary coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
二次线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Secondary radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
次级辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Selectivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
选择性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Semi-conductor detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半导体探测器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sensitirity va1ue u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
灵敏度值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sensitivity of leak test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
泄漏检测灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sensitivity control u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
灵敏度控制 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Shear wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
切变波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Shear wave probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横波探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Shear wave technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Shim u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
薄垫片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Shot u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
冲击通电 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Side lobe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
副瓣 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Side wall u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
侧面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sievert(Sv) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
希(沃特) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Signal u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
信号 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Signal gradient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
信号梯度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Signal over load point u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
信号过载点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Signal overload level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
信号过载电平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Signal to noise ratio u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
信噪比 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Single crystal probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
单晶片探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Single probe technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
单探头法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Single traverse technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
一次波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sizing technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
定量法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Skin depth u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
集肤深度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Skin effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
集肤效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Skip distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
跨距 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Skip point u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
跨距点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sky shine(air scatter) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
空中散射效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sniffing probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
嗅吸探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Soft X-rays u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
软X射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Soft-faced probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
软膜探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solarization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
负感作用 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solenoid u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
螺线管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Soluble developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可溶显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solvent remover u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
溶剂去除剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solvent cleaners u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
溶剂清除剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solvent developer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
溶剂显像剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solvent remover u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
溶剂洗净剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Solvent-removal penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
溶剂去除型渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sorption u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
吸着 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound diffraction u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声绕射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound insulating layer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
隔声层 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound intensity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声强 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound intensity level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声强级 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound scattering u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声散射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound transparent layer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透声层 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sound velocity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声速 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Source u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
源 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Source data label u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
放射源数据标签 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Source location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
源定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Source size u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
源尺寸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Source-film distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线源-胶片距离 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Spacial frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
空间频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Spark coil leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电火花线圈检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Specific activity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
放射性比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Specified sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
规定灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standard u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standard u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准试样 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standard leak rate u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准泄漏率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standard leak u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准泄漏孔 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standard tast block u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
标准试块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standardization instrument u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
设备标准化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Standing wave; stationary wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
驻波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step wedge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯楔块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step- wadge calibration film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯楔块校准底片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step- wadge comparison film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯楔块比较底片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step wedge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯楔块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step-wedge calibration film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯-楔块校准片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Step-wedge comparison film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阶梯-楔块比较片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Stereo-radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
立体射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Subject contrast u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
被检体对比度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Subsurface discontinuity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
近表面不连续性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Suppression u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
抑制 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面磁场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface noise u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面噪声 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface wave probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面波探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surface wave technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
表面波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surge magnetization u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
脉动磁化 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Surplus sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
灵敏度余量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Suspension u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁悬液 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sweep u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫描 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sweep range u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫描范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Sweep speed u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫描速度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Swept gain u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
扫描增益 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Swivel scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
环绕扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
System exanlillatien threshold u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
系统检验阈值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
System inclacel artifacts u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
系统感生物 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
System noise u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
系统噪声 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tackground, target u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
目标本底 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tandem scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
串列扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Target u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
耙 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Target u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
靶 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Television fluoroscopy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电视X射线荧光检查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Temperature envelope u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
温度范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tenth-value-layer(TVL) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
十分之一值层 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test coil u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检测线圈 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test quality level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检测质量水平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test ring u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
试环 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test block u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
试块 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test frequency u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
试验频率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test piece u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
试片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test range u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探测范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Test surface u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探测面 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Testing,ulrasonic u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thermal neutrons u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
热中子 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thermocouple gage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
热电偶计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thermogram u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
热谱图 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thermography, infrared u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
红外热成象 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thermoluminescent dosemeter(TLD) u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
热释光剂量计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thickness sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
厚度灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Third critiical angle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
第三临界角 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thixotropic penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
摇溶渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Thormal resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
热分辨率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Threading bar u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿棒 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Three way sort u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
三档分选 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Threshold setting u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
门限设置 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Threshold fog u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阈值灰雾 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Threshold level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阀值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Threshotd tcnet u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
门限电平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Throttling u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
节流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Through transmission technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿透技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Through penetration technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
贯穿渗透法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Through transmission technique; transmission technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿透法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Through-coil technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
穿过式线圈技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Throughput u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
通气量 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tight u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
密封 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Total reflection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
全反射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Totel image unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
总的图像不清晰度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tracer probe leak location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
示踪探头泄漏定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tracer gas u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
示踪气体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transducer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
换能器/传感器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transition flow u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
过渡流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Translucent base media u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
半透明载体介质 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmission u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmission densitomefer u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
发射密度计 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmission coefficient u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透射系数 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmission point u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透射点 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmission technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透射技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmittance,τ u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
透射率τ u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmitted film density u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
检测底片黑度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transmitted pulse u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
发射脉冲 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transverse resolution u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横向分辨率 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Transverse wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
横波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Traveling echo u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
游动回波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Travering scan; depth scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
前后扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Triangular array u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
正三角形阵列 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Trigger/alarm condition u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
触发/报警状态 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Trigger/alarm level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
触发/报警标准 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Triple traverse technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
三次波法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
True continuous technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
准确连续法技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Trueattenuation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
真实衰减 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube current u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管电流 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube head u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube shield u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管罩 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube shutter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管子光闸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube window u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管窗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Tube-shift radiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
管子移位射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Two-way sort u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
两档分选 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultra- high vacuum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超高真空 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic leak detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声波检漏仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic noise level u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声噪声电平 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic cleaning u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声波清洗 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic field u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声场 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic flaw detection u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声探伤 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic flaw detector u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声探伤仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic microscope u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声显微镜 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic spectroscopy u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声频谱 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic testing system u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声检测系统 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultrasonic thickness gauge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
超声测厚仪 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Ultraviolet radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
紫外辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Under development u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
显影不足 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Unsharpness u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
不清晰 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Useful density range u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
有效光学密度范围 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
UV-A u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A类紫外辐射 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
UV-A filter u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
A类紫外辐射滤片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vacuum u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
真空 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vacuum cassette u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
真空暗盒 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vacuum testing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
真空检测 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vacuum cassette u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
真空暗合 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Van de Graaff generator u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
范德格喇夫起电机 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vapor pressure u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
蒸汽压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vapour degreasing u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
蒸汽除油 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
variable angle probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可变角探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vee path u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
V型行程 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vehicle u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
载体 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vertical linearity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
垂直线性 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vertical location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
垂直定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Visible light u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可见光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Vitua limage u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
虚假图像 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Voltage threshold u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
电压阈值 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Voltage threshold u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
阈值电压 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wash station u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水洗工位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water break test u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水膜破坏试验 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water column coupling method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水柱耦合法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water column probe u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水柱耦合探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water path; water distance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水程 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water tolerance u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
水容限 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Water-washable penetrant u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
可水洗型渗透剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave guide acoustic emission u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
声发射波导杆 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave train u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波列 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave from u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波形 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave front u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波前 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave length u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波长 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave node u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波节 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wave train u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
波列 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wedge u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
斜楔 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wet slurry technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
湿软磁膏技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wet technique u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
湿法技术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wet method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
湿粉法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wetting action u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
润湿作用 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wetting action u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
润湿作用 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wetting agents u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
润湿剂 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wheel type probe; wheel search unit u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
轮式探头 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
White light u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
白光 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
White X-rays u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
连续X射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wobble u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
摆动 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wobble effect u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
抖动效应 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Working sensitivity u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
探伤灵敏度 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Wrap around u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
残响波干扰 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Xeroradiography u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
静电射线透照术 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-radiation u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray controller u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线控制器 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray detection apparatus u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线探伤装置 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray film u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
射线胶片 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray paper u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线感光纸 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray tube u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线管 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X-ray tube diaphragm u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
X射线管光阑 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Yoke u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁轭 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Yoke magnetization method u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
磁轭磁化法 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Zigzag scan u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
锯齿扫查 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Zone calibration location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
时差区域校准定位 u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
Zone location u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%
区域定位u¼Æ;ï/Þåbbs.3c3t.comã$¶/o(¾H%